公开(公告)号：US20170309473A9

公开(公告)日：2017-10-26

申请号：US15078249

申请日：2016-03-23

Applicant: Semes Co., Ltd.

Inventor： EUN SAEM AHN ,  Choongki Min ,  Jung Yul Lee ,  Min Jung Park

IPC: H01L21/027 ,  B05B13/02 ,  B05B1/16 ,  B05B7/00 ,  H01L21/67

CPC classification number: H01L21/0273 ,  B05B1/16 ,  B05B7/00 ,  B05B13/0228 ,  B05B13/0242 ,  B05B13/0278 ,  G03F7/162 ,  H01L21/6715

Abstract: Disclosed are a method and an apparatus for applying a liquid onto a substrate. The method for treating a substrate, the method includes: a liquid supplying step of supplying a treatment liquid for forming a liquid film on the substrate while rotating the substrate; and a liquid diffusing step of diffusing the treatment liquid discharged to the substrate by rotating the substrate, after the liquid supplying step. The liquid diffusing step includes: a primary diffusion step of rotating the substrate at a first diffusion speed; and a secondary diffusion step of rotating the substrate at a second diffusion speed, after the primary diffusion step. The second diffusion speed is higher than the first diffusion speed. Accordingly, the treatment liquid can be applied to the substrate again by performing the secondary diffusion step, making it possible to adjust the thickness of a photosensitive film.

公开(公告)号：US20160293404A1

公开(公告)日：2016-10-06

申请号：US15078249

申请日：2016-03-23

Applicant: Semes Co., Ltd.

Inventor： EUN SAEM AHN ,  Choongki Min ,  Jung Yul Lee ,  Min Jung Park

IPC: H01L21/027 ,  B05B1/00

CPC classification number: H01L21/0273 ,  B05B1/16 ,  B05B7/00 ,  B05B13/0228 ,  B05B13/0242 ,  B05B13/0278 ,  G03F7/162 ,  H01L21/6715

Abstract: Disclosed are a method and an apparatus for applying a liquid onto a substrate. The method for treating a substrate, the method includes: a liquid supplying step of supplying a treatment liquid for forming a liquid film on the substrate while rotating the substrate; and a liquid diffusing step of diffusing the treatment liquid discharged to the substrate by rotating the substrate, after the liquid supplying step. The liquid diffusing step includes: a primary diffusion step of rotating the substrate at a first diffusion speed; and a secondary diffusion step of rotating the substrate at a second diffusion speed, after the primary diffusion step. The second diffusion speed is higher than the first diffusion speed. Accordingly, the treatment liquid can be applied to the substrate again by performing the secondary diffusion step, making it possible to adjust the thickness of a photosensitive film.

Abstract translation: 公开了一种将液体施加到基板上的方法和装置。 一种处理基板的方法，所述方法包括：液体供给步骤，在旋转所述基板的同时，在所述基板上供给用于形成液膜的处理液; 以及液体扩散步骤，在液体供给步骤之后，通过旋转基板来扩散排放到基板的处理液。 液体扩散步骤包括：以第一扩散速度旋转衬底的一次扩散步骤; 以及在第一扩散步骤之后以第二扩散速度旋转衬底的二次扩散步骤。 第二扩散速度高于第一扩散速度。 因此，可以通过执行二次扩散步骤再次将处理液施加到基板，使得可以调节感光膜的厚度。