公开(公告)号：US20030062069A1

公开(公告)日：2003-04-03

申请号：US10224625

申请日：2002-08-20

Applicant: Semitool, Inc

Inventor： Ronald G. Breese ,  C. James Bryer ,  Eric J. Bergman ,  Dana R. Scranton

IPC: B08B007/00

CPC classification number: H01L21/67051 ,  B08B9/0861 ,  B08B9/32 ,  Y10S134/902

Abstract: In a method for cleaning for cleaning metallic ion contamination, and especially copper, from wafer containers, the containers are loaded into a cleaning apparatus. The containers are sprayed with a dilute chelating agent solution. The chelating agent solution removes metallic contamination from the containers. The containers are then rinsed with a rinsing liquid, such as deionized water and a surfactant. The containers are then dried, preferably by applying heat and/or hot air movement.

Abstract translation: 在清洁金属离子污染物（特别是铜）的清洁方法中，容器被装载到清洁装置中。 用稀释的螯合剂溶液喷洒容器。 螯合剂溶液从容器中除去金属污染物。 然后用漂洗液如去离子水和表面活性剂漂洗容器。 然后将容器干燥，优选通过施加热和/或热空气运动。

公开(公告)号：US20030051743A1

公开(公告)日：2003-03-20

申请号：US10200071

申请日：2002-07-19

Applicant: Semitool, Inc.

Inventor： Ronald G. Breese ,  C. James Bryer ,  Eric J. Bergman ,  Dana R. Scranton

IPC: B08B007/00

CPC classification number: H01L21/67051 ,  B08B3/12 ,  B08B9/0861 ,  B08B9/32

Abstract: In a method for cleaning for cleaning metallic ion contamination, and especially copper, from wafer containers, the containers are loaded into a loader of a cleaning apparatus. The containers are sprayed with a dilute chelating agent solution, while the rotor is spinning. The chelating agent solution removes metallic contamination from the containers. The containers are then sprayed with a rinsing liquid, such as deionized water and a surfactant while the rotor is spinning and heat is applied. The containers are then dried by applying heat, hot air movement and spinning the rotor.

Abstract translation: 在清洁金属离子污染物尤其是铜的清洁方法中，将容器装载到清洁装置的装载机中。 当转子旋转时，用稀释的螯合剂溶液喷洒容器。 螯合剂溶液从容器中除去金属污染物。 然后在转子旋转并施加热量的同时，用诸如去离子水和表面活性剂的冲洗液体喷洒容器。 然后通过加热，热空气运动并旋转转子干燥容器。