摘要:
A method of detecting relative positional deviation of first and second substrates, wherein first and second marks with optical powers are formed on the first and second substrates. A radiation beam is projected to the first substrate and, as a result, the first and second marks produce a signal beam whose position of incidence upon a predetermined plane is changeable with the relative positional deviation of the first and second substrates. A sensor is disposed adjacent to the predetermined plane and receives the signal beam to produce an output signal corresponding to the position of incidence of the signal beam upon the sensor. Here, a reference mark is provided to produce, when irradiated with a radiation beam, a reference beam so that it advances along a light path substantially the same as the light path for the signal beam to the sensor when the first and second substrates are in a predetermined positional relation. The produced reference beam is received by the sensor, whereby a reference signal corresponding to the position of incidence of the reference beam upon the sensor is obtained. The relative position of the first and second substrates can be detected on the basis of the output signal and the reference signal.
摘要:
A device for detecting the positional relationship between first and second objects in a predetermined direction includes a light source for emitting light in a direction to the first or second object, and a first detecting portion for detecting the position of incidence of a first light deflected by the first and second objects, wherein the position of incidence of the first light upon the first detecting portion is changeable with a change in the positional relationship between the first and second objects in the predetermined direction. A second detecting portion detects the position of incidence of a second light deflected by at least one of the first and second objects, wherein the state of the position of incidence of the second light resulting from a change in the positional relationship between the first and second objects, in the predetermined direction differs from that of the first light. On the basis of the detection by the first and second detecting portions, the positional relationship between the first and second objects is detected without being affected by an inclination thereof.
摘要:
A device usable with a first object and a second object at least one of which is provided with a diffraction grating, for detecting the position of the second object relative to the first object, is disclosed. The device includes a light source for projecting a position detecting beam upon the first object; a beam detecting portion for receiving the position detecting beam after it is directed from the first object and being incident on the second object, the beam detecting portion receiving the position detecting beam to detect the position of the second object relative to the first object; wherein at least one diffraction grating is disposed in the path of the position detecting beam to be received by the beam detecting portion, which diffraction grating is effective to diffract the position detecting beam at least twice and wherein the beam detecting portion is disposed at a site effective not to receive unwanted diffraction light produced from the or at least one diffraction grating.
摘要:
An alignment system for aligning a mask and a wafer into a predetermined positional relationship uses alignment marks provided on the mask and the water. In this system, light from a light source is directed to the alignment marks of the mask and the wafer and, then, the light from these alignment marks is detected by an accumulation type photoelectric converting device, for alignment of the mask and the wafer. The accumulation time of the photoelectric converting device is controlled to be sufficiently longer than or to be equal to a multiple, by an integral number, of the period of relative and natural vibration of the mask and the wafer. This makes it possible to reduce the effect of the relative vibration of the mask and the wafer upon the alignment result and, therefore, makes it possible to enhance the alignment precision.
摘要:
In a system for transmitting a video signal obtained by a camera to a discrete device either via a recording/reproducing system or via a transmission line, an image processing system includes a circuit which is arranged within the camera to generate a photo-taking state signal indicating information on aberrations in particular; and a correction circuit which is arranged within a device for reproducing or receiving the video signal to correct the aberrations of the video signal in accordance with the photo-taking state signal.
摘要:
A multi-lens imaging apparatus comprises a plurality of imaging optical systems in which an angle formed by optical axes is varied by inclining an optical axis of at least one optical system between a first state and a second state, and a plurality of image sensing means for detecting an image of an object imaged through the imaging optical systems. A photosensitive surface of the image sensing means corresponding to the at least one optical system is inclined with respect to the optical axis, and the inclined angle is established between an imaging surface being conjugated with the object surface in the first state and an imaging surface being conjugated with the subject surface in the second state, thereby reducing unsharpness amount generating at the periphery portions of the screen.
摘要:
A method of detecting a positional deviation between a mask and a wafer, wherein a radiation beam having a predetermined intensity distribution is projected to an alignment pattern of the mask whereby a signal beam is produced, and wherein the positional deviation of the mask and the wafer is determined on the basis of the signal beam. The improvements reside in detecting a deviation of the position of incidence of the radiation beam upon the mask from a predetermined position, on the basis of the signal beam; relatively positioning the radiation beam and the mask so as to substantially correct the detected deviation; and determining the positional deviation of the mask and the wafer by using the relatively positioned radiation beam.
摘要:
A device for detecting positional relationship between a first and second objects in a predetermined direction is disclosed. The device includes light source for projecting light upon the first object so that the light incident on the first object is deflected thereby and emanates therefrom in a direction perpendicular to the predetermined direction; a light receiving portion disposed in a direction in which the light having been deflected perpendicularly to the predetermined direction and having been deflected again by the second object advances, the light receiving portion being operable to detect the position of incidence of the light thereupon, wherein the position of the light upon the light receiving means is changeable with the position of incidence of the light upon the second object; and a detecting system for detecting the positional relationship between the first and second objects in the predetermined direction, on the basis of the detection by the light receiving portion.
摘要:
A device for detecting a positional relationship between opposed first and second objects, with respect to a first direction perpendicular to the opposing direction. The device includes a light source for projecting light to the first and second objects, a photodetecting portion for receiving light from one of the first and second objects irradiated with the light from the light source, the photodetecting portion being operable to detect a predetermined parameter related to the light, which parameter is changeable with the positional relationship between the first and second objects with respect to the first direction, a first position detecting system for detecting a positional relationship between the first and second objects, with respect to a second direction perpendicular to the opposing direction of the first and second objects and having an angle with respect to the first direction, and a second position detecting system for detecting the positional relationship between the first and second objects with respect to the first direction, on the basis of the detection by the photodetecting system and the first position detecting system.
摘要:
A telephoto lens is provided, in succession from the object side to the image surface side, with a first lens component having a positive refractive power and a second lens component having a negative refractive power. At least one curved lens surface of the second lens component is inclined relative to the optic axis to thereby deflect the image. Particularly the lens surface which near the image surface is inclined.