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    Etching a metal hard mask for an integrated circuit structure
    1.
    发明授权
    Etching a metal hard mask for an integrated circuit structure 失效
    刻蚀集成电路结构的金属硬掩模

    公开(公告)号：US06930048B1

    公开(公告)日：2005-08-16

    申请号：US10246844

    申请日：2002-09-18

    申请人： SiYi Li ,  S.M. Rega Sadjadi ,  Sean S. Kang ,  Tri Le ,  Bi-Ming Yen ,  Scott Briggs

    发明人： SiYi Li ,  S.M. Rega Sadjadi ,  Sean S. Kang ,  Tri Le ,  Bi-Ming Yen ,  Scott Briggs

    IPC分类号： H01L21/302 ,  H01L21/3213 ,  H01L21/768

    CPC分类号： H01L21/32136 ,  H01L21/76802 ,  H01L21/76832

    摘要： The invention is a method of etching an integrated circuit (IC) structure that includes a metal hard mask layer. The etching of the metal hard mask layer is performed by first feeding a gas mixture comprising a fluorine containing gas and oxygen (O2) gas to a reactor. The method then proceeds to generate a plasma that etches the metal hard mask layer. The method can be applied to either performing a via etch or a trench etch. Additionally, the invention teaches the removal of a photoresist layer without affecting the metal hard mask layer.

    摘要翻译： 本发明是一种蚀刻包含金属硬掩模层的集成电路（IC）结构的方法。 金属硬掩模层的蚀刻通过首先将包含含氟气体和氧气（O 2/2））的气体混合到反应器中来进行。 然后该方法进行以产生蚀刻金属硬掩模层的等离子体。 该方法可以应用于执行通孔蚀刻或沟槽蚀刻。 另外，本发明教导了去除光致抗蚀剂层而不影响金属硬掩模层。

    Application and user interface for facilitating a meeting
    2.
    发明申请
    Application and user interface for facilitating a meeting 审中-公开
    应用和用户界面，方便会议

    公开(公告)号：US20070011231A1

    公开(公告)日：2007-01-11

    申请号：US11175547

    申请日：2005-07-06

    申请人： Todd Manion ,  Sandeep Singhal ,  Gursharan Sidhu ,  Simon Wong ,  Frederick Fourie ,  Ryan Kim ,  Eliot Flannery ,  Peter Williamson ,  Vladimir Bobov ,  Kanaka Komandur ,  Scott Briggs

    发明人： Todd Manion ,  Sandeep Singhal ,  Gursharan Sidhu ,  Simon Wong ,  Frederick Fourie ,  Ryan Kim ,  Eliot Flannery ,  Peter Williamson ,  Vladimir Bobov ,  Kanaka Komandur ,  Scott Briggs

    IPC分类号： G06F15/16

    CPC分类号： H04L12/1827

    摘要： An application and its associated user interface provide a meeting window for use in organizing and holding meetings using peer-to-peer network facilities. The meeting window offers menu selections for choosing a network over which to hold the meeting and for discovering and inviting meeting participants. The meeting window includes three main panes, one each for managing attendees, for distributing files to attendees, and for streaming presentation materials real-time to attendees. Data streaming is also supported to network devices such as projectors. Control of the presentation may be delegated by the presentation owner to another attendee, and may also be revoked by the presentation owner. The real-time streaming of the presentation may be paused and resumed to accommodate meeting dynamics or real-time changes.

    摘要翻译： 应用程序及其关联的用户界面提供会议窗口，用于组织和举行使用点对点网络设施的会议。 会议窗口提供菜单选项，用于选择一个可以举行会议的网络，以及发现和邀请会议参与者。 会议窗口包括三个主窗格，一个用于管理与会者，向与会者分发文件，以及向演示人员实时播放演示文稿。 网络设备（如投影机）也支持数据流。 呈现的控制权可以由演示所有者转让给其他与会者，演示者也可以撤销。 演示文稿的实时流式传输可以暂停和恢复，以适应会议动态或实时更改。

    PRODUCT CYCLE ANALYSIS USING SOCIAL MEDIA DATA
    4.
    发明申请
    PRODUCT CYCLE ANALYSIS USING SOCIAL MEDIA DATA 审中-公开
    使用社会媒体数据的产品周期分析

    公开(公告)号：US20130231975A1

    公开(公告)日：2013-09-05

    申请号：US13781672

    申请日：2013-02-28

    申请人： Elizabeth Ann High ,  Michelle Amanda Evans ,  Scott Briggs ,  Russell Taufa

    发明人： Elizabeth Ann High ,  Michelle Amanda Evans ,  Scott Briggs ,  Russell Taufa

    IPC分类号： G06Q30/02 ,  G06Q50/00

    CPC分类号： G06Q30/0201 ,  G06Q50/01

    摘要： Systems and methods for product cycle analysis using social media data are provided herein. Some exemplary methods may include evaluating social media conversations for an author, executing a semiotic analysis of the social media conversations to categorize the social media conversations, and computing a product commitment score for the author, for social media conversation having been categorize within a product commitment score domain.

    摘要翻译： 本文提供了使用社交媒体数据进行产品周期分析的系统和方法。 一些示例性方法可以包括评估作者的社交媒体对话，执行社交媒体对话的符号学分析以对社交媒体对话进行分类，以及计算作者的产品承诺分数，以便将社会媒体对话分类为产品承诺 得分域。

    Negative bias critical dimension trim
    6.
    发明授权
    Negative bias critical dimension trim 失效
    负偏压临界尺寸微调

    公开(公告)号：US07544521B1

    公开(公告)日：2009-06-09

    申请号：US11519384

    申请日：2006-09-11

    申请人： Scott Briggs ,  Aaron Eppler

    发明人： Scott Briggs ,  Aaron Eppler

    IPC分类号： H01L21/311 ,  H01L21/66

    CPC分类号： H01L21/31144 ,  H01L21/31138 ,  H01L22/12

    摘要： A method of trimming the critical dimension of an isolated line to a greater extent than a dense line is provided. A mask is formed of an organic material over the etch layer wherein the mask has at least a first region with a first pattern density and a second region with a second pattern density. A surface area of the organic material in the first region is measured. A surface area of the organic material in the second region is measured. A reverse bias trim of the mask is provided, wherein a ratio of a trim rate of the organic material in the first region to a trim rate of the organic material in the second region is related to a ratio of the measured surface area of the organic material in the first region to the measured surface area of the organic material in the second region.

    摘要翻译： 提供了比密集线更大程度地修剪隔离线的临界尺寸的方法。 掩模由蚀刻层上的有机材料形成，其中掩模具有至少第一图案密度的第一区域和具有第二图案密度的第二区域。 测量第一区域中的有机材料的表面积。 测量第二区域中的有机材料的表面积。 提供了掩模的反向偏置修整，其中第一区域中的有机材料的修整率与第二区域中的有机材料的修整率的比率与有机材料的测量表面积的比率有关 第一区域中的材料到第二区域中有机材料的测量表面积。