公开(公告)号：US5958138A

公开(公告)日：1999-09-28

申请号：US743188

申请日：1996-11-05

申请人： Shinji Tomita ,  Shigeyoshi Nozawa

发明人： Shinji Tomita ,  Shigeyoshi Nozawa

IPC分类号： B01D8/00 ,  B01D53/00 ,  C23C16/44 ,  H01L21/205 ,  C23C16/00

CPC分类号： B01D53/002 ,  B01D8/00 ,  C23C16/44 ,  C23C16/4412 ,  B01D2257/20 ,  Y02C20/30

摘要： Provided is a gas recovery unit which is more efficient in its recovery and less expensive to run. The gas recovery unit comprises a CVD device, an exhaust gas recovery part and an exhaust gas purification part. The exhaust gas recovery part is constructed so as to have an inert gas reservoir part capable of accommodating liquid nitrogen, to have an exhaust gas supply part for supplying an exhaust gas to said inert gas reservoir part so that it can be brought in gasliquid contact with the liquid nitrogen, and to have a recovered and liquefied gas discharge part for discharging the recovered and liquefied gas which has been liquefied in the inert gas reservoir part. The exhaust gas purification part is constructed so as to have a recovered and liquefied gas reception part, an evaporator and a condenser for carrying out a heat exchange between said liquid nitrogen and the recovered and liquefied gas which has been evaporated, and cleaning gas recovery parts, and to have a cooling inert gas discharge part, wherein the cooling inert gas discharge part is connected to the inert gas supply path.

摘要翻译： 提供了一种气体回收单元，其在回收中更有效率并且运行更便宜。 气体回收单元包括CVD装置，废气回收部和排气净化部。 排气回收部被构造成具有能够容纳液氮的惰性气体储存部，具有用于将废气供给到所述惰性气体储存部的排气供给部，使得能够与气体液体接触 液氮，并且具有用于排出已在惰性气体储存部中液化的回收和液化气体的回收和液化气体排出部分。 废气净化部被构造为具有回收和液化气体接收部分，蒸发器和冷凝器，用于在所述液氮和已经蒸发的回收和液化气体之间进行热交换，以及清洁气体回收部件 并且具有冷却惰性气体排出部，其中冷却惰性气体排出部连接到惰性气体供给路径。

公开(公告)号：US06224677B1

公开(公告)日：2001-05-01

申请号：US08679234

申请日：1996-07-12

申请人： Shigeyoshi Nozawa ,  Shinji Tomita

发明人： Shigeyoshi Nozawa ,  Shinji Tomita

IPC分类号： C23C1600

CPC分类号： C23C16/4412 ,  B01D8/00 ,  B01D53/002 ,  B01D2257/20 ,  Y02C20/30 ,  Y02P70/605

摘要： A CVD device A is provided which is equipped with a gas introduction part A3 having an inert gas supply part G1 for supplying a diluting inert gas and a cleaning gas supply path G2 for supplying a cleaning gas, each connected therewith, and equipped with an exhaust gas discharge part A4 for releasing an exhaust gas; an exhaust gas circulation part D1 for circulating an exhaust gas from the CVD device, a cooling part D4 for cooling down and liquefying the cleaning gas in the exhaust gas, and a recovery part 4 for recovering the cleaning gas liquefied in said cooling part D4; the diluting inert gas is composed of a gas having a boiling point lower than that of the cleaning gas; a supply part 6 for supplying a cooling inert gas having the same composition as the diluting inert gas in a liquid state, an inert gas circulation part D3 which is cooled down by heat of evaporation of the cooling inert gas, and an inert gas discharge part 7 for discharging the cooling inert gas evaporated in the inert gas circulation part D3 are provided, constituting the cooling part D4; and the inert gas discharge part 7 is connected to the inert gas supply path G1.

摘要翻译： 提供了一种CVD装置A，其配备有气体导入部A3，气体导入部A3具有用于供给稀释惰性气体的惰性气体供给部G1和用于供给与各自连接的清洗气体的清洗气体供给路径G2， 用于排出废气的气体排出部A4; 用于使来自CVD装置的废气循环的废气循环部分D1，用于冷却和液化废气中的清洁气体的冷却部分D4和用于回收在所述冷却部分D4中液化的清洁气体的回收部分4; 稀释的惰性气体由沸点低于清洗气体的气体组成; 用于供给具有与液态的稀释惰性气体相同组成的冷却惰性气体的供给部6，通过冷却惰性气体的蒸发冷却而冷却的惰性气体循环部D3和惰性气体排出部 设置用于排出在惰性气体循环部分D3中蒸发的冷却惰性气体的排气管7，构成冷却部分D4; 惰性气体排出部7与惰性气体供给路G1连接。

公开(公告)号：US5937918A

公开(公告)日：1999-08-17

申请号：US903938

申请日：1997-07-31

申请人： Mitsuhide Takeharada ,  Shigeyoshi Nozawa

发明人： Mitsuhide Takeharada ,  Shigeyoshi Nozawa

IPC分类号： H01L21/02 ,  F17C5/06 ,  F17C13/04

CPC分类号： F17C5/06 ,  F17C13/04 ,  F17C2201/0109 ,  F17C2201/0119 ,  F17C2201/032 ,  F17C2201/058 ,  F17C2205/0107 ,  F17C2205/013 ,  F17C2221/014 ,  F17C2221/05 ,  F17C2227/04 ,  F17C2250/043 ,  F17C2270/0518

摘要： A gas filling facility and method which maintains the purity of a gas to be filled. A connection of a gas supply pipe and a gas filling pipe attached on gas containers is performed in a first clean room while the storage of the gas filling pipe occurs in a second clean room. When the gas filling pipe is stored, ultra-high purity nitrogen gas is caused to flow through the inside thereof, so that the inside of the gas filling pipe remains under an extremely clean state.

摘要翻译： 一种保持待填充气体的纯度的气体填充设备和方法。 在第一洁净室中进行气体供给管和附着在气体容器上的充气管的连接，同时在第二无尘室中发生充气管的保管。 当气体填充管被储存时，使超高纯度氮气流过其内部，使得气体填充管的内部保持在非常清洁的状态。

公开(公告)号：US5803795A

公开(公告)日：1998-09-08

申请号：US679672

申请日：1996-07-12

申请人： Shigeyoshi Nozawa

发明人： Shigeyoshi Nozawa

IPC分类号： B08B9/08 ,  B24B31/00 ,  C23G1/08 ,  C23G1/10 ,  F17C1/10 ,  B24B1/04

CPC分类号： B24B31/006 ,  B08B9/0817 ,  Y02E60/321

摘要： A method of treating an inner surface of a high-pressure gas vessel is disclosed. In the method, abrasive containing rust preventive is charged into the vessel made preferably of manganese steel or chrome-molybdenum steel and a wet-grinding step is carried out to obtain a maximum inner surface roughness of the vessel of 3 .mu.m or less. Thereafter, the inner surface is rinsed with an acidic rinsing solution.

摘要翻译： 公开了一种处理高压气体容器的内表面的方法。 在该方法中，将含有防锈剂的磨料装入优选由锰钢或铬钼钢制成的容器中，并进行湿磨步骤以获得容器的最大内表面粗糙度为3μm以下。 此后，用酸性漂洗溶液冲洗内表面。