公开(公告)号：US07265898B2

公开(公告)日：2007-09-04

申请号：US11024319

申请日：2004-12-27

申请人： Shih-Yuan Wang ,  Miao Zhu ,  Zuhua Zhu ,  Haiqing Wei ,  Saif M. Islam

发明人： Shih-Yuan Wang ,  Miao Zhu ,  Zuhua Zhu ,  Haiqing Wei ,  Saif M. Islam

IPC分类号： H01S3/00

CPC分类号： B82Y20/00 ,  H01S5/3413 ,  H01S5/50 ,  H01S5/5027 ,  H01S5/5063 ,  H01S5/5072 ,  H01S2301/02

摘要： A semiconductor optical amplifier (SOA) apparatus and related methods are described. The SOA comprises a signal waveguide for guiding an optical signal along a signal path, and further comprises one or more laser cavities having a gain medium lying outside the signal waveguide, the gain medium being sufficiently close to the signal waveguide such that, when the gain medium is pumped with an excitation current, the optical signal traveling down the signal waveguide is amplified by an evanescent coupling effect with the laser cavity. When the gain medium is sufficiently pumped to cause lasing action in the laser cavity, gain-clamped amplification of the optical signal is achieved. Additional features relating to segmented laser cavities, separate pumping of laser cavity segments, DFB/DBR gratings, current profiling to improve ASE noise performance, coupled-cavity lasers, avoidance of injection locking effects, manipulation of gain curve peaks, integration with a tunable vertical cavity coupler, integration with a photodetector, integration with an RZ signal modulator, and other described features may be used with the evanescent coupling case or with an SOA having a laser cavity gain medium that is coextensive with the gain medium of the signal waveguide.

摘要翻译： 描述了一种半导体光放大器（SOA）装置及相关方法。 SOA包括用于沿着信号路径引导光信号的信号波导，并且还包括一个或多个具有位于信号波导外部的增益介质的激光腔，增益介质足够靠近信号波导，使得当增益 介质用激励电流泵浦，沿信号波导下行的光信号通过与激光腔的ev逝耦合效应放大。 当增益介质被充分泵送以在激光腔中引起激光作用时，实现光信号的增益钳位放大。 与分段激光腔相关的附加特征，激光腔段的独立泵浦，DFB / DBR光栅，电流分析以改善ASE噪声性能，耦合腔激光器，避免注入锁定效应，操纵增益曲线峰值，与可调谐垂直线 空腔耦合器，与光电检测器的集成，与RZ信号调制器的集成以及其它所描述的特征可以与ev逝耦合壳体或具有与信号波导的增益介质共同延伸的激光腔增益介质的SOA一起使用。

公开(公告)号：US06836357B2

公开(公告)日：2004-12-28

申请号：US10006435

申请日：2001-12-04

申请人： Shih-Yuan Wang ,  Miao Zhu ,  Zuhua Zhu ,  Haiqing Wei ,  Saif M. Islam

发明人： Shih-Yuan Wang ,  Miao Zhu ,  Zuhua Zhu ,  Haiqing Wei ,  Saif M. Islam

IPC分类号： H01S300

CPC分类号： B82Y20/00 ,  H01S5/3413 ,  H01S5/50 ,  H01S5/5027 ,  H01S5/5063 ,  H01S5/5072 ,  H01S2301/02

摘要： A semiconductor optical amplifier (SOA) apparatus and related methods are described. The SOA comprises a signal waveguide for guiding an optical signal along a signal path, and further comprises one or more laser cavities having a gain medium lying outside the signal waveguide, the gain medium being sufficiently close to the signal waveguide such that, when the gain medium is pumped with an excitation current, the optical signal traveling down the signal waveguide is amplified by an evanescent coupling effect with the laser cavity. When the gain medium is sufficiently pumped to cause lasing action in the laser cavity, gain-clamped amplification of the optical signal is achieved. Additional features relating to segmented laser cavities, separate pumping of laser cavity segments, DFB/DBR gratings, current profiling to improve ASE noise performance, coupled-cavity lasers, avoidance of injection locking effects, manipulation of gain curve peaks, integration with a tunable vertical cavity coupler, integration with a photodetector, integration with an RZ signal modulator, and other described features may be used with the evanescent coupling case or with an SOA having a laser cavity gain medium that is coextensive with the gain medium of the signal waveguide.

摘要翻译： 描述了一种半导体光放大器（SOA）装置及相关方法。 SOA包括用于沿着信号路径引导光信号的信号波导，并且还包括一个或多个具有位于信号波导外部的增益介质的激光腔，增益介质足够靠近信号波导，使得当增益 介质用激励电流泵浦，沿信号波导下行的光信号通过与激光腔的ev逝耦合效应放大。 当增益介质被充分泵送以在激光腔中引起激光作用时，实现光信号的增益钳位放大。 与分段激光腔相关的附加特征，激光腔段的独立泵浦，DFB / DBR光栅，电流分析以改善ASE噪声性能，耦合腔激光器，避免注入锁定效应，操纵增益曲线峰值，与可调谐垂直线 空腔耦合器，与光电检测器的集成，与RZ信号调制器的集成以及其它所描述的特征可以与ev逝耦合壳体或具有与信号波导的增益介质共同延伸的激光腔增益介质的SOA一起使用。

公开(公告)号：US20050111079A1

公开(公告)日：2005-05-26

申请号：US11024319

申请日：2004-12-27

申请人： Shih-Yuan Wang ,  Miao Zhu ,  Zuhua Zhu ,  Haiqing Wei ,  Saif Islam

发明人： Shih-Yuan Wang ,  Miao Zhu ,  Zuhua Zhu ,  Haiqing Wei ,  Saif Islam

IPC分类号： H01S5/34 ,  H01S5/50 ,  H01S3/00

CPC分类号： B82Y20/00 ,  H01S5/3413 ,  H01S5/50 ,  H01S5/5027 ,  H01S5/5063 ,  H01S5/5072 ,  H01S2301/02

摘要： A semiconductor optical amplifier (SOA) apparatus and related methods are described. The SOA comprises a signal waveguide for guiding an optical signal along a signal path, and further comprises one or more laser cavities having a gain medium lying outside the signal waveguide, the gain medium being sufficiently close to the signal waveguide such that, when the gain medium is pumped with an excitation current, the optical signal traveling down the signal waveguide is amplified by an evanescent coupling effect with the laser cavity. When the gain medium is sufficiently pumped to cause lasing action in the laser cavity, gain-clamped amplification of the optical signal is achieved. Additional features relating to segmented laser cavities, separate pumping of laser cavity segments, DFB/DBR gratings, current profiling to improve ASE noise performance, coupled-cavity lasers, avoidance of injection locking effects, manipulation of gain curve peaks, integration with a tunable vertical cavity coupler, integration with a photodetector, integration with an RZ signal modulator, and other described features may be used with the evanescent coupling case or with an SOA having a laser cavity gain medium that is coextensive with the gain medium of the signal waveguide.

摘要翻译： 描述了一种半导体光放大器（SOA）装置及相关方法。 SOA包括用于沿着信号路径引导光信号的信号波导，并且还包括一个或多个具有位于信号波导外部的增益介质的激光腔，增益介质足够靠近信号波导，使得当增益 介质用激励电流泵浦，沿信号波导下行的光信号通过与激光腔的ev逝耦合效应放大。 当增益介质被充分泵送以在激光腔中引起激光作用时，实现光信号的增益钳位放大。 与分段激光腔相关的附加特征，激光腔段的独立泵浦，DFB / DBR光栅，电流分析以改善ASE噪声性能，耦合腔激光器，避免注入锁定效应，操纵增益曲线峰值，与可调谐垂直线 空腔耦合器，与光电检测器的集成，与RZ信号调制器的集成以及其它所描述的特征可以与ev逝耦合壳体或具有与信号波导的增益介质共同延伸的激光腔增益介质的SOA一起使用。

公开(公告)号：US07068948B2

公开(公告)日：2006-06-27

申请号：US09971831

申请日：2001-10-04

申请人： Haiqing Wei ,  Aly F. Elrefaie ,  Xin Xue ,  Shih-Yuan Wang

发明人： Haiqing Wei ,  Aly F. Elrefaie ,  Xin Xue ,  Shih-Yuan Wang

IPC分类号： H04B10/04

CPC分类号： H04B10/508 ,  G02F2001/212 ,  G02F2203/70

摘要： An optical return-to-zero (RZ) signal generator and related methods are described in which a phase modulator causes a phase change in an optical signal responsive to a transition in a driving signal, and in which an interferometer receives the optical signal from the phase modulator and generates an optical pulse responsive to that phase change. Preferably, the interferometer introduces a fixed, unmodulated time delay between its two signal paths, the fixed time delay being selected such that destructive interference occurs at an output of the interferometer when the phase of the optical signal received from the phase modulator remains constant. However, when a rising or falling edge of the driving signal causes phases changes in the optical signal, the destructive interference at the output of the interferometer is disturbed, and an optical pulse is generated. The driving signal is a differentially encoded version of an input information signal. Alternatively, the driving signal is proportional to the input information signal and the transmitted RZ-formatted optical signal is a differentially encoded version of that signal. Features for regulating the fixed time delay, features for frequency shift compensation, features for loss compensation/equalization, and integrated single-chip and multiple-chip embodiments are also described.

公开(公告)号：US20110281253A1

公开(公告)日：2011-11-17

申请号：US12953724

申请日：2010-11-24

申请人： Haiqing Wei ,  Gang Huang ,  Juhua Mao

发明人： Haiqing Wei ,  Gang Huang ,  Juhua Mao

IPC分类号： G09B7/00

CPC分类号： G09B7/00

摘要： A computer-aided learning system with adaptive optimization is disclosed. The system may comprise a storage module configured for storing learning data; a man-machine interface configured for providing the learning data to at least one learner; an information collection module configured for tracking and recording an interactive learning process; a learning process analysis module configured for receiving the interactional learning process provided by the information collection module, the learning process analysis module further configured for analyzing the interactional learning process and forming a control signal; and a learning strategy generation module configured for receiving the control signal from the learning process analysis module, the learning strategy generation module further configured for generating a learning strategy signal based on the control signal; wherein the man-machine interface is configured to provide the learning data to the at least one learner based on the learning strategy signal.

摘要翻译： 公开了一种具有自适应优化的计算机辅助学习系统。 该系统可以包括被配置为存储学习数据的存储模块; 人机界面，被配置为将学习数据提供给至少一个学习者; 信息收集模块，被配置为跟踪和记录交互式学习过程; 学习过程分析模块，被配置为接收由所述信息收集模块提供的所述交互学习过程，所述学习过程分析模块还被配置用于分析所述交互学习过程并形成控制信号; 以及学习策略生成模块，被配置为从所述学习处理分析模块接收所述控制信号，所述学习策略生成模块还被配置为基于所述控制信号生成学习策略信号; 其中所述人机界面被配置为基于所述学习策略信号将所述学习数据提供给所述至少一个学习者。

公开(公告)号：US20110116800A1

公开(公告)日：2011-05-19

申请号：US13004017

申请日：2011-01-10

申请人： Haiqing Wei

发明人： Haiqing Wei

IPC分类号： H04J14/02 ,  G02B6/00

CPC分类号： H04B10/2531 ,  G02B6/29377 ,  Y10T29/49778

摘要： An optical communications link is described, comprising first and second fiber lines in substantial scaled translational symmetry by a common scaling factor with respect to a second-order dispersion coefficient profile (oppositely signed) and with respect to at least one of a loss/gain coefficient profile and a nonlinear coefficient-power product profile for facilitating progressive compensation along the second fiber line of at least one nonlinearity introduced along the first fiber line.

摘要翻译： 描述了一种光通信链路，其包括通过相对于二阶色散系数分布（相对有符号）的公共缩放因子并且关于损耗/增益系数中的至少一个，以实质上缩放的平移对称性的第一和第二光纤线 简档和非线性系数 - 功率产品简档，用于促进沿着第二光纤线沿着第一光纤线引入的至少一个非线性的逐行补偿。

公开(公告)号：US08838016B2

公开(公告)日：2014-09-16

申请号：US12953724

申请日：2010-11-24

申请人： Haiqing Wei ,  Gang Huang ,  Juhua Mao

发明人： Haiqing Wei ,  Gang Huang ,  Juhua Mao

IPC分类号： G09B3/00 ,  G09B7/00

CPC分类号： G09B7/00

摘要： A computer-aided learning system with adaptive optimization is disclosed. The system may comprise a storage module configured for storing learning data; a man-machine interface configured for providing the learning data to at least one learner; an information collection module configured for tracking and recording an interactive learning process; a learning process analysis module configured for receiving the interactional learning process provided by the information collection module, the learning process analysis module further configured for analyzing the interactional learning process and forming a control signal; and a learning strategy generation module configured for receiving the control signal from the learning process analysis module, the learning strategy generation module further configured for generating a learning strategy signal based on the control signal; wherein the man-machine interface is configured to provide the learning data to the at least one learner based on the learning strategy signal.

摘要翻译： 公开了一种具有自适应优化的计算机辅助学习系统。 该系统可以包括被配置为存储学习数据的存储模块; 人机界面，被配置为将学习数据提供给至少一个学习者; 信息收集模块，被配置为跟踪和记录交互式学习过程; 学习过程分析模块，被配置为接收由所述信息收集模块提供的交互学习过程，所述学习过程分析模块还被配置用于分析所述交互学习过程并形成控制信号; 以及学习策略生成模块，被配置为从所述学习处理分析模块接收所述控制信号，所述学习策略生成模块还被配置为基于所述控制信号生成学习策略信号; 其中所述人机界面被配置为基于所述学习策略信号将所述学习数据提供给所述至少一个学习者。

公开(公告)号：US07941768B1

公开(公告)日：2011-05-10

申请号：US11708299

申请日：2007-02-20

申请人： Haiqing Wei

发明人： Haiqing Wei

IPC分类号： G06F17/50

CPC分类号： G03F7/705

摘要： A method, system, and related computer program products for computer simulation of a photolithographic process is described. In one embodiment, a method for designing an integrated circuit is provided. The geometrical design intent and process condition values are received for at least one process variation associated with a photolithographic process to be used in fabricating the integrated circuit. The photolithographic process is simulated at the process condition values using one or more models characterizing the photolithographic process and the geometrical design intent to generate simulation results.

摘要翻译： 描述了用于光刻工艺的计算机模拟的方法，系统和相关的计算机程序产品。 在一个实施例中，提供了一种用于设计集成电路的方法。 接收与用于制造集成电路的光刻工艺相关联的至少一个工艺变化的几何设计意图和工艺条件值。 使用表征光刻工艺的一个或多个模型和产生模拟结果的几何设计意图在工艺条件值下模拟光刻工艺。

公开(公告)号：US07921383B1

公开(公告)日：2011-04-05

申请号：US11705808

申请日：2007-02-12

申请人： Haiqing Wei

发明人： Haiqing Wei

IPC分类号： G06F17/50

CPC分类号： G03F7/705

摘要： A method, system, and related computer program products and computer-readable numerical arrays for computer simulation of a photolithographic process is described. In one preferred embodiment, simulation of a photolithographic process is provided in which a computation time for computing each subsequent result for each subsequent combination of process variation values and/or target depths is significantly less than a computation time for computing an initial result for an initial combination of the process variation values and/or target depths. Accordingly, where computation for the initial combination requires a first time interval T, results for (N−1) subsequent combinations can be achieved such that a total time interval for the N results is substantially less than NT. Computation of a process model used for the computer simulation is also described, as well as calibration of the process model to a physical photolithographic processing system.

摘要翻译： 描述了用于光刻工艺的计算机模拟的方法，系统和相关的计算机程序产品和计算机可读数字阵列。 在一个优选实施例中，提供光刻处理的模拟，其中用于计算处理变化值和/或目标深度的每个后续组合的每个后续结果的计算时间显着小于用于计算初始结果的初始结果的计算时间 过程变化值和/或目标深度的组合。 因此，在初始组合的计算需要第一时间间隔T时，可以实现（N-1）个后续组合的结果，使得N个结果的总时间间隔显着小于NT。 还描述了用于计算机模拟的过程模型的计算，以及将物理光刻处理系统的过程模型校准。

公开(公告)号：US20100187658A1

公开(公告)日：2010-07-29

申请号：US12532308

申请日：2008-03-20

申请人： Haiqing Wei

发明人： Haiqing Wei

IPC分类号： H01L29/66 ,  G03F7/20 ,  G03F1/00 ,  C23F1/00 ,  H01L21/302

CPC分类号： H01L21/76816 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/3086 ,  H01L21/3088 ,  H01L21/31144 ,  H01L21/32139 ,  Y10S977/888

摘要： A method of fabricating integrated circuits is described. A multi-material hard mask is formed on an underlying layer to be patterned. In a first patterning process, portions of the first material of the hard mask are etched, the first patterning process being selective to etch the first material over the second material. In a second patterning process, portions of the second material of the hard mask are etched, the second patterning process being selective to etch the second material over the first material. The first and second patterning processes forming a desired pattern in the hard mask which is then transferred to the underlying layer.

摘要翻译： 描述了制造集成电路的方法。 在要图案化的下层上形成多材料硬掩模。 在第一图案化工艺中，蚀刻硬掩模的第一材料的部分，第一图案化工艺可选择性地蚀刻第二材料上的第一材料。 在第二图案化工艺中，硬掩模的第二材料的部分被蚀刻，第二图案化工艺可选择性地蚀刻第一材料上的第二材料。 第一和第二图案化处理在硬掩模中形成期望的图案，然后将其转移到下面的层。