Alignment apparatus in projection exposure apparatus
    1.
    发明授权
    Alignment apparatus in projection exposure apparatus 失效
    投影曝光装置中的对准装置

    公开(公告)号:US6153886A

    公开(公告)日:2000-11-28

    申请号:US407610

    申请日:1999-09-28

    IPC分类号: G03F9/00 G01N21/86

    CPC分类号: G03F9/7065 G03F9/7088

    摘要: An alignment apparatus according to the present invention is constructed, for example, which is arranged in an exposure apparatus provided with a projection optical system which projects a predetermined pattern formed on a mask onto a substrate under exposure light, which performs relative positioning between the mask and the substrate, which has light irradiating means for irradiating alignment light in a wavelength region different from that of exposure light onto an alignment mark formed on the substrate through the projection optical system and detecting means for detecting light from the alignment mark through the projection optical system, wherein, for alignment light as irradiation light traveling toward the alignment mark and alignment light as detection light from the alignment mark, there are provided correction optical elements for irradiation light and correction optical elements for detection light to cause axial chromatic aberration and magnification chromatic aberration in the opposite directions to axial chromatic aberration and magnification chromatic aberration of the projection optical system between the mask and the substrate, wherein the alignment light is multi-colored light with a plurality of beams different in wavelength from each other in the wavelength region different from that of exposure light, and wherein the correction optical elements for irradiation light or the correction optical elements for detection light each are provided in correspondence with the plurality of beams different in wavelength.

    摘要翻译: 根据本发明的对准装置例如被构造成设置在具有投影光学系统的曝光装置中,该投影光学系统将在掩模上形成的预定图案投影到曝光光下的基板上,该曝光装置执行掩模 以及基板,其具有用于通过投影光学系统将与曝光光不同的波长区域中的对准光照射到形成在基板上的对准标记上的光照射装置和用于通过投影光学器件检测来自对准标记的光的检测装置 系统,其中,对于作为向对准标记行进的照射光的对准光和作为来自对准标记的检测光的对准光,设置有用于照射光的校正光学元件和用于检测光的校正光学元件,以产生轴向色差和倍率色彩 像差 在与掩模和基板之间的投影光学系统的轴向色差和倍率色差的相反方向上,其中对准光是具有多个不同波长区域的波长不同的多个光束的多色光 曝光用光,并且其中用于照射光的校正光学元件或用于检测光的校正光学元件各自对应于波长不同的多个光束。

    Image capture apparatus, signal processing apparatus, signal processing method and computer program product
    2.
    发明申请
    Image capture apparatus, signal processing apparatus, signal processing method and computer program product 审中-公开
    图像采集装置,信号处理装置,信号处理方法和计算机程序产品

    公开(公告)号:US20080088715A1

    公开(公告)日:2008-04-17

    申请号:US11974937

    申请日:2007-10-15

    申请人: Shigeru Hagiwara

    发明人: Shigeru Hagiwara

    IPC分类号: H04N5/228 H04N5/335

    CPC分类号: H04N5/3653 H04N5/37213

    摘要: An image capture apparatus includes a charge coupled device (CCD), an analog front end circuit, and a control unit. The CCD individually output an image capture signal corresponding to each of divided areas of an image capture area through a horizontal CCD. The analog front end circuit includes an amplifier and a digital converting unit for converting into digital data. The control unit controls a drive level of a reset gate signal for resetting process of the horizontal CCD, and controls the drive level of the reset gate signal according to a gain setting value of the amplifier to lower the drive level of the reset gate signal when the gain setting value of the amplifier is relatively low, and to raise the drive level of the reset gate signal when the gain setting value of the amplifier is relatively high.

    摘要翻译: 图像捕获装置包括电荷耦合器件(CCD),模拟前端电路和控制单元。 CCD通过水平CCD分别输出与图像捕获区域的每个分割区域相对应的图像捕获信号。 模拟前端电路包括用于转换成数字数据的放大器和数字转换单元。 控制单元控制用于水平CCD的复位处理的复位门信号的驱动电平,并且根据放大器的增益设置值来控制复位门信号的驱动电平,以降低复位门信号的驱动电平, 当放大器的增益设定值相对较高时,放大器的增益设定值相对较低,并且提高复位门信号的驱动电平。

    Air cleaning apparatus used for an exposure apparatus
    3.
    发明授权
    Air cleaning apparatus used for an exposure apparatus 失效
    用于曝光装置的空气净化装置

    公开(公告)号:US5685895A

    公开(公告)日:1997-11-11

    申请号:US513152

    申请日:1995-08-09

    IPC分类号: B01D53/04 B01D53/30 G03F7/20

    摘要: A chemical filter for removing a chemical impurity is arranged at an air inlet, and a gas sensor for adsorbing the chemical impurity is arranged upstream of the chemical filter. The service life of the chemical filter is determined on the basis of the resonance frequency of the gas sensor. Alternatively, the chemical filter has a specific portion whose removal capacity for the chemical impurity is lower than that of the rest, and a sensor for sensing the chemical impurity is arranged downstream of the specific portion. The service life of the chemical filter is predicted on the basis of an output from the sensor.

    摘要翻译: 用于除去化学杂质的化学过滤器布置在空气入口处,并且用于吸附化学杂质的气体传感器设置在化学过滤器的上游。 基于气体传感器的共振频率确定化学过滤器的使用寿命。 或者,化学过滤器具有其化学杂质的去除能力低于其余部分的特定部分,并且用于感测化学杂质的传感器布置在特定部分的下游。 基于传感器的输出预测化学过滤器的使用寿命。

    Image signal processing apparatus, image pickup apparatus, image signal processing method, and computer program product
    4.
    发明授权
    Image signal processing apparatus, image pickup apparatus, image signal processing method, and computer program product 失效
    图像信号处理装置,图像拾取装置,图像信号处理方法和计算机程序产品

    公开(公告)号:US08175408B2

    公开(公告)日:2012-05-08

    申请号:US11974866

    申请日:2007-10-15

    申请人: Shigeru Hagiwara

    发明人: Shigeru Hagiwara

    IPC分类号: G06K9/40 H04N5/335 H04N3/14

    CPC分类号: H04N5/3653 H04N5/37213

    摘要: An image signal processing apparatus for performing signal processing with respect to output from an image pickup device, which includes an image signal correcting unit for receiving an output signal corresponding to each of divided areas of the image pickup device to perform correcting processing. The image signal processing unit includes a calculating unit for calculating a total sum of pixel values of a string of pixels on a boundary between the divided areas, and further calculating a difference between the total sums of pixel values corresponding to the respective divided areas, and a correcting unit for making a comparison between the difference calculated by the calculating unit with a predetermined threshold, and then determining a correction mode of a divided area image based on the result of the comparison, followed by performing pixel value correcting processing with respect to the divided area image according to the determined correction mode.

    摘要翻译: 一种图像信号处理装置,用于执行关于从图像拾取装置的输出的信号处理,该图像信号处理装置包括用于接收与图像拾取装置的每个分割区域相对应的输出信号的图像信号校正单元,以执行校正处理。 图像信号处理单元包括计算单元,用于计算分割区域之间的边界上的像素串的像素值的总和,并且还计算与各个分割区域对应的像素值的总和之间的差,以及 校正单元,用于将由所述计算单元计算的差与预定阈值进行比较,然后基于所述比较结果确定分割区域图像的校正模式,接着对所述比较结果执行像素值校正处理 根据确定的校正模式划分区域图像。

    Exposure apparatus
    5.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号:US06686989B2

    公开(公告)日:2004-02-03

    申请号:US10084352

    申请日:2002-02-28

    IPC分类号: G03B2752

    摘要: In the exposure apparatus of the present invention, a sealed chamber defined by a first lens and a second lens in an input lens system on a plane of incidence of a fly-eye lens in an illumination optical system is provided. In a gas exchanging step, the impurity gas in the sealed chamber is first exhausted through an electromagnetic valve provided with a check valve and a gas exhaust pipe, using a gas exhaust pump and then, a high-purity nitrogen gas is supplied from a gas bomb through a gas supply pipe and an electromagnetic valve provided with a check valve to the sealed chamber. Using a pressure sensor provided in the sealed chamber, the gas exchanging step is repeated while maintaining an amount of change in pressure in the sealed chamber within a predetermined allowable range, to thereby reduce the concentration of impurities in the gas in the sealed chamber to a target value.

    摘要翻译: 在本发明的曝光装置中,设置由投影透镜系统中的第一透镜和第二透镜限定的在照明光学系统中的飞眼透镜的入射平面上的密封室。 在气体交换步骤中,密封室中的杂质气体首先通过使用排气泵的具有止回阀和排气管的电磁阀排出,然后从气体中提供高纯度氮气 通过气体供给管和设置有止回阀的电磁阀向密封室内进行炸弹。 使用设置在密封室中的压力传感器,重复气体交换步骤,同时将密封室中的压力变化量保持在预定允许范围内,从而将密封室中的气体中的杂质浓度降低至 目标价值。

    Exposure apparatus
    6.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号:US06222610B1

    公开(公告)日:2001-04-24

    申请号:US09047478

    申请日:1998-03-25

    IPC分类号: G03B2752

    摘要: In the exposure apparatus of the present invention, a sealed chamber defined by a first lens and a second lens in an input lens system on a plane of incidence of a fly-eye lens in an illumination optical system is provided. In a gas exchanging step, the impurity gas in the sealed chamber is first exhausted through an electromagnetic valve provided with a check valve and a gas exhaust pipe, using a gas exhaust pump and then, a high-purity nitrogen gas is supplied from a gas bomb through a gas supply pipe and an electromagnetic valve provided with a check valve to the sealed chamber. Using a pressure sensor provided in the sealed chamber, the gas exchanging step is repeated while maintaining an amount of change in pressure in the sealed chamber within a predetermined allowable range, to thereby reduce the concentration of impurities in the gas in the sealed chamber to a target value.

    摘要翻译: 在本发明的曝光装置中,设置由投影透镜系统中的第一透镜和第二透镜限定的在照明光学系统中的飞眼透镜的入射平面上的密封室。 在气体交换步骤中,密封室中的杂质气体首先通过使用排气泵的具有止回阀和排气管的电磁阀排出,然后从气体中提供高纯度氮气 通过气体供给管和设置有止回阀的电磁阀向密封室内进行炸弹。 使用设置在密封室中的压力传感器,重复气体交换步骤,同时将密封室中的压力变化量保持在预定允许范围内,从而将密封室中的气体中的杂质浓度降低至 目标价值。

    Exposing apparatus
    7.
    发明授权
    Exposing apparatus 失效
    曝光装置

    公开(公告)号:US5381210A

    公开(公告)日:1995-01-10

    申请号:US160950

    申请日:1993-12-03

    申请人: Shigeru Hagiwara

    发明人: Shigeru Hagiwara

    CPC分类号: G03F9/70

    摘要: An exposing apparatus which has an alignment apparatus for detecting the relative positional relation between a mask having a pattern for transfer formed thereon and a photosensitive substrate having an alignment mark thereon by applying alignment light to the alignment mark and which exposes the photosensitive substrate to exposure light transmitted through the pattern for transfer, through a projection optical system includes an alignment optical system for causing the alignment light to pass at least once through the projection optical system, the alignment light being of a wavelength in the vicinity of three times the wavelength of the exposure light.

    摘要翻译: 一种曝光装置,其具有对准装置,用于通过向对准标记施加取向光并且将感光基板曝光于曝光光来检测其上具有转印图案的掩模与其上具有对准标记的感光基板之间的相对位置关系 透射通过用于传送的图案,通过投影光学系统包括用于使对准光至少一次通过投影光学系统的对准光学系统,对准光的波长在三分之一波长附近 曝光灯

    Image pickup apparatus, image signal processing circuit and image signal processing method as well as computer program
    8.
    发明授权
    Image pickup apparatus, image signal processing circuit and image signal processing method as well as computer program 失效
    图像拾取装置,图像信号处理电路和图像信号处理方法以及计算机程序

    公开(公告)号:US08040404B2

    公开(公告)日:2011-10-18

    申请号:US12237711

    申请日:2008-09-25

    申请人: Shigeru Hagiwara

    发明人: Shigeru Hagiwara

    CPC分类号: H04N5/335

    摘要: The present invention provides an image pickup apparatus, including: an image pickup section of the plural channel output type configured to output signals individually corresponding to divisional regions of an image pickup device; a plurality of signal processing sections configured to individually receive the output signals of the plural channels of the image pickup device as inputs thereto to produce digital data corresponding to pixel values, and a digital signal processing section configured to receive the pixel value data produced by the signal processing sections as inputs thereto to execute an image correction process.

    摘要翻译: 本发明提供一种图像拾取装置,包括:多通道输出类型的图像拾取部分,被配置为输出分别对应于图像拾取装置的分割区域的信号; 多个信号处理部,被配置为分别接收所述图像拾取装置的多个通道的输出信号作为其输入,以产生对应于像素值的数字数据;以及数字信号处理部,被配置为接收由所述像素值生成的像素值数据 信号处理部分作为其输入,以执行图像校正处理。

    Stage Apparatus and Exposure Apparatus
    9.
    发明申请
    Stage Apparatus and Exposure Apparatus 审中-公开
    舞台装置和曝光装置

    公开(公告)号:US20080239257A1

    公开(公告)日:2008-10-02

    申请号:US11575044

    申请日:2005-09-08

    IPC分类号: G03B27/52

    CPC分类号: G03F7/70775 G03F7/70858

    摘要: A stage apparatus which can highly accurately measure the position of a stage, while achieving a high throughput, and an exposure apparatus provided with the stage apparatus. A stage apparatus is provided with: air-conditioning apparatuses (28X, 28Y) that supply temperature controlled air (down flow), which comes from a +Z direction to a −Z direction, to a light path of a laser beam radiated from a laser interferometer onto moving mirrors (26X, 26Y) provided on a wafer stage (WST); and an air conditioning apparatus (29) that supplies temperature controlled air (lower layer side flow), which comes from a −Y direction to a +Y direction, to a space lower than the light path of the laser beam. Furthermore, an air conditioning apparatus (34), which supplied temperature controlled air to a light path of an autofocusing sensor composed of an irradiation optical system (33a) and a light receiving optical system (33b), is provided.

    摘要翻译: 能够高精度地测量台的位置,同时实现高产量的舞台装置和设置有舞台装置的曝光装置。 舞台装置具有:将从+ Z方向到-Z方向的温度受控空气(下流)供给到辐射的激光束的光路的空调装置(28X,28Y) 从激光干涉仪到设置在晶片台(WST)上的移动反射镜(26X,26Y)上; 以及将温度控制空气(下层侧流)从-Y方向向+ Y方向供给到比激光的光路低的空间的空调装置(29)。 此外,提供了一种将温度控制的空气供给到由照射光学系统(33a)和光接收光学系统(33b)组成的自动聚焦传感器的光路的空调装置(34)。

    Optical illumination device
    10.
    发明授权
    Optical illumination device 失效
    光学照明装置

    公开(公告)号:US5906429A

    公开(公告)日:1999-05-25

    申请号:US900880

    申请日:1997-07-25

    IPC分类号: H01L21/027 G03F7/20 F21V9/00

    摘要: An optical illumination device reflects and condenses light from a mercury-arc lamp by a light reflecting and condensing member and then reflects and deflects the light, thereafter the reflected and deflected light is transferred to a relay-lens system through a collimator lens or input lens, band-pass filter and fly-eye lens. Gas from which impurities are removed by a filter is flown around optical elements to separate the optical elements from air containing material causing clouding of the optical elements to thereby restrain clouding of the optical elements. On the other hand, or in addition, the reflectance of the light reflecting and condensing member and/or miller for the light of the absorption band of sulfur dioxide is made small to prevent the optical elements from clouding.

    摘要翻译: 光学照明装置通过光反射和聚光构件反射并冷凝来自汞弧灯的光,然后使光反射和偏转,然后将反射和偏转的光通过准直透镜或输入透镜传递到中继透镜系统 带通滤光片和飞眼镜片。 通过过滤器除去杂质的气体在光学元件周围流动,以将光学元件与包含空气的材料分离,导致光学元件的混浊,从而抑制光学元件的混浊。 另一方面,或者另外,使二氧化硫的吸收带的光的反射和聚光部件和/或研磨机的反射率变小,以防止光学元件变得混浊。