公开(公告)号：US06598593B1

公开(公告)日：2003-07-29

申请号：US09869803

申请日：2001-09-27

申请人： Shigeki Kanamaru ,  Hideo Horibe

发明人： Shigeki Kanamaru ,  Hideo Horibe

IPC分类号： F02M3704

CPC分类号： F02M37/103 ,  F02M2037/225

摘要： A fuel supply apparatus mounting structure in which a set plate for holding a fuel supply apparatus is not corroded or deteriorated by the exposure to salt for thawing snow sprayed in winter in cold districts or to salt particles contained in sea wind in coastal areas is provided. The fuel supply apparatus mounting structure comprises a fuel pump 2 disposed within a fuel tank for pumping fuel to an internal combustion engine, a set plate 3 made of a synthetic resin and holding the fuel pump 2 and closing an opening hole 1a in the fuel tank 1, a gasket for maintaining airtight between the set plate 3 and the fuel tank 1, and a plate 4 for fastening the set plate 3 to the fuel tank 1, and a protective member 6, 8 made of a material which is not reacted, dissolved or deteriorated by a reaction product generated by a chemical reaction occurring between the plate 4 and the set plate 3 is inserted.

摘要翻译： 一种燃料供给装置安装结构，其中设置用于保持燃料供应装置的固定板不会被暴露在盐中的冷冻地区冬季喷洒的雪或在沿海地区的海风中含有的盐颗粒中而被腐蚀或劣化。 燃料供给装置安装结构包括设置在燃料箱内的燃料泵2，用于将燃料泵送到内燃机，由合成树脂制成的固定板3，并且保持燃料泵2并关闭燃料箱中的开孔1a 1，用于在固定板3和燃料箱1之间保持气密的垫圈和用于将固定板3紧固到燃料箱1的板4和由未反应的材料制成的保护构件6,8， 通过在板4和固定板3之间发生的化学反应产生的反应产物溶解或劣化。

公开(公告)号：US5981146A

公开(公告)日：1999-11-09

申请号：US789560

申请日：1997-01-28

申请人： Teruhiko Kumada ,  Atsuko Sasahara ,  Youko Tanaka ,  Hideo Horibe ,  Shigeru Kubota ,  Hiroshi Koezuka ,  Tetsuro Hanawa

发明人： Teruhiko Kumada ,  Atsuko Sasahara ,  Youko Tanaka ,  Hideo Horibe ,  Shigeru Kubota ,  Hiroshi Koezuka ,  Tetsuro Hanawa

IPC分类号： G03F7/38 ,  G03F7/004 ,  G03F7/09 ,  G03F7/095 ,  H01L21/027 ,  G03C1/73

CPC分类号： H01L21/0274 ,  G03F7/0045 ,  G03F7/092 ,  G03F7/095 ,  Y10S430/122

摘要： When a fine pattern is formed by using a chemical-amplification-type resist film, fall of acid in the surface of the resist can be inhibited so that a fine pattern exhibiting an excellent shape is formed. A resist coating film containing a compound having a sulfonic acid group or a carbonic acid group is formed on a chemical-amplification-type resist film of a semiconductor substrate, followed by performing exposure.

摘要翻译： 当通过使用化学放大型抗蚀剂膜形成精细图案时，可以抑制抗蚀剂表面中的酸的下降，从而形成表现出优异形状的精细图案。 在半导体衬底的化学放大型抗蚀剂膜上形成含有具有磺酸基或碳酸基的化合物的抗蚀剂涂膜，然后进行曝光。

公开(公告)号：US06399252B1

公开(公告)日：2002-06-04

申请号：US09402442

申请日：1999-12-27

申请人： Makiko Kise ,  Shoji Yoshioka ,  Jun Aragane ,  Hiroaki Urushibata ,  Hisashi Shiota ,  Hideo Horibe ,  Shigeru Aihara ,  Daigo Takemura

发明人： Makiko Kise ,  Shoji Yoshioka ,  Jun Aragane ,  Hiroaki Urushibata ,  Hisashi Shiota ,  Hideo Horibe ,  Shigeru Aihara ,  Daigo Takemura

IPC分类号： H01B124

CPC分类号： H01M4/043 ,  H01M2/348 ,  H01M4/02 ,  H01M4/04 ,  H01M4/0402 ,  H01M4/0416 ,  H01M4/131 ,  H01M4/1391 ,  H01M4/62 ,  H01M4/624 ,  H01M4/625 ,  H01M6/16 ,  H01M10/0525 ,  H01M10/4235 ,  H01M2004/021 ,  H01M2200/106

摘要： An electrode for a battery which increases resistivity with increasing temperature. The electrode has an electron conductive material containing a conductive filler and a resin so as to increase its resistivity with increasing temperature. This solves the problem of the prior art where the battery temperature rises above a temperature at which the separator melts and flows due to an internal short circuit, with a large short circuit current being generated between the positive and negative electrodes at portions where the separator flows to cause heat generation to further increase the battery temperature. As a result, the short circuit current increases further.

摘要翻译： 一种用于随着温度升高而增加电阻率的电池用电极。 该电极具有含有导电填料和树脂的电子传导材料，从而随温度升高而增加其电阻率。 这解决了现有技术的问题，其中电池温度升高到分离器由于内部短路而熔化和流动的温度之上，在正极和负极之间在分离器流动的部分处产生大的短路电流 引起发热，进一步提高电池温度。 结果，短路电流进一步增加。

公开(公告)号：US06955178B1

公开(公告)日：2005-10-18

申请号：US10626517

申请日：2003-07-25

申请人： Masaki Kuzumoto ,  Seiji Noda ,  Izumi Oya ,  Makoto Miyamoto ,  Hideo Horibe ,  Tatsuo Kataoka ,  Tetsuji Oishi

发明人： Masaki Kuzumoto ,  Seiji Noda ,  Izumi Oya ,  Makoto Miyamoto ,  Hideo Horibe ,  Tatsuo Kataoka ,  Tetsuji Oishi

IPC分类号： B08B7/00 ,  C23G5/00 ,  G03F7/42 ,  H01L21/00 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  B08B5/00 ,  H01L21/461

CPC分类号： H01L21/6708 ,  B08B7/00 ,  G03F7/422 ,  Y10S134/902

摘要： A substrate treatment apparatus includes a substrate heating device for maintaining a substrate at a temperature higher than room temperature, a wetting device for producing a wet ozone-containing gas by wetting an ozone-containing gas with a treatment solution, and a supply device for supplying the wet ozone-containing gas from the wetting device to a work object on a surface of the substrate. The supply device includes a gas disperser including apertures aligned in rows in a width direction of the work object. The apertures in adjacent rows are not aligned with each other in a direction perpendicular to the rows. At least one of the gas disperser and the substrate is movable in a direction perpendicular to the rows. A gas conduit connects the wetting device to the supply device. A wet ozone-containing gas heating device heats the wet ozone-containing gas to a temperature at least equal to the temperature of the substrate.

摘要翻译： 一种基板处理装置，具备：将基板保持在比室温以上的温度下的基板加热装置，通过用处理液润湿含臭氧的气体来生产含湿臭氧的气体的润湿装置，以及供给装置 来自润湿装置的湿臭氧的气体到基板表面上的工件。 供给装置包括气体分散器，其包括在工作对象的宽度方向上成行排列的孔。 相邻行中的孔在垂直于行的方向上彼此不对齐。 气体分散器和基板中的至少一个可以在垂直于行的方向上移动。 气体管道将润湿装置连接到供应装置。 含湿臭氧的气体加热装置将含湿臭氧的气体加热至至少等于基板温度的温度。

公开(公告)号：US06773633B2

公开(公告)日：2004-08-10

申请号：US10116029

申请日：2002-04-05

申请人： Makiko Kise ,  Shoji Yoshioka ,  Jun Aragane ,  Hiroaki Urushibata ,  Hisashi Shiota ,  Hideo Horibe ,  Shigeru Aihara ,  Daigo Takemura

发明人： Makiko Kise ,  Shoji Yoshioka ,  Jun Aragane ,  Hiroaki Urushibata ,  Hisashi Shiota ,  Hideo Horibe ,  Shigeru Aihara ,  Daigo Takemura

IPC分类号： H01B116

CPC分类号： H01M4/043 ,  H01M2/348 ,  H01M4/02 ,  H01M4/04 ,  H01M4/0402 ,  H01M4/0416 ,  H01M4/131 ,  H01M4/1391 ,  H01M4/62 ,  H01M4/624 ,  H01M4/625 ,  H01M6/16 ,  H01M10/0525 ,  H01M10/4235 ,  H01M2004/021 ,  H01M2200/106

摘要： Conventional batteries have the problem that, when battery temperature rises above a temperature at which the separator melts and flows due to an internal short-circuit, a large short-circuit current is generated between the positive and negative electrodes, that further raises the battery temperature. As a result, the short-circuit current further increases. The inventive electrode increases its resistivity with increasing temperature, and a processing for producing the electrode is disclosed. The electrode of the invention has an electron conductive material containing a conductive filler and a resin and increases its resistivity with increasing temperature.

摘要翻译： 传统的电池存在如下问题：当电池温度升高到由于内部短路而熔化和流动的温度以上时，在正极和负极之间产生大的短路电流，从而进一步提高电池温度 。 结果，短路电流进一步增加。 本发明的电极随着温度升高而增加其电阻率，并且公开了用于制造电极的处理。 本发明的电极具有含有导电填料和树脂的电子传导材料，并且随温度升高而增加其电阻率。

公开(公告)号：US06616773B1

公开(公告)日：2003-09-09

申请号：US09686061

申请日：2000-10-11

申请人： Masaki Kuzumoto ,  Seiji Noda ,  Izumi Oya ,  Makoto Miyamoto ,  Hideo Horibe ,  Tatsuo Kataoka ,  Tetsuji Oishi

发明人： Masaki Kuzumoto ,  Seiji Noda ,  Izumi Oya ,  Makoto Miyamoto ,  Hideo Horibe ,  Tatsuo Kataoka ,  Tetsuji Oishi

IPC分类号： B08B300

CPC分类号： H01L21/6708 ,  B08B7/00 ,  G03F7/422 ,  Y10S134/902

摘要： A substrate treatment assembly for treating a work object on a surface of a substrate by supplying to the work object a wet ozone-containing gas wetted with a treatment solution includes a substrate heating device for maintaining a substrate at a temperature higher than room temperature, a wetting device for producing a wet ozone-containing gas by wetting an ozone-containing gas with a treatment solution, a supply device for supplying the wet ozone-containing gas to a work object on a surface of the substrate, a gas conduit connecting the wetting device to the supply device, and a heating device for heating the wet ozone-containing gas to a temperature approximately equal to or greater than the temperature of the substrate.

摘要翻译： 一种基板处理组件，用于通过向处理对象物供给湿润的含臭氧的气体来处理基板表面上的工件，所述基底处理组件包括用于将基板保持在高于室温的温度的基板加热装置， 润湿装置，用于通过用处理溶液润湿含臭氧的气体来产生含湿臭氧的气体;供应装置，用于将湿的含臭氧的气体供应到基板的表面上的工件;连接润湿剂的气体导管 装置，以及用于将含湿臭氧的气体加热到大约等于或大于基板的温度的温度的加热装置。

公开(公告)号：US5204218A

公开(公告)日：1993-04-20

申请号：US717281

申请日：1991-06-17

申请人： Teruhiko Kumada ,  Youko Tanaka ,  Hideo Horibe ,  Shigeru Kubota ,  Hiroshi Koezuka

发明人： Teruhiko Kumada ,  Youko Tanaka ,  Hideo Horibe ,  Shigeru Kubota ,  Hiroshi Koezuka

IPC分类号： G03F7/004 ,  G03F7/028 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/0045

摘要： Disclosed herein is a photosensitive resin composition containing:a photobase generator expressed in the following general formula (I): ##STR1## where R.sub.1, R.sub.2 and R.sub.3 are individually selected from the group consisting of hydrogen, halogen, alkyl groups, alkenyl groups, alkinyl groups, phenyl groups and alkoxy groups; anda base-catalytic reaction compound which is cured or decomposed under basic conditions.

摘要翻译： 本文公开了一种感光性树脂组合物，其含有：以下通式（I）表示的光碱产生剂：其中R 1，R 2和R 3分别选自氢，卤素，烷基，烯基 基团，炔基，苯基和烷氧基; 和在碱性条件下固化或分解的碱催化反应化合物。

公开(公告)号：US5100762A

公开(公告)日：1992-03-31

申请号：US549736

申请日：1990-07-09

申请人： Youko Tanaka ,  Shigeru Kubota ,  Hideo Horibe ,  Hiroshi Koezuka ,  Teruhiko Kumada

发明人： Youko Tanaka ,  Shigeru Kubota ,  Hideo Horibe ,  Hiroshi Koezuka ,  Teruhiko Kumada

IPC分类号： C08L43/00 ,  G03F7/004 ,  G03F7/075

CPC分类号： G03F7/075 ,  C08L43/00 ,  G03F7/0042

摘要： A radiation-sensitive polymer is capable of resistance to the dry etching when it is applied to form very fine patterns in VLSIs and other semiconductor devices, wherein the polymer is a radiation-sensitive polymer that contains at least one unit represented by the general formula (I): ##STR1## (where X is an alkyl group, a halogen atom or a halogenated alkyl group; R.sup.1 is an alkyl group, an alkoxy or an aryl group; R.sup.2 is carbon monoxide; M is Si, Ge, Sn, Ti, Mo or W; k is a number defined by the valence of (M minus 1); and l is zero or a positive integer), and which optionally contains at least one unit represented by the general formula (II): ##STR2## (where Y is an alkyl group, a halogen atom or a halogenated alkyl group; R.sup.3 is an alkyl group or an aryl group) and/or at least one unit represented by the general formula (III):--SO.sub.2 --R.sup.4 (III)(where R.sup.4 is a divalent alkyl or aryl group).

摘要翻译： 当辐射敏感聚合物被施加以在VLSI和其它半导体器件中形成非常精细的图案时，能够耐干蚀刻，其中该聚合物是含有至少一个由通式表示的单元的辐射敏感性聚合物 I）：其中X是烷基，卤原子或卤代烷基; R 1是烷基，烷氧基或芳基; R 2是一氧化碳; M是Si，Ge， Sn，Ti，Mo或W; k是由（M-1）的化合价定义的数字; l是0或正整数），并且任选地含有至少一个由通式（II）表示的单元： （II）（其中Y是烷基，卤原子或卤代烷基; R3是烷基或芳基）和/或至少一个由通式（III）表示的单元： - SO 2 -R 4（III）（其中R 4是二价烷基或芳基）。