公开(公告)号：US5343291A

公开(公告)日：1994-08-30

申请号：US851109

申请日：1992-03-16

申请人： Mitsutoshi Ohwada ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Minoru Yoshii ,  Yukichi Niwa ,  Noriyuki Nose ,  Kenji Saitoh ,  Masanobu Hasegawa

发明人： Mitsutoshi Ohwada ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Minoru Yoshii ,  Yukichi Niwa ,  Noriyuki Nose ,  Kenji Saitoh ,  Masanobu Hasegawa

IPC分类号： G03F9/00 ,  G01B11/02

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for measuring an interval between two plate-like objects includes a light source for projecting a light toward the objects, a detector for detecting a position of incidence, upon a predetermined surface, of the light projected by the light source and deflected by the two objects, and a calculating portion for measuring the interval of the two objects on the basis of the detection by the detector.

摘要翻译： 用于测量两个板状物体之间的间隔的装置包括：用于向物体投射光的光源;检测器，用于检测由光源投射并被光源偏转的预定表面上的入射位置; 两个物体和用于根据检测器的检测来测量两个物体的间隔的计算部分。

公开(公告)号：US5396335A

公开(公告)日：1995-03-07

申请号：US800271

申请日：1991-12-02

申请人： Masanobu Hasegawa ,  Kenji Saitoh ,  Shigeyuki Suda

发明人： Masanobu Hasegawa ,  Kenji Saitoh ,  Shigeyuki Suda

IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/00

CPC分类号： G03F9/7088 ,  G03F9/7076

摘要： A method of detecting a positional deviation between a mask and a wafer, wherein a radiation beam having a predetermined intensity distribution is projected to an alignment pattern of the mask whereby a signal beam is produced, and wherein the positional deviation of the mask and the wafer is determined on the basis of the signal beam. The improvements reside in detecting a deviation of the position of incidence of the radiation beam upon the mask from a predetermined position, on the basis of the signal beam; relatively positioning the radiation beam and the mask so as to substantially correct the detected deviation; and determining the positional deviation of the mask and the wafer by using the relatively positioned radiation beam.

摘要翻译： 一种检测掩模和晶片之间的位置偏差的方法，其中具有预定强度分布的辐射束被投射到掩模的对准图案，由此产生信号光束，并且其中掩模和晶片的位置偏差 是基于信号光束确定的。 改进在于基于信号光束检测辐射束对掩模的入射位置与预定位置的偏差; 相对地定位辐射束和掩模，以便基本上校正检测到的偏差; 以及通过使用相对定位的辐射束来确定掩模和晶片的位置偏差。

公开(公告)号：US5327221A

公开(公告)日：1994-07-05

申请号：US919380

申请日：1992-07-29

申请人： Kenji Saitoh ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Yukichi Niwa ,  Ryo Kuroda ,  Noriyuki Nose ,  Minoru Yoshii ,  Naoto Abe ,  Mitsutoshi Ohwada

发明人： Kenji Saitoh ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Yukichi Niwa ,  Ryo Kuroda ,  Noriyuki Nose ,  Minoru Yoshii ,  Naoto Abe ,  Mitsutoshi Ohwada

IPC分类号： G03F9/00 ,  G01B9/02

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for detecting the positional relationship between first and second objects in a predetermined direction includes a light source for emitting light in a direction to the first or second object, and a first detecting portion for detecting the position of incidence of a first light deflected by the first and second objects, wherein the position of incidence of the first light upon the first detecting portion is changeable with a change in the positional relationship between the first and second objects in the predetermined direction. A second detecting portion detects the position of incidence of a second light deflected by at least one of the first and second objects, wherein the state of the position of incidence of the second light resulting from a change in the positional relationship between the first and second objects, in the predetermined direction differs from that of the first light. On the basis of the detection by the first and second detecting portions, the positional relationship between the first and second objects is detected without being affected by an inclination thereof.

摘要翻译： 一种用于检测在预定方向上的第一和第二物体之间的位置关系的装置包括：用于沿与第一或第二物体的方向发射光的光源;以及第一检测部分，用于检测第一和第二物体偏转的第一光的入射位置 第一和第二物体，其中在第一检测部分上的第一光的入射位置随预定方向上第一和第二物体之间的位置关系的改变而改变。 第二检测部分检测由第一和第二物体中的至少一个偏转的第二光的入射位置，其中由第一和第二物体之间的位置关系的变化引起的第二光的入射位置的状态 在预定方向上的物体与第一光不同。 基于第一和第二检测部分的检测，检测第一和第二物体之间的位置关系，而不受其倾斜的影响。

公开(公告)号：US5200800A

公开(公告)日：1993-04-06

申请号：US892732

申请日：1992-05-29

申请人： Shigeyuki Suda ,  Kenji Saitoh ,  Minoru Yoshii ,  Noriyuki Nose

发明人： Shigeyuki Suda ,  Kenji Saitoh ,  Minoru Yoshii ,  Noriyuki Nose

IPC分类号： G03F9/00

CPC分类号： G03F9/7076

摘要： A method of detecting a position of a substrate having an alignment mark includes the steps of projecting a radiation beam from an optical head to the alignment mark such that the alignment mark produces a signal beam on the basis of which the position of the substrate is detected, forming a reference mark on the substrate at a position different from that of the alignment mark, projecting a radiation beam from the optical head to the reference mark, such that the reference mark produces a reference beam, detecting the relative positional deviation of the optical head relative to the reference mark on the basis of the produced reference beam, and adjusting the relative position of the optical head and the alignment mark on the basis of the detected relative positional deviation and, after the adjustment, detecting the position of the substrate on the basis of the produced signal beam.

摘要翻译： 检测具有对准标记的基板的位置的方法包括以下步骤：将来自光学头的辐射束投射到对准标记，使得对准标记产生信号光束，基于该信号光束检测基板的位置 在与所述对准标记不同的位置的基板上形成参考标记，将来自所述光学头的辐射束投射到所述基准标记，使得所述基准标记产生参考光束，检测所述光学器件的相对位置偏差 基于所生成的参考光束相对于参考标记的头部，并且基于检测到的相对位置偏差来调整光学头和对准标记的相对位置，并且在调整之后，检测基板的位置 产生信号光束的基础。

公开(公告)号：US5319444A

公开(公告)日：1994-06-07

申请号：US20464

申请日：1993-02-22

申请人： Kenji Saitoh ,  Masakazu Matsugu ,  Yukichi Niwa ,  Noriyuki Nose ,  Minoru Yoshii ,  Shigeyuki Suda

发明人： Kenji Saitoh ,  Masakazu Matsugu ,  Yukichi Niwa ,  Noriyuki Nose ,  Minoru Yoshii ,  Shigeyuki Suda

IPC分类号： G03F9/00 ,  G01B11/14 ,  G01N21/86

CPC分类号： G03F9/7049

摘要： A method of detecting relative positional deviation between first and second objects. The method includes the steps of providing the first object with a first mark which functions as a lens, providing the second object with a second mark which functions as a lens, providing an optical system between the first and second objects, directing a radiation beam through the first mark and the optical system to the second mark, and detecting any shift of the radiation beam from the second mark irradiated with the radiation beam from the optical system, to detect the relative positional deviation of the first and second objects.

摘要翻译： 一种检测第一和第二物体之间的相对位置偏差的方法。 该方法包括以下步骤：向第一物体提供用作透镜的第一标记，为第二物体提供用作透镜的第二标记，在第一和第二物体之间提供光学系统，引导辐射束通过 第一标记和第二标记的光学系统，并且检测来自用来自光学系统的辐射束照射的第二标记的辐射束的任何偏移，以检测第一和第二物体的相对位置偏差。

公开(公告)号：US5294980A

公开(公告)日：1994-03-15

申请号：US58662

申请日：1993-05-10

申请人： Masakazu Matsugu ,  Kenji Saitoh ,  Yukichi Niwa ,  Noriyuki Nose ,  Ryo Kuroda ,  Shigeyuki Suda

发明人： Masakazu Matsugu ,  Kenji Saitoh ,  Yukichi Niwa ,  Noriyuki Nose ,  Ryo Kuroda ,  Shigeyuki Suda

IPC分类号： G03F9/00 ,  G01B11/00 ,  G01N21/85

CPC分类号： G03F9/70

摘要： A device for detecting a relative positional relationship between first and second objects with respect to a predetermined direction includes an illumination system for irradiating the first object with light, wherein the first and second objects are provided with first and second physical optic elements, respectively, each having a light converging or diverging function in at least one direction and wherein the illumination system illuminates the first physical optic element. A photodetecting system detects light passing through the first object and emanating from the second object, and is operable to detect light convergently or divergently influenced by both of the first and physical optic elements, such that the relative positional relationship between the first and second objects can be detected on the basis of the detection by the photodetecting system. At least one of the first and second physical optic elements has a light converging or diverging function in a direction perpendicular to the one direction and has different focal lengths in the perpendicular direction and in the one direction.

摘要翻译： 用于检测相对于预定方向的第一和第二物体之间的相对位置关系的装置包括用于用光照射第一物体的照明系统，其中第一和第二物体分别设置有第一和第二物理光学元件， 在至少一个方向上具有聚光或发散功能，并且其中所述照明系统照亮所述第一物理光学元件。 光检测系统检测穿过第一物体并从第二物体发出的光，并且可操作以从第一物理光学元件和物理光学元件两者收敛或分散地检测光，使得第一和第二物体之间的相对位置关系 基于光检测系统的检测来检测。 第一和第二物理光学元件中的至少一个在垂直于一个方向的方向上具有聚光或发散功能，并且在垂直方向和一个方向上具有不同的焦距。

公开(公告)号：US5325176A

公开(公告)日：1994-06-28

申请号：US875601

申请日：1992-04-28

申请人： Shigeyuki Suda ,  Kenji Saitoh ,  Masakazu Matsugu ,  Naoto Abe ,  Minoru Yoshii ,  Ryo Kuroda

发明人： Shigeyuki Suda ,  Kenji Saitoh ,  Masakazu Matsugu ,  Naoto Abe ,  Minoru Yoshii ,  Ryo Kuroda

IPC分类号： G03F9/00 ,  G01B11/02

CPC分类号： G03F9/7076

摘要： A device usable with a first object and a second object at least one of which is provided with a diffraction grating, for detecting the position of the second object relative to the first object, is disclosed. The device includes a light source for projecting a position detecting beam upon the first object; a beam detecting portion for receiving the position detecting beam after it is directed from the first object and being incident on the second object, the beam detecting portion receiving the position detecting beam to detect the position of the second object relative to the first object; wherein at least one diffraction grating is disposed in the path of the position detecting beam to be received by the beam detecting portion, which diffraction grating is effective to diffract the position detecting beam at least twice and wherein the beam detecting portion is disposed at a site effective not to receive unwanted diffraction light produced from the or at least one diffraction grating.

摘要翻译： 公开了一种可用于第一物体和第二物体的装置，其中至少一个具有用于检测第二物体相对于第一物体的位置的衍射光栅。 该装置包括用于将位置检测光束投射到第一物体上的光源; 光束检测部分，用于在从第一物体引导之后接收位置检测光束并入射到第二物体上，光束检测部分接收位置检测光束以检测第二物体相对于第一物体的位置; 其中至少一个衍射光栅设置在所述位置检测光束的路径中，以由所述光束检测部分接收，所述衍射光栅有效地将所述位置检测光束衍射至少两次，并且其中所述光束检测部分设置在位置 有效地不接收由该至少一个衍射光栅产生的不想要的衍射光。

公开(公告)号：US5235408A

公开(公告)日：1993-08-10

申请号：US888434

申请日：1992-05-28

申请人： Masakazu Matsugu ,  Kenji Saitoh ,  Shigeyuki Suda

发明人： Masakazu Matsugu ,  Kenji Saitoh ,  Shigeyuki Suda

IPC分类号： G03F9/00

CPC分类号： G03F9/7049

摘要： A device for detecting a positional relationship between a mask and a wafer, includes a light source for projecting light toward the mask, a first photodetecting system for detecting the position, on a predetermined plane, of first light deflected by the mask and the wafer, wherein the position of incidence on the first photodetecting system of the first light is changeable with the positional relationship between the mask and the wafer, a second photodetecting system for detecting the position, on a predetermined plane, of incidence of second light deflected by the mask, wherein the position of incidence on the second photodetecting system, of the second light being changeable with relative inclination between the mask and the light source, and a position detecting system for detecting the relative position of the mask and the wafer on the basis of the detection by the first and second photodetecting systems, wherein the detection by the position detecting system can be free from the relative inclination between the mask and the light source.

摘要翻译： 一种用于检测掩模和晶片之间的位置关系的装置，包括用于将光投射到掩模的光源，用于检测由掩模和晶片偏转的第一光在预定平面上的位置的第一光电检测系统， 其中，所述第一光的第一受光系统上的入射位置可根据所述掩模和所述晶片之间的位置关系而改变;第二光电检测系统，用于检测由所述掩模偏转的第二光在预定平面上的位置的位置; 其特征在于，所述第二光检测系统中的所述入射位置，所述第二光的入射位置可以通过所述掩模和所述光源之间的相对倾斜度而变化;以及位置检测系统，用于基于所述掩模和所述光源检测所述掩模和所述晶片的相对位置 由第一和第二光电检测系统进行检测，其中位置检测系统的检测可以不受 面罩与光源之间的相对倾斜度。

公开(公告)号：US5162656A

公开(公告)日：1992-11-10

申请号：US841790

申请日：1992-03-02

申请人： Masakazu Matsugu ,  Kenji Saitoh ,  Shigeyuki Suda ,  Ryo Kuroda ,  Yukichi Niwa ,  Noriyuki Nose

发明人： Masakazu Matsugu ,  Kenji Saitoh ,  Shigeyuki Suda ,  Ryo Kuroda ,  Yukichi Niwa ,  Noriyuki Nose

IPC分类号： G03F9/00

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for detecting positional relationship between a first and second objects in a predetermined direction is disclosed. The device includes light source for projecting light upon the first object so that the light incident on the first object is deflected thereby and emanates therefrom in a direction perpendicular to the predetermined direction; a light receiving portion disposed in a direction in which the light having been deflected perpendicularly to the predetermined direction and having been deflected again by the second object advances, the light receiving portion being operable to detect the position of incidence of the light thereupon, wherein the position of the light upon the light receiving means is changeable with the position of incidence of the light upon the second object; and a detecting system for detecting the positional relationship between the first and second objects in the predetermined direction, on the basis of the detection by the light receiving portion.

摘要翻译： 公开了一种用于检测预定方向上的第一和第二物体之间的位置关系的装置。 该装置包括用于将光投射到第一物体上的光源，使得入射在第一物体上的光由此偏转，并在垂直于预定方向的方向上从其发出; 光接收部分沿着垂直于预定方向偏转并被第二物体再次偏转的方向设置的方向延伸，光接收部分可操作以检测其上的光的入射位置，其中， 光在光接收装置上的位置可随着第二物体上的光入射位置而改变; 以及检测系统，用于基于光接收部分的检测来检测第一和第二物体在预定方向上的位置关系。

公开(公告)号：US06157452A

公开(公告)日：2000-12-05

申请号：US754474

申请日：1996-11-25

申请人： Masanobu Hasegawa ,  Kenji Saitoh

发明人： Masanobu Hasegawa ,  Kenji Saitoh

IPC分类号： G01B11/00 ,  G01D5/347 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68

CPC分类号： G01D5/347 ,  G03F9/7049 ,  G03F9/7076

摘要： A position detecting system for detecting relative positional relationship between first and second objects disposed opposed to each other, includes a first mark formed on the first object and provided by a physical optic element, a second mark formed on the second object and provided by a physical optic element, a light projecting portion for projecting onto the first object a radiation beam having a predetermined light intensity distribution, a light detecting portion for detecting first light diffracted by the first mark and diffracted by the second mark, and second light diffracted by at least one of the first and second marks at a diffraction order different from that of the first light, an adjusting device for adjusting the position of incidence of the radiation beam upon the first object on the basis of first and second signals, of signals detected by the light detecting portion, corresponding to the first and second lights, respectively, and a determining portion for determining the relative positional relationship between the first and second objects on the basis of the detection of the first and second signals by the light detecting portions.

摘要翻译： 一种位置检测系统，用于检测彼此相对设置的第一和第二物体之间的相对位置关系，包括形成在第一物体上并由物理光学元件提供的第一标记，形成在第二物体上的第二标记并由物理 光学元件，用于向第一物体投射具有预定光强分布的辐射束的光投射部分，用于检测由第一标记衍射的第一光并被第二标记衍射的光检测部分，以及至少被衍射的第二光 在与第一光不同的衍射阶段的第一和第二标记之一，调整装置，用于根据第一和第二信号调整辐射束在第一物体上的入射位置，由第 光检测部分，分别对应于第一和第二光，以及用于确定的确定部分 基于光检测部分对第一和第二信号的检测，得到第一和第二物体之间的相对位置关系。