公开(公告)号：US06641962B2

公开(公告)日：2003-11-04

申请号：US10375012

申请日：2003-02-28

申请人： Shinji Mizutani ,  Kazuya Ota ,  Masahiko Yasuda

发明人： Shinji Mizutani ,  Kazuya Ota ,  Masahiko Yasuda

IPC分类号： G03F900

CPC分类号： G03F9/708 ,  G03F9/70 ,  G03F9/7076 ,  G03F9/7084

摘要： An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.

摘要翻译： 根据本发明的曝光方法包括：在基板上形成包括凹凸图案的对准标记的第一步骤; 在所述对准标记和所述基板上的其他区域上形成涂层的第二步骤; 第三步，使所述外套变平; 以及在由所述第三步骤变平的所述涂层上施加感光材料并向其投射掩模图案的第四步骤。 对准标记由所述凹凸图案形成，所述凹凸图案以相对于具有不小于预定值的宽度的相邻凸部之间的预定值小的间距排列。

公开(公告)号：US06306548B1

公开(公告)日：2001-10-23

申请号：US09476208

申请日：1999-12-30

申请人： Shinji Mizutani ,  Kazuya Ota ,  Masahiko Yasuda

发明人： Shinji Mizutani ,  Kazuya Ota ,  Masahiko Yasuda

IPC分类号： G03F900

CPC分类号： G03F9/708 ,  G03F9/70 ,  G03F9/7076 ,  G03F9/7084

摘要： An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.

摘要翻译： 根据本发明的曝光方法包括：在基板上形成包括凹凸图案的对准标记的第一步骤; 在所述对准标记和所述基板上的其他区域上形成涂层的第二步骤; 第三步，使所述外套变平; 以及在由所述第三步骤变平的所述涂层上施加感光材料并向其投射掩模图案的第四步骤。 对准标记由所述凹凸图案形成，所述凹凸图案以相对于具有不小于预定值的宽度的相邻凸部之间的预定值小的间距排列。

公开(公告)号：US06566022B2

公开(公告)日：2003-05-20

申请号：US09930310

申请日：2001-08-16

申请人： Shinji Mizutani ,  Kazuya Ota ,  Masahiko Yasuda

发明人： Shinji Mizutani ,  Kazuya Ota ,  Masahiko Yasuda

IPC分类号： G03F900

CPC分类号： G03F9/708 ,  G03F9/70 ,  G03F9/7076 ,  G03F9/7084

摘要： An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.

公开(公告)号：US5601957A

公开(公告)日：1997-02-11

申请号：US457232

申请日：1995-06-01

申请人： Shinji Mizutani ,  Kazuya Ota ,  Masahiko Yasuda

发明人： Shinji Mizutani ,  Kazuya Ota ,  Masahiko Yasuda

IPC分类号： G03F9/00

CPC分类号： G03F9/708 ,  G03F9/70 ,  G03F9/7076 ,  G03F9/7084

摘要： An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.

摘要翻译： 根据本发明的曝光方法包括：在基板上形成包括凹凸图案的对准标记的第一步骤; 在所述对准标记和所述基板上的其他区域上形成涂层的第二步骤; 第三步，使所述外套变平; 以及在由所述第三步骤变平的所述涂层上施加感光材料并向其投射掩模图案的第四步骤。 对准标记由所述凹凸图案形成，所述凹凸图案以相对于具有不小于预定值的宽度的相邻凸部之间的预定值小的间距排列。

公开(公告)号：US06888621B2

公开(公告)日：2005-05-03

申请号：US10429868

申请日：2003-05-06

申请人： Yasuo Araki ,  Noriaki Tokuda ,  Masahiko Yasuda ,  Shinji Mizutani ,  Hiroaki Narushima

发明人： Yasuo Araki ,  Noriaki Tokuda ,  Masahiko Yasuda ,  Shinji Mizutani ,  Hiroaki Narushima

IPC分类号： G03B27/42 ,  G03B27/50 ,  G03F7/20 ,  G03B27/62 ,  G03F9/00

CPC分类号： G03F7/70866 ,  G03B27/42 ,  G03B27/50

摘要： An exposure apparatus for exposing a substrate with an image of a pattern formed on a mask, including an illumination system or irradiation for illuminating or irradiating the mask with exposure light. A projection optical system is included for projecting, onto the substrate, an image of the pattern illuminated by the exposure light. The mask is securely supported on a movable mask stage. In one example, a mask holder is provided for supporting the mask from below. A pressing member is also included for applying, from above, a prescribed force to the mask, outside of the points supported by the mask holder.

摘要翻译： 一种曝光装置，用于将掩模上形成的图案的图像曝光于基板上，所述图案包括照明系统或用曝光灯照射或照射所述掩模的照射。 包括投影光学系统，用于将由曝光光照射的图案的图像投影到基板上。 掩模被牢固地支撑在可移动的掩模台上。 在一个示例中，提供了用于从下方支撑面罩的面罩支架。 还包括按压构件，用于从上面向面罩施加规定的力，在由面罩保持器支撑的点之外。

公开(公告)号：US07266664B2

公开(公告)日：2007-09-04

申请号：US10077778

申请日：2002-02-20

申请人： Yoshinobu Higuchi ,  Shinji Mizutani ,  Keisuke Kanazawa

发明人： Yoshinobu Higuchi ,  Shinji Mizutani ,  Keisuke Kanazawa

IPC分类号： G06F12/00

CPC分类号： G11C11/005 ,  G06F13/1673 ,  G06F13/1684

摘要： A memory device includes a nonvolatile memory capable of storing data, a volatile memory capable of being random-accessed, and a controller for transferring data between the nonvolatile memory and the volatile memory and enabling a pseudo access as if the volatile memory were externally directly accessed in accordance with an instruction through an external bus when the data transfer is not performed.

摘要翻译： 存储器装置包括能够存储数据的非易失性存储器，能够被随机存取的易失性存储器，以及用于在非易失性存储器和易失性存储器之间传送数据的控制器，并且能够进行伪访问，就好像外部直接访问易失性存储器一样 当不执行数据传输时，根据通过外部总线的指令。

公开(公告)号：US4753599A

公开(公告)日：1988-06-28

申请号：US30525

申请日：1987-03-27

申请人： Sadao Kokubu ,  Yasuo Miyake ,  Shinji Mizutani

发明人： Sadao Kokubu ,  Yasuo Miyake ,  Shinji Mizutani

IPC分类号： B60K35/00 ,  B62D1/10 ,  B62D1/16

CPC分类号： B62D1/105 ,  B60K35/00 ,  Y10T74/20256 ,  Y10T74/20834

摘要： An automotive steering assembly which has a steering pad maintained stationary independently of the steering wheel operation is disclosed. The assembly employs a sun and planetary gear system in transmission of rotary motion to the steering shaft. The steering wheel is rigidly attached to the steering shaft while the sun and planetary gear system contributes to maintenance of the orientation of the steering pad. In the sun and planetary gear system, the role of the sun portion is played by a timing belt whereas that of the planetary portion is played by a rotary gear wheel. The above timing belt and planetary gear wheel are adapted to be disengaged from each other upon entry of foreign matters including sand grains or the like.

摘要翻译： 公开了一种具有独立于方向盘操作而保持静止的转向盘的汽车转向组件。 该组件采用太阳和行星齿轮系统传递转向轴的旋转运动。 方向盘刚性地连接到转向轴，而太阳和行星齿轮系统有助于维护转向盘的方位。 在太阳和行星齿轮系统中，太阳部分的作用由同步带进行，而行星部分的作用由旋转齿轮进行。 上述同步带和行星齿轮适于在进入包括砂粒等的异物时相互脱离。

公开(公告)号：US06184972B2

公开(公告)日：2001-02-06

申请号：US09395602

申请日：1999-09-14

申请人： Shinji Mizutani ,  Hiroaki Narusima

发明人： Shinji Mizutani ,  Hiroaki Narusima

IPC分类号： G03B2758

CPC分类号： G03F7/707 ,  G03F7/70741 ,  G03F7/7075 ,  Y10S269/903

摘要： Spoke shaped (petal shaped) through holes or cavities are provided at the center or a substrate holder which attaches and holds a substrate over substantially the entire surface, to allow vertical movement of a center-up member having a plurality of radially extended spoke shaped mounting portions. As a result, degradation in the flatness of a substrate at the time of attaching the substrate to the mounting surface of the substrate holder is minimized.

摘要翻译： 通过孔或空腔形成的圆盘形（花瓣状）通孔或空腔设置在中心处或衬底保持器，衬底保持器在基本上整个表面上附着并保持衬底，以允许具有多个径向延伸的轮辐形安装件的中心向上构件的垂直运动 部分。 结果，使基板附着于基板支架的安装面时的基板的平坦度的劣化被最小化。

公开(公告)号：US5907405A

公开(公告)日：1999-05-25

申请号：US985906

申请日：1997-12-05

申请人： Shinji Mizutani ,  Nobutaka Magome

发明人： Shinji Mizutani ,  Nobutaka Magome

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B11/00

CPC分类号： G03F7/70425 ,  G03F9/70

摘要： Alignment is performed with a high degree of accuracy by detecting an offset in the Z position of a wafer mark. A focal position detecting system of a multipoint type is provided which irradiates spot beams on a plurality of measurement points substantially equally distributed on the exposure field of an projection optical system and detects the heights or levels of the irradiated positions. An alignment illumination beam for detecting the position of the wafer mark is irradiated as a slit beam from an alignment sensor, and the spot beams are set so as to be overlaid with the irradiated position of the slit beam. A sample shot where the measured value of a level at the irradiated position of the spot beam exceeds an allowable range of the measured value of a level at another measurement point is excluded from alignment data, and the coordinate positions of each shot area on a wafer are calculated by an EGA method.

摘要翻译： 通过检测晶片标记的Z位置的偏移，以高精度执行对准。 提供一种多点式的焦点位置检测系统，其将基本上均匀地分布在投影光学系统的曝光场上的多个测量点上的点光束照射并检测照射位置的高度或水平。 用于检测晶片标记的位置的对准照明光束作为来自对准传感器的狭缝光束照射，并且将点光束设定为与狭缝光束的照射位置重叠。 点光源的照射位置处的电平的测量值超过另一测量点处的电平的测量值的允许范围的采样镜头被排除在对准数据之外，并且晶片上每个照射区域的坐标位置 通过EGA方法计算。

公开(公告)号：US6163366A

公开(公告)日：2000-12-19

申请号：US968422

申请日：1997-11-12

申请人： Hiroki Okamoto ,  Masaharu Kawakubo ,  Shinji Mizutani

发明人： Hiroki Okamoto ,  Masaharu Kawakubo ,  Shinji Mizutani

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/32

CPC分类号： G03F7/70458 ,  G03F7/70883 ,  G03F9/7003

摘要： In the exposure method and apparatus, the distortion data of the projection lens in each exposure unit itself has already been known for each exposure unit. Accordingly, when the exposure unit which formed the alignment target layer has already been known, the known data of this exposure unit is used to correct at least one of the projection magnification and shot rotation determined according to multipoint EGA operation, and the exposure apparatus is adjusted by the amount of this correction. When the exposure unit forming the alignment target layer is unknown, the alignment mark exposure unit is specified from the state of distribution of non-linear error computed from the alignment mark measured values within a shot. Under thus determined correct projection magnification and shot rotation, a shot area is accurately overlaid with and exposed to a reticle pattern.

摘要翻译： 在曝光方法和装置中，每个曝光单元本身已经知道投影透镜的失真数据。 因此，当形成对准目标层的曝光单元已经知道时，该曝光单元的已知数据用于校正根据多点EGA操作确定的投影倍率和镜头旋转中的至少一个，曝光装置 根据这个修正量调整。 当形成对准目标层的曝光单元是未知的时，从对准标记测量值内的非线性误差的分布状态来指定对准标记曝光单元。 在如此确定的正确的投影放大和拍摄旋转下，拍摄区域被准确地覆盖并暴露于标线图案。