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公开(公告)号：US11679209B2
公开(公告)日：2023-06-20
申请号：US16686286
申请日：2019-11-18
Applicant: Stamford Devices Limited
Inventor： Brendan Hogan
CPC classification number: A61M11/003 , A61M11/005 , C25D1/08 , C25D7/00 , B05B17/0646 , C25D3/567
Abstract: A photo-resist (21) is applied in a pattern or vertical columns having the dimensions of holes or pores of the aperture plate to be produced. This mask pattern provides the apertures which define the aerosol particle size, having up to 2500 holes per square mm. There is electro-deposition of metal (22) into the spaces around the columns (21). There is further application of a second photo-resist mask (25) of much larger (wider and taller) columns, encompassing the area of a number of first columns (21). The hole diameter in the second plating layer is chosen according to a desired flow rate.
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公开(公告)号：US11648580B2
公开(公告)日：2023-05-16
申请号：US17888334
申请日：2022-08-15
Applicant: Stamford Devices Limited
Inventor： Brendan Hogan , Kieran Hyland , Anthony Redmond
CPC classification number: B05B17/0646 , A61M11/001 , A61M11/005 , A61M15/0085 , B05B17/0653
Abstract: An aerosol generator with electrical power conducting pins has a vibratable plate with apertures therein and an annular piezo. An annular support member supports the piezo and the vibratable plate. A first electrical power conducting pin engages directly with a first, top, surface of the piezo. A second electrical power conducting pin indirectly conducts electrical power to a second surface of the piezo, by contacting an extension tab. There is a film of cured epoxy adhesive on the tab. The aerosol generator avoids need for soldered joints for electrical contact, and the pins are conveniently mounted parallel to each on the same lateral and top side of the piezo and support member. The pins may have multi-point tips for particularly effective electrical contact.
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公开(公告)号：US20150101596A1
公开(公告)日：2015-04-16
申请号：US14401480
申请日：2013-05-24
Applicant: Stamford Devices Limited
Inventor： Brendan Hogan
Abstract: A photo-resist (21) is applied in a pattern of vertical columns having the dimensions of holes or pores of the aperture plate to be produced. This mask pattern provides the apertures which define the aerosol particle size, having up to 2500 holes per square mm. There is electro-deposition of metal (22) into the spaces around the columns (21). There is further application of a second photo-resist mask (25) of much larger (wider and taller) columns, encompassing the area of a number of first columns (21). The hole diameter in the second plating layer is chosen according to a desired flow rate.
Abstract translation: 光刻胶（21）以要制造的孔板的孔或孔的尺寸的垂直列的图案施加。 该掩模图形提供限定气溶胶颗粒尺寸的孔，每平方毫米具有多达2500个孔。 将金属（22）电沉积到柱（21）周围的空间中。 进一步应用包括多个第一列（21）的区域的更大（更宽和更高）的列的第二光刻胶掩模（25）。 根据期望的流速选择第二镀层中的孔直径。
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公开(公告)号：US10399109B2
公开(公告)日：2019-09-03
申请号：US15476461
申请日：2017-03-31
Applicant: Stamford Devices Limited
Inventor： Brendan Hogan , Kieran Hyland , Anthony Redmond
Abstract: An aerosol generator (100) has a vibratable plate (1) with apertures therein and an annular piezo (2) which causes movement of the vibratable plate (1). An annular support member (3) supports the piezo (2) and the vibratable plate (1). A first electrical power conducting pin (10) engages directly with a first, top, surface of the piezo (2). A second electrical power conducting pin (11) indirectly conducts electrical power to a second surface of the piezo (2), by contacting an extension tab (103) of the support member (20), also on its top side. There is a film of cured epoxy adhesive on the tab (103), providing excellent gripping force between the pin (11) and the support (3). The aerosol generator (100) avoids need for soldered joints for electrical contact, and the pins are conveniently mounted parallel to each on the on the same lateral and top side of the piezo and support member. The pins may have multi-point tips (50) for particularly effective electrical contact.
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公开(公告)号：US20190210044A1
公开(公告)日：2019-07-11
申请号：US16358338
申请日：2019-03-19
Applicant: Stamford Devices Limited
Inventor： Brendan Hogan , Hong Xu
CPC classification number: B05B1/02 , A61M11/005 , A61M15/0085 , A61M2207/00 , B05B17/0638 , B05B17/0653 , C25D1/08 , C25D7/04
Abstract: An aperture plate is manufactured by plating metal around a mask of resist columns having a desired size, pitch, and profile, which yields a wafer about 60 μm thickness. This is approximately the full desired target aperture plate thickness. The plating is continued so that the metal overlies the top surfaces of the columns until the desired apertures are achieved. This needs only one masking/plating cycle to achieve the desired plate thickness. Also, the plate has passageways formed beneath the apertures, formed as an integral part of the method, by mask material removal. These are suitable for entrainment of aerosolized droplets exiting the apertures.
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Patent Agency Ranking
公开(公告)号：US20130334338A1
公开(公告)日：2013-12-19
申请号：US13902096
申请日：2013-05-24
Applicant: Stamford Devices Limited
Inventor： Brendan Hogan
CPC classification number: A61M11/003 , A61M11/005 , B05B17/0646 , C25D1/08 , C25D3/567 , C25D7/00
Abstract: A photo-resist (21) is applied in a pattern of vertical columns having the dimensions of holes or pores of the aperture plate to be produced. This mask pattern provides the apertures which define the aerosol particle size, having up to 2500 holes per square mm. There is electro-deposition of metal (22) into the spaces around the columns (21). There is further application of a second photo-resist mask (25) of much larger (wider and taller) columns, encompassing the area of a number of first columns (2)1. The hole diameter in the second plating layer is chosen according to a desired flow rate.
Abstract translation: 光刻胶（21）以要制造的孔板的孔或孔的尺寸的垂直列的图案施加。 该掩模图形提供限定气溶胶颗粒尺寸的孔，每平方毫米具有多达2500个孔。 将金属（22）电沉积到柱（21）周围的空间中。 进一步应用包含多个第一列（2）1的区域的更大（更宽和更高）的列的第二光致抗蚀剂掩模（25）。 根据期望的流速选择第二镀层中的孔直径。
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公开(公告)号：US20130186975A1
公开(公告)日：2013-07-25
申请号：US13720759
申请日：2012-12-19
Applicant: Stamford Devices Limited
Inventor： Brendan Hogan , Daniela Butan , Seamus Clifford , Michael Pomeroy , Mark Southern , David Shiel
IPC: B05B17/06
CPC classification number: B05B17/0646 , B05B15/18 , B05B17/06 , B05B17/0653 , B05B17/0669
Abstract: An aperture plate is formed from a palladium nickel alloy comprising about 89% palladium and about 11% nickel. There is a generally fine substantially equiaxed grain microstructure throughout the thickness of the aperture plate. The average grain width (W) is in the range of from 0.2 μm to 5.0 μm, in some cases from 0.2 μm to 2.0 μm. Because the grain structure is equiaxed (L/W=1) the grain length (L) is the same as the grain width. The improved aperture plate extends the life of nebulisers, eliminates the risk of premature and unpredictable failure of a nebuliser in service, eliminates the risk of product returns from hospitals and patients, and eliminates the possible risk of fragments of the aperture plate breaking free from the nebulizer.
Abstract translation: 孔板由包含约89％钯和约11％镍的钯镍合金形成。 在孔板的整个厚度上存在通常细的基本上等轴晶粒微观结构。 平均晶粒宽度（W）在0.2μm至5.0μm的范围内，在一些情况下为0.2μm至2.0μm。 由于晶粒结构为等轴（L / W = 1），晶粒长度（L）与晶粒宽度相同。 改进的孔板延长了雾化器的寿命，消除了雾化器在使用过程中过早和不可预测的故障的风险，消除了医院和患者的产品返回风险，并消除了孔板破碎的可能性， 喷雾器。
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公开(公告)号：US11872573B2
公开(公告)日：2024-01-16
申请号：US17818484
申请日：2022-08-09
Applicant: Stamford Devices Limited
Inventor： Brendan Hogan , Hong Xu
CPC classification number: B05B1/02 , B05B17/0638 , B05B17/0653 , C25D1/08 , C25D7/04 , A61M11/005 , A61M15/0085 , A61M2207/00
Abstract: An aperture plate is manufactured by plating metal around a mask of resist columns having a desired size, pitch, and profile, which yields a wafer about 60 μm thickness. This is approximately the full desired target aperture plate thickness. The plating is continued so that the metal overlies the top surfaces of the columns until the desired apertures are achieved. This needs only one masking/plating cycle to achieve the desired plate thickness. Also, the plate has passageways formed beneath the apertures, formed as an integral part of the method, by mask material removal. These are suitable for entrainment of aerosolized droplets exiting the apertures.
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公开(公告)号：US10695787B2
公开(公告)日：2020-06-30
申请号：US15476369
申请日：2017-03-31
Applicant: Stamford Devices Limited
Inventor： Brendan Hogan , Kieran Hyland , Anthony Redmond
Abstract: An aerosol generator (100) has a vibratable plate (1) with apertures therein and an annular piezo (2) which causes movement of the vibratable plate (1). An annular support member (3) supports the piezo (2) and the vibratable plate (1). A first electrical power conducting pin (10) engages directly with a first, top, surface of the piezo (2). A second electrical power conducting pin (11) indirectly conducts electrical power to a second surface of the piezo (2), by contacting an extension tab (103) of the support member (20), also on its top side. There is a film of cured epoxy adhesive on the tab (103), providing excellent gripping force between the pin (11) and the support (3). The aerosol generator (100) avoids need for soldered joints for electrical contact, and the pins are conveniently mounted parallel to each on the on the same lateral and top side of the piezo and support member. The pins may have multi-point tips (50) for particularly effective electrical contact.
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公开(公告)号：US10512736B2
公开(公告)日：2019-12-24
申请号：US14401480
申请日：2013-05-24
Applicant: Stamford Devices Limited
Inventor： Brendan Hogan
Abstract: A photo-resist (21) is applied in a pattern of vertical columns having the dimensions of holes or pores of the aperture plate to be produced. This mask pattern provides the apertures which define the aerosol particle size, having up to 2500 holes per square mm. There is electro-deposition of metal (22) into the spaces around the columns (21). There is further application of a second photo-resist mask (25) of much larger (wider and taller) columns, encompassing the area of a number of first columns (21). The hole diameter in the second plating layer is chosen according to a desired flow rate.
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