公开(公告)号：US20190276932A1

公开(公告)日：2019-09-12

申请号：US15915293

申请日：2018-03-08

申请人： Shimadzu Corporation

发明人： Yuu TOKUTAKE ,  Satoru OZAKI ,  Naoki YOSHIOKA ,  Suguru TANAKA ,  Takaharu NISHIHARA

IPC分类号： C23C16/44 ,  C23C16/513

摘要： A film forming apparatus includes a chamber configured to store a workpiece, an electrode to which power is supplied to form a film on the workpiece, the electrode being disposed in the chamber, and a temperature adjustment device. The temperature adjustment device adjusts a temperature of the electrode so that the temperature of the electrode is kept substantially constant in a film forming process for forming the film on the workpiece and in processes other than the film forming process during a series of film forming processes for forming the film on the workpiece to prevent separation of a film forming material deposited on the electrode from the electrode.

公开(公告)号：US20170067142A1

公开(公告)日：2017-03-09

申请号：US15115563

申请日：2015-01-20

申请人： Shimadzu Corporation

发明人： Akina ICHIOKA ,  Toshinori YOSHIMUTA ,  Satoshi TOKUDA ,  Daisuke IMAI ,  Satoru OZAKI ,  Yuu TOKUTAKE

IPC分类号： C23C14/02 ,  G02B5/08 ,  C23C16/505 ,  C23C14/20 ,  C23C16/40

CPC分类号： C23C14/024 ,  C22C21/00 ,  C23C14/205 ,  C23C16/402 ,  C23C16/505 ,  G02B5/0808

摘要： Provided is a structure configured such that even when resin, such as methacryl resin, exhibiting a low adhesion to a metal thin film is used, the resin and the metal thin film are firmly stacked in close contact with each other, and a film formation method capable of manufacturing a structure in which a metal thin film is, with a high adhesion, formed on a resin work exhibiting a low adhesion to the metal thin film, wherein the structure is configured such that an Al thin film 102 is, by sputtering, formed on a work W made of methacryl resin to form a stack of the work W and the Al thin film 102, and has a mixed region 101 of Al, Si, O, and C between the work W and the Al thin film 102. In the mixed region 101, Al is covalently bound to any one of Si, O, and C, or Al, Si, O, and C form a diffusion mixed layer.

摘要翻译： 提供一种构造成使得即使使用与金属薄膜具有低粘合性的树脂（例如甲基丙烯酸树脂），树脂和金属薄膜彼此紧密地层叠，并且成膜方法 能够制造在与金属薄膜具有低粘合性的树脂工件上形成金属薄膜具有高粘附性的结构，其中该结构被构造成使得Al薄膜102通过溅射， 形成在由甲基丙烯酸树脂制成的工件W上以形成工件W和Al薄膜102的堆叠，并且在工件W和Al薄膜102之间具有Al，Si，O和C的混合区域101。 在混合区域101中，Al与Si，O和C中的任一种共价结合，或Al，Si，O和C形成扩散混合层。