公开(公告)号：US06801301B2

公开(公告)日：2004-10-05

申请号：US10265108

申请日：2002-10-07

申请人： Yoshikazu Miyajima ,  Hideki Nogawa

发明人： Yoshikazu Miyajima ,  Hideki Nogawa

IPC分类号： G03B2758

CPC分类号： G03F7/70691 ,  G03F7/70866 ,  G03F7/70933

摘要： An exposure apparatus includes a movable stage, a chuck device which is arranged on the stage and holds a substrate, a first gas supply device for supplying a gas to a position of the substrate to be exposed, and a plurality of divided planar members which are arranged adjacent to a periphery of the substrate such that at least a part of the divided planar members covers a position measurement mirror of the movable stage, and are flush with or substantially flush with a surface of the substrate or a substrate holding surface of the chuck device.

摘要翻译： 曝光装置包括可移动台，布置在平台上并保持基板的卡盘装置，用于将气体供应到要暴露的基板的位置的第一气体供应装置，以及多个分开的平面构件， 布置成与衬底的周边相邻，使得分开的平面构件的至少一部分覆盖可移动台的位置测量镜，并且与衬底的表面或卡盘的衬底保持表面齐平或基本上齐平 设备。

公开(公告)号：US06678038B2

公开(公告)日：2004-01-13

申请号：US09922522

申请日：2001-08-03

申请人： Michael Binnard

发明人： Michael Binnard

IPC分类号： G03B2758

CPC分类号： G03F7/70616

摘要： Apparatus and methods are disclosed for detecting and measuring a tool-induced shift in a microlithography apparatus (“stepper”). The apparatus and methods are set forth in the context of microlithography apparatus that include a wafer stage and a holding member to which the wafer is mounted for exposure. The holding member can include, for example, a wafer table and wafer chuck, wherein the wafer table desirably includes a respective movable mirror for each of X- and Y-directions of movement. The holding member is rotatable, relative to the wafer stage, from a first rotational position to a second rotational position, which can be angularly displaced, e.g., 90° and/or 180° from each other. At each of the first and second rotational positions, a respective location of an alignment feature on the holding member (e.g., on the substrate, wafer chuck, or wafer table) is determined. The respective locations at the first and second rotational positions are compared, and a corresponding tool-induced shift is determined from a detected difference between the respective locations. Rotation of the holding member desirably is effected using a rotary actuator.

摘要翻译： 公开了用于检测和测量微光刻设备（“步进器”）中的工具引起的位移的装置和方法。 该装置和方法在微光刻设备的上下文中阐述，该微光刻设备包括晶圆台和安装晶片以用于曝光的保持构件。 保持构件可以包括例如晶片台和晶片卡盘，其中晶片台期望地包括用于运动的X和Y方向中的每一个的相应的可移动镜。 保持构件可相对于晶片台从第一旋转位置旋转到第二旋转位置，第二旋转位置可以彼此成角度地移位，例如90°和/或180°。 在第一和第二旋转位置的每一个处，确定保持构件（例如，基板，晶片卡盘或晶片台）上的对准特征的相应位置。 比较第一和第二旋转位置处的各个位置，并且根据检测到的各个位置之间的差异来确定对应的工具引起的移动。 保持构件的旋转优选地使用旋转致动器进行。

公开(公告)号：US06642996B2

公开(公告)日：2003-11-04

申请号：US09987211

申请日：2001-11-13

申请人： Hideki Nogawa

发明人： Hideki Nogawa

IPC分类号： G03B2758

CPC分类号： G03F7/70933 ,  G03F7/70866

摘要： A scanning exposure apparatus for exposing a substrate with a pattern formed on an original while scanning the original and the substrate. The apparatus includes a chuck for holding a substrate, a stage for moving the chuck to align the substrate, a mechanism for purging an exposure optical path near the stage with inert gas, the mechanism having a cover covering the exposure optical path between a substrate-side lower end of an optical system and a vicinity of the stage, and a supply port for supplying inert gas into the cover, and a top plate which is mounted on the stage and has a surface substantially flush with a surface of the substrate. The top plate is arranged to form a gap between the top plate and a side surface of the substrate, a depth of the gap is not less than a width of the gap, and a dimension from the side surface of the substrate to an outer edge of the top plate is larger than that of a substrate-side opening of the cover in a scanning direction.

摘要翻译： 一种扫描曝光装置，用于在扫描原件和基板的同时，将原稿上形成的图案曝光于基板。 该装置包括用于保持基板的卡盘，用于使卡盘移动以对准基板的台架，用于利用惰性气体吹扫台架附近的曝光光路的机构，该机构具有覆盖曝光光路的盖板， 光学系统的侧下端和台附近，以及用于向盖中供给惰性气体的供给口以及安装在台上并具有与基板的表面大致齐平的表面的顶板。 顶板被布置成在顶板和基板的侧表面之间形成间隙，间隙的深度不小于间隙的宽度，并且从基板的侧表面到外边缘的尺寸 的顶板的尺寸大于盖的基板侧开口的扫描方向。

公开(公告)号：US06556281B1

公开(公告)日：2003-04-29

申请号：US09575998

申请日：2000-05-23

申请人： Pradeep Kumar Govil ,  Jorge Ivaldi

发明人： Pradeep Kumar Govil ,  Jorge Ivaldi

IPC分类号： G03B2758

CPC分类号： G03F7/70216 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783

摘要： A flexible chuck for supporting a substrate during lithographic processing is described. This flexible chuck includes an electrode layer, a piezoelectric layer disposed on the electrode layer, and a substrate support layer disposed above the piezoelectric layer. By providing electrical signals to the piezoelectric layer through the electrode layer, the support layer can be flexed, thereby changing surface topography on a substrate disposed on the flexible chuck. The contact layer can include projections, each of the projections corresponding to a respective electrode within the electrode layer. Furthermore, the substrate support layer can be formed of a conductive material and thus serve as the ground layer. Alternatively, separate substrate support and ground layers can be provided. The flexible chuck in accordance with the instant invention can be a vacuum chuck. Also described is a method of monitoring topographic changes in a flexible chuck in accordance with the instant invention.

摘要翻译： 描述了在光刻处理期间用于支撑衬底的柔性卡盘。 该柔性卡盘包括电极层，设置在电极层上的压电层和设置在压电层上方的基板支撑层。 通过通过电极层向压电层提供电信号，支撑层可以弯曲，从而改变设置在柔性卡盘上的基板上的表面形貌。 接触层可以包括突起，每个突起对应于电极层内的相应电极。 此外，基板支撑层可以由导电材料形成，因此用作接地层。 或者，可以提供单独的衬底支撑和接地层。 根据本发明的柔性卡盘可以是真空卡盘。 还描述了根据本发明监测柔性卡盘中的地形变化的方法。

公开(公告)号：US06542224B2

公开(公告)日：2003-04-01

申请号：US09943466

申请日：2001-08-30

申请人： Bradford G. Ackerman ,  Bradley F. Bowden ,  Claude L. Davis, Jr. ,  Kenneth E. Hrdina

发明人： Bradford G. Ackerman ,  Bradley F. Bowden ,  Claude L. Davis, Jr. ,  Kenneth E. Hrdina

IPC分类号： G03B2758

CPC分类号： G03F7/70716 ,  G03F7/70216 ,  G03F7/708

摘要： A lithographic stage includes a platen having a top face and a bottom face and a holder for holding an optical component on the top face of the platen. The platen is made of a light-weight material such as high purity fused silica or ultra low expansion glass. The bottom face of the platen may further include means for connecting to a positioning device in an extreme ultraviolet lithography system.

公开(公告)号：US06529266B1

公开(公告)日：2003-03-04

申请号：US09529988

申请日：2000-07-10

申请人： Torbjorn Sandstrom

发明人： Torbjorn Sandstrom

IPC分类号： G03B2758

CPC分类号： G03F7/707 ,  G03F7/704 ,  G03F7/70791

摘要： A system for holding substrates in microlithography to prevent flatness errors. Deflections cause by gravity bend the surface of the substrate. Spacer elements are provided between the table and the substrate to hold the substrate in a horizontal position. The rim of the substrate is sealed, so that a chamber is formed containing air. Different air pressure can be provided on different sides of the substrate in order to prevent deflection.

摘要翻译： 用于在微光刻中保持基板以防止平坦度误差的系统。 由于重力使基板的表面弯曲引起偏转。 间隔元件设置在工作台和基板之间，以将基板保持在水平位置。 衬底的边缘被密封，从而形成容纳空气的腔室。 可以在基板的不同侧面提供不同的空气压力，以防挠曲。

公开(公告)号：US06515735B2

公开(公告)日：2003-02-04

申请号：US10119684

申请日：2002-04-11

申请人： Hidehiko Takoh

发明人： Hidehiko Takoh

IPC分类号： G03B2758

CPC分类号： B65H39/11 ,  B65H31/22 ,  B65H2511/182 ,  B65H2601/421 ,  B65H2801/06 ,  B65H2220/02 ,  B65H2220/04

摘要： A stacker apparatus is disclosed which includes a plurality of trays for receiving sheet-like media discharged from two or more medium exits. Between two upper and lower medium exits (4C, 4D) included in the two or more medium exits (4A to 4F), a tray holder (8C) on which the upper side tray (7C) for receiving sheet-like media (20) discharged from the upper side medium exit (4C) of the two upper and lower medium exits (4C, 4D) in a stacked state can be removably and securely held is disposed. The tray holder (8C) is selectively changed over to one of a first state wherein the tray holder (8C) securely holds the upper side tray (7C) when the upper side tray (7C) is mounted thereon and a second state wherein the tray holder (8C) releases the upper side tray (7C) and operates integrally with the lower side tray (7D) provided for receiving the sheet-like media (20) discharged from the lower side medium exit (4D) of the two upper and lower medium exits (4C, 4D) in a stacked state to function as part of a tray for receiving sheet-like media (20) from the upper side medium exit (4C) in a stacked state together with the lower side tray (7D).

摘要翻译： 公开了一种堆垛机装置，其包括用于接收从两个或多个介质出口排放的片状介质的多个托盘。 在包括在两个或多个介质出口（4A至4F）中的两个上下介质出口（4C，4D）之间，托盘保持器（8C），用于容纳片状介质（20）的上侧托盘（7C） 从堆叠状态的两个上下介质出口（4C，4D）的上侧介质出口（4C）排出的可以可拆卸地且牢固地保持的排出。 托盘保持架（8C）选择性地切换到第一状态之一，其中当上侧托盘（7C）安装在其上时托盘托架（8C）牢固地保持上侧托盘（7C），并且第二状态是托盘 夹持器（8C）释放上侧托盘（7C）并与设置用于​​接收从上下两个下侧介质出口（4D）排出的片状介质（20）的下侧托盘（7D）一体地运动 介质出口（4C，4D），其作为用于与下侧托盘（7D）一起以堆叠状态从上侧介质出口（4C）接收片状介质（20）的托盘的一部分。

公开(公告)号：US06469772B1

公开(公告)日：2002-10-22

申请号：US09608165

申请日：2000-06-30

申请人： Akihisa Itabashi

发明人： Akihisa Itabashi

IPC分类号： G03B2758

CPC分类号： G02B26/123 ,  B41J2/473

摘要： A multi-beam scanning apparatus including a light source unit having a plurality of light emitting parts configured to emit a plurality of divergent light fluxes, a deflector configured to deflect the plurality of divergent light fluxes emitted from the light source unit, and an imaging system configured to couple the plurality of divergent light fluxes from the light source unit with the deflector and to condense the deflected plurality of light fluxes into optical spots on a surface to be scanned. The light source unit is configured so the optical spots are separated from each other in a sub-scanning direction on the surface to be scanned, and optical axes of the light fluxes emitted from the plurality of light emitting parts are angled in a substantially same direction in the sub-scanning direction relative to optical axes of respective corresponding coupling lenses.

摘要翻译： 一种多光束扫描装置，包括：光源单元，具有被配置为发射多个发散光束的多个发光部，被配置为使从所述光源单元发射的所述多个发散光束偏转的偏转器;以及成像系统 被配置为将来自所述光源单元的所述多个发散光束与所述偏转器耦合，并且将所述偏转的多个光束冷凝成待扫描表面上的光点。 光源单元被配置为使得光斑在待扫描表面上的副扫描方向上彼此分离，并且从多个发光部发射的光束的光轴在大致相同的方向上成角度 在相对于各个对应的耦合透镜的光轴的副扫描方向上。

公开(公告)号：US06307620B1

公开(公告)日：2001-10-23

申请号：US09557972

申请日：2000-04-25

申请人： Yukio Takabayashi ,  Shigeyuki Uzawa

发明人： Yukio Takabayashi ,  Shigeyuki Uzawa

IPC分类号： G03B2758

CPC分类号： G03F7/70708 ,  G03F7/707 ,  G03F7/70916 ,  G03F7/70925 ,  H01L21/6875

摘要： An exposure holding apparatus includes a substrate holding section for holding a substrate. The substrate holding section includes a thin film, which causes a photocatalytic reaction upon irradiation with light. This substrate holding apparatus prevents adhesion of foreign materials, which causes a decrease in yield of device production, and provides a system for rapidly removing the foreign materials.

摘要翻译： 曝光保持装置包括用于保持基板的基板保持部。 基板保持部包括在照射光时引起光催化反应的薄膜。 该基板保持装置防止异物粘附，导致器件制造成品率下降，并提供快速除去异物的系统。

公开(公告)号：US06266133B1

公开(公告)日：2001-07-24

申请号：US09299590

申请日：1999-04-27

申请人： Yoshikazu Miyajima ,  Tsuneo Takashima ,  Yukio Takabayashi

发明人： Yoshikazu Miyajima ,  Tsuneo Takashima ,  Yukio Takabayashi

IPC分类号： G03B2758

CPC分类号： G03F7/70691 ,  G03B27/58 ,  G03B27/62 ,  G03F7/70358

摘要： A stage device includes a movable body, movable along a guide surface, for moving an element mounted on the movable body, a static pressure bearing, having at least one pad, for guiding the movable body along the guide surface, the at least one pad being attached to the movable body at a first position, and a linear motor, having a movable part and a relatively stationary part, for moving the movable body, the movable part of the linear motor being attached to the movable body at a second position. The movable body has a hollow structure at at least one of the first position and the second position. The hollow structure has an enclosure structure or a rib structure.

摘要翻译： 舞台装置包括可移动体，其可沿引导表面移动，用于移动安装在可移动体上的元件，静压力轴承，具有至少一个垫，用于沿着导向表面引导可动体，至少一个垫 在第一位置附接到可移动体，以及线性电动机，具有用于移动可移动体的可移动部分和相对静止部分，线性电动机的可动部分在第二位置附接到可移动体。 可移动体在第一位置和第二位置中的至少一个处具有中空结构。 中空结构具有外壳结构或肋结构。