公开(公告)号：US20030010362A1

公开(公告)日：2003-01-16

申请号：US09907544

申请日：2001-07-16

Applicant: Semitool, Inc.

Inventor： Dana Scranton ,  Eric Bergman ,  Eric Lund ,  Joe Lanfrankie ,  Worm Lund

IPC: B08B003/00

CPC classification number: H01L21/67057 ,  B08B3/045 ,  Y10S134/902

Abstract: Workpieces requiring low levels of contamination, such as semiconductor wafers, are loaded into a rotor within a process chamber. The process chamber has a horizontal drain opening in its cylindrical wall. The chamber is closed via a door. A process or rinsing liquid is introduced into the chamber. The liquid rises to a level so that the workpieces are immersed in the liquid. The chamber slowly pivots or rotates to move the drain opening down to the level of the liquid. The liquid drains out through the drain opening. The drain opening is kept near the surface of the liquid to drain off liquid at a uniform rate. An organic solvent vapor is introduced above the liquid to help prevent droplets of liquid from remaining on the workpieces as the liquid drains off. The rotor spins the workpieces to help to remove any remaining droplets by centrifugal force.

Abstract translation: 需要低水平污染的工件（例如半导体晶片）被装载到处理室内的转子中。 处理室在其圆柱形壁上具有水平排放开口。 房间通过门关闭。 将过程或冲洗液体引入室中。 液体升高到一定水平，使得工件浸入液体中。 腔室缓慢地枢转或旋转以将排水口向下移动到液体的高度。 液体通过排水口排出。 排水口保持在液体表面附近，以均匀的速度排出液体。 在液体上方引入有机溶剂蒸汽，以帮助防止液体液滴排出时残留在工件上。 转子旋转工件以帮助通过离心力去除任何剩余的液滴。

公开(公告)号：US20030010352A1

公开(公告)日：2003-01-16

申请号：US09907485

申请日：2001-07-16

Applicant: Semitool, Inc.

Inventor： Eric Bergman ,  Dana Scranton ,  Eric Lund ,  Worm Lund

IPC: B08B003/12 ,  B08B003/04 ,  B08B007/04

CPC classification number: B08B3/12 ,  Y10S134/902

Abstract: A system for processing a workpiece includes an inner chamber pivotably supported within an outer chamber. The inner chamber has an opening to allow liquid to drain out. A motor pivots the inner chamber to bring the opening at or below the level of liquid in the inner chamber. As the inner chamber turns, liquid drains out. Workpieces within the inner chamber are supported on a holder or a rotor, which may be fixed or rotating. Multi processes may be performed within the inner chamber, reducing the need to move the workpieces between various apparatus and reducing risk of contamination.

Abstract translation: 用于处理工件的系统包括可枢转地支撑在外室内的内室。 内室具有开口以允许液体排出。 电动机使内腔枢转，使开口处于内腔液面之下或之下。 当内室转动时，液体排出。 内腔内的工件支撑在可固定或旋转的支架或转子上。 多个工艺可以在内腔内执行，减少了在各种装置之间移动工件的需要，并减少污染的风险。