Stage Apparatus and Exposure Apparatus
    1.
    发明申请
    Stage Apparatus and Exposure Apparatus 审中-公开
    舞台装置和曝光装置

    公开(公告)号:US20080239257A1

    公开(公告)日:2008-10-02

    申请号:US11575044

    申请日:2005-09-08

    IPC分类号: G03B27/52

    CPC分类号: G03F7/70775 G03F7/70858

    摘要: A stage apparatus which can highly accurately measure the position of a stage, while achieving a high throughput, and an exposure apparatus provided with the stage apparatus. A stage apparatus is provided with: air-conditioning apparatuses (28X, 28Y) that supply temperature controlled air (down flow), which comes from a +Z direction to a −Z direction, to a light path of a laser beam radiated from a laser interferometer onto moving mirrors (26X, 26Y) provided on a wafer stage (WST); and an air conditioning apparatus (29) that supplies temperature controlled air (lower layer side flow), which comes from a −Y direction to a +Y direction, to a space lower than the light path of the laser beam. Furthermore, an air conditioning apparatus (34), which supplied temperature controlled air to a light path of an autofocusing sensor composed of an irradiation optical system (33a) and a light receiving optical system (33b), is provided.

    摘要翻译: 能够高精度地测量台的位置,同时实现高产量的舞台装置和设置有舞台装置的曝光装置。 舞台装置具有:将从+ Z方向到-Z方向的温度受控空气(下流)供给到辐射的激光束的光路的空调装置(28X,28Y) 从激光干涉仪到设置在晶片台(WST)上的移动反射镜(26X,26Y)上; 以及将温度控制空气(下层侧流)从-Y方向向+ Y方向供给到比激光的光路低的空间的空调装置(29)。 此外,提供了一种将温度控制的空气供给到由照射光学系统(33a)和光接收光学系统(33b)组成的自动聚焦传感器的光路的空调装置(34)。

    Exposure method and apparatus
    4.
    发明授权
    Exposure method and apparatus 失效
    曝光方法和装置

    公开(公告)号:US06961113B1

    公开(公告)日:2005-11-01

    申请号:US09979749

    申请日:2000-05-26

    IPC分类号: G03F7/20 G03B27/52 G03B27/42

    CPC分类号: G03F7/70883

    摘要: An exposure apparatus transfers a pattern of a mask onto a substrate and includes a covering member which is disposed in the exposure apparatus and which substantially isolates a predetermined spacing from outside gas. The covering member includes a first thin film made of a first material which blocks penetration of the outside gas with respect to the predetermined spacing and a second thin film having a low degasification property and made of a second material of at least one of a metal and an inorganic substance. An exposure method transfers a pattern of a mask onto a substrate and includes the steps of isolating a part spacing of an optical path spacing for an exposure beam which transfers the pattern of the mask onto the substrate from outside gas by using such a covering member.

    摘要翻译: 曝光装置将掩模的图案转印到基板上,并且包括设置在曝光装置中并且与外部气体大致隔离预定间隔的覆盖部件。 覆盖构件包括由第一材料制成的第一薄膜,其阻止外部气体相对于预定间隔的渗透,以及具有低脱气性能的第二薄膜,并由金属和 无机物质。 曝光方法将掩模的图案转印到基板上,并且包括以下步骤:隔离通过使用这种覆盖部件从外部气体将掩模的图案转移到基板上的曝光光束的光程间隔的部分间隔。

    Method and apparatus for measuring position of pattern formed on a
substrate having a thickness
    5.
    发明授权
    Method and apparatus for measuring position of pattern formed on a substrate having a thickness 失效
    用于测量在具有厚度的基底上形成的图案的位置的方法和装置

    公开(公告)号:US5671054A

    公开(公告)日:1997-09-23

    申请号:US581974

    申请日:1996-01-02

    申请人: Masaya Iwasaki

    发明人: Masaya Iwasaki

    IPC分类号: G01B11/30 G03F7/20

    CPC分类号: G03F7/70483 G01B11/306

    摘要: The thickness of a substrate is one of the most important parameters in detecting the flexure of the substrate. The thickness of a reference substrate disposed on a stage and its amount of flexure are measured. Thus measured data are stored in a memory of apparatus. Then, the apparatus measures the thickness of a substrate to be measured. The data concerning thus measured thickness of the substrate to be measured and the data concerning the thickness and amount of flexure of the reference substrate stored in the memory are utilized to calculate the amount of flexure of the substrate to be measured. This apparatus measures the pattern position of the substrate to be measured in thus flexed state. The apparatus corrects thus measured pattern position of the substrate to be measured on the basis of the amount of flexure which has been indirectly measured as mentioned above.

    摘要翻译: 衬底的厚度是检测衬底弯曲度的最重要的参数之一。 测量设置在载物台上的参考基板的厚度和挠曲量。 这样测量的数据被存储在设备的存储器中。 然后,该装置测量待测基板的厚度。 利用与被测定基板相关的测量厚度的数据以及存储在存储器中的参考基板的厚度和挠曲量的数据来计算待测基板的挠曲量。 该装置在这样弯曲的状态下测量被测量基板的图案位置。 该设备基于如上所述间接测量的挠曲量来校正所测量的待测基材的图案位置。

    Ink-jet printer head
    6.
    发明授权
    Ink-jet printer head 失效
    喷墨打印头

    公开(公告)号:US5400061A

    公开(公告)日:1995-03-21

    申请号:US863115

    申请日:1992-04-03

    IPC分类号: B41J2/05 B41J2/14 B41J2/06

    摘要: An improved ink-jet printer of the so-called current flow type wherein a current is passed through a conductive ink contained between a pair of electrodes so as to cause the ink to become vaporized and cause trapped gasses or bubbles to expand suddenly, exerting a sufficient pressure upon the ink to force a droplet of ink from a nozzle is disclosed, wherein at least one projection of electrically insulating material is disposed between the pair of electrode for increasing the density of the current at a position directly below a nozzle. With the projection thus provided, only a limited portion of the conductive ink participates in the generation of heat, and boiling of the conductive ink takes place only at the position directly below the nozzle. Accordingly, droplets of conductive ink are produced with minimum power consumption and can be ejected in a uniform direction. The position where boiling of the conductive ink takes place is remote from the electrodes, so that the electrodes are substantially free from cavitation and thermal shock and, hence, they have a long life span.

    摘要翻译: 一种改进的所谓电流流动型喷墨打印机,其中电流通过一对电极之间的导电油墨,以使油墨变得汽化,并使截留的气体或气泡突然膨胀,从而施加 公开了对油墨施加足够的压力以从喷嘴强制墨滴,其中电绝缘材料的至少一个突起设置在该对电极之间,以增加在喷嘴正下方的位置处的电流密度。 利用如此提供的突起,只有导电油墨的有限部分参与产生热量,并且导电油墨的沸腾仅在喷嘴正下方的位置发生。 因此,以最小的功率消耗产生导电油墨的液滴,并且可以沿均匀的方向喷射。 发生导电油墨沸腾的位置远离电极,使得电极基本上没有空化和热冲击,因此它们具有长的寿命。

    Electrofusion joint
    7.
    发明授权
    Electrofusion joint 失效
    电熔接头

    公开(公告)号:US06840546B2

    公开(公告)日:2005-01-11

    申请号:US10067853

    申请日:2002-02-08

    摘要: The invention provides an electrofusion joint made of a thermoplastic resin for connection with a resin pipe by heat generation of heating wires embedded in its saddle portion through electric conduction, such as a saddle joint comprising a saddle portion to be fitted to an outer circumferential surface of a resin pipe provided with heating wires embedded in its surface to be joined to the resin pipe, also comprising a spigot projecting from the saddle portion and to which a branch pipe is to be connected, or a service tee joint comprising a saddle portion in which heating wires are embedded, a trunk portion projecting from the saddle portion and a spigot projecting in a lateral direction from the trunk portion. A recess is formed in a part on the collar portion side along the base of the spigot of the saddle joint or trunk portion of the service tee joint, to increase the length from the recess to the collar portion where a latch of a clamping device is engaged, so that the collar portion becomes sufficiently flexible to achieve closer contact with the pipe and to prevent defective fusion welding, even though wall thickness or rigidity of the saddle portion is large.

    摘要翻译: 本发明提供了一种由热塑性树脂制成的电熔接头,用于通过导热而嵌入其鞍座部分中的加热丝线与树脂管连接,例如包括鞍形部分的鞍形接头,该鞍形接头装配到外部圆周表面 该树脂管设置有嵌入其表面的加热丝,以连接到树脂管,还包括从鞍座部分突出并与分支管连接的插口或包括鞍座部分的服务三通接头,其中 嵌入加热线,从鞍部突出的主干部分和从主体部分沿横向方向突出的插口。 凹槽形成在颈部部分侧的沿着鞍座接头或服务三通接头的主干部分的接头的底部的部分中,以增加从凹部到套环部分的长度,其中夹持装置的闩锁 使得套环部分变得足够柔性以实现与管的更紧密接触并且即使壁鞍部的壁厚或刚度大,也可防止熔焊不良。

    Projection exposure apparatus and manufacturing and adjusting methods thereof

    公开(公告)号:US06621556B2

    公开(公告)日:2003-09-16

    申请号:US09785197

    申请日:2001-02-20

    IPC分类号: G03B2742

    CPC分类号: G03F7/70066 G03B27/42

    摘要: With respect to a projection exposure apparatus in which a reticle is illuminated with an exposure beam and a wafer is exposed with the exposure beam via a projection optical system, the projection optical system is mounted on a frame mechanism slidable on a level block, and a wafer stage system is provided, on the level block, inside of the frame mechanism. Further, in order to pull the projection optical system out of the main body of the projection exposure apparatus, an adjustment table is provided separately from the level block, and after the wafer stage system being moved, the frame mechanism is moved onto the adjustment table, in a state that the frame mechanism is supporting the projection optical system.