公开(公告)号：US11149234B2

公开(公告)日：2021-10-19

申请号：US16250069

申请日：2019-01-17

Applicant: Samsung Electronics Co., Ltd. ,  SEMES Co., Ltd.

Inventor： Mi Hyun Park ,  Jung-Min Oh ,  Young-Hoo Kim ,  Hyo San Lee ,  Tae Keun Kim ,  Ye Rim Yeon ,  Hae Rim Oh ,  Ji Soo Jeong ,  Min Hee Cho

IPC: B08B3/10 ,  C11D11/00 ,  H01L21/67 ,  H01L21/687 ,  H01L21/02 ,  C11D17/00 ,  C11D3/28 ,  C11D3/20 ,  C11D3/34 ,  C11D3/32 ,  C11D1/14 ,  C11D1/12 ,  C11D1/29

Abstract: A cleaning composition, a cleaning apparatus, and a method of fabricating a semiconductor device, the cleaning composition including a surfactant; deionized water; and an organic compound, wherein the surfactant is included in the cleaning composition in a concentration of about 0.28 M to about 0.39 M or a mole fraction of about 0.01 to about 0.017, and wherein the organic compound is included in the cleaning composition in a concentration of about 7.1 M to about 7.5 M or a mole fraction of about 0.27 to about 0.35.

公开(公告)号：US09975151B2

公开(公告)日：2018-05-22

申请号：US14749010

申请日：2015-06-24

Applicant: Semes Co., Ltd.

Inventor： Tae Keun Kim ,  Oh Jin Kwon ,  Ki Hoon Choi

IPC: B08B3/12 ,  B08B3/10 ,  B08B7/02 ,  H01L21/67

CPC classification number: B08B3/10 ,  B08B3/12 ,  B08B7/028 ,  H01L21/67017 ,  H01L21/67051

Abstract: Embodiments of the inventive concepts provide an apparatus and a method for treating a substrate. The apparatus includes a substrate support unit supporting the substrate, and a liquid supply unit supplying a treatment solution to the substrate supported by the substrate support unit. The liquid supply unit includes a nozzle discharging the treatment solution to the substrate, a liquid supply line supplying the treatment solution to the nozzle, a mixing member installed on the liquid supply line, a mixing space formed within the mixing member, and a gas supply line connected to the mixing member to supply a gas into the mixing space. The mixing member includes a body within which the mixing space is formed, and an inflow port combined with the body such that the gas supplied through the inflow port is mixed with the treatment solution in the mixing space to form nano-sized bubbles.