公开(公告)号：US10186419B2

公开(公告)日：2019-01-22

申请号：US14931004

申请日：2015-11-03

Applicant: Semes Co., Ltd.

Inventor： Kihoon Choi ,  In-Il Jung ,  Seong-Soo Kim ,  Yoon-Jong Ju

IPC: H01L21/02 ,  B24C1/00 ,  H01L21/67 ,  B24C11/00

Abstract: Disclosed is an apparatus and method for treating a substrate. The method includes supplying cleaning particles to the substrate to clean the substrate. The cleaning particles are solid particles. The solid particles provide a shock wave to the substrate.

公开(公告)号：US09275847B2

公开(公告)日：2016-03-01

申请号：US14228731

申请日：2014-03-28

Applicant: Semes Co., Ltd.

Inventor： In-Il Jung ,  Eun-Sun Jung ,  Chan-Young Heo ,  Jeong Seon Park ,  Seong-Soo Kim

IPC: F26B21/06 ,  H01L21/00

CPC classification number: H01L21/00 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051

Abstract: The substrate treating apparatus includes a drying chamber in which an organic solvent remaining on a substrate is dissolved by using a fluid, and a recycling unit including a separator for separating the organic solvent from the fluid discharged from the drying chamber to recycle the fluid. The separator includes a distiller in which a fluid containing an organic solvent having a first concentration is introduced, a heating unit heating a fluid containing an organic solvent having a second concentration discharged from the distiller, and supplying an evaporated fluid containing an organic solvent having a third concentration into the distiller, and a condensation unit liquefying a fluid containing an organic solvent having a fourth concentration discharged from the distiller. The organic solvent has the second concentration, the first concentration, the third concentration, and the fourth concentration which are successively lowered in concentration.

Abstract translation: 基板处理装置包括通过使用流体溶解残留在基板上的有机溶剂的干燥室，以及包括用于从有机溶剂与从干燥室排出的流体分离以使循环流体的分离器的再循环单元。 分离器包括：蒸馏器，其中引入含有具有第一浓度的有机溶剂的流体;加热单元，加热含有从蒸馏器排出的第二浓度的有机溶剂的流体，以及供给包含有机溶剂的蒸发流体， 第三浓度进入蒸馏器，以及冷凝单元液化含有从蒸馏器排出的第四浓度的有机溶剂的流体。 有机溶剂具有浓度连续降低的第二浓度，第一浓度，第三浓度和第四浓度。