Photoresist substrate having robust adhesion
    3.
    发明授权
    Photoresist substrate having robust adhesion 失效
    光致抗蚀衬底具有坚固的粘附力

    公开(公告)号:US06921630B2

    公开(公告)日:2005-07-26

    申请号:US10285060

    申请日:2002-10-31

    申请人: Paul M. Dentinger

    发明人: Paul M. Dentinger

    IPC分类号: G03F7/11 G03F7/16 G03F7/00

    CPC分类号: G03F7/11 G03F7/16

    摘要: A substrate material for LIGA applications w hose general composition is Ti/Cu/Ti/SiO2. The SiO2 is preferably applied to the Ti/Cu/Ti wafer as a sputtered coating, typically about 100 nm thick. This substrate composition provides improved adhesion for epoxy-based photoresist materials, and particularly the photoresist material SU-8.

    摘要翻译: 用于LIGA应用的基底材料w软管的一般组成是Ti / Cu / Ti / SiO 2。 SiO 2优选作为溅射涂层施加到Ti / Cu / Ti晶片,通常为约100nm厚。 该基材组合物为环氧基光致抗蚀剂材料,特别是光致抗蚀剂材料SU-8提供了改进的粘合性。

    Low power photomultiplier tube circuit and method therefor
    5.
    发明授权
    Low power photomultiplier tube circuit and method therefor 有权
    低功率光电倍增管电路及其方法

    公开(公告)号:US07030355B1

    公开(公告)日:2006-04-18

    申请号:US10910853

    申请日:2004-08-03

    IPC分类号: H01J40/14

    CPC分类号: H01J43/28

    摘要: An electrical circuit for a photomultiplier tube (PMT) is disclosed that reduces power consumption to a point where the PMT may be powered for extended periods with a battery. More specifically, the invention concerns a PMT circuit comprising a low leakage switch and a high voltage capacitor positioned between a resistive divider and each of the PMT dynodes, and a low power control scheme for recharging the capacitors.

    摘要翻译: 公开了一种用于光电倍增管(PMT)的电路,其将功率消耗降低到PMT可以用电池长时间供电的点。 更具体地,本发明涉及一种PMT电路,其包括位于电阻分压器和每个PMT倍增电极之间的低泄漏开关和高压电容器,以及用于对电容器再充电的低功率控制方案。

    Photosensitive dissolution inhibitors and resists based on onium salt carboxylates
    6.
    发明授权
    Photosensitive dissolution inhibitors and resists based on onium salt carboxylates 有权
    基于鎓盐羧酸盐的光敏溶解抑制剂和抗蚀剂

    公开(公告)号:US06969576B2

    公开(公告)日:2005-11-29

    申请号:US10000429

    申请日:2001-11-30

    IPC分类号: G03F7/004 G03F7/039

    摘要: A photoresist composition that employs onium salt carboxylates as thermally stable dissolution inhibitors. The photoresist composition can be either an onium carboxylate salt with a phenolic photoresist, such as novolac, or an onium cation protected carboxylate-containing resin such as an acrylic/acrylic acid copolymer. The onium carboxylate can be an onium cholate, wherein the onium cholate is an iodonium cholate. Particularly preferred iodonium cholates are alkyloxyphenylphenyl iodonium cholates and most particularly preferred is octyloxyphenyphenyl iodonium cholate. The photoresist composition will not create nitrogen or other gaseous byproducts upon exposure to radiation, does not require water for photoactivation, has acceptable UV radiation transmission characteristics, and is thermally stable at temperatures required for solvent removal.

    摘要翻译: 使用鎓盐羧酸盐作为热稳定溶解抑制剂的光致抗蚀剂组合物。 光致抗蚀剂组合物可以是与酚类光致抗蚀剂的羧酸盐盐,例如酚醛清漆,或含鎓阳离子保护的含羧酸盐的树脂如丙烯酸/丙烯酸共聚物。 羧酸镁可以是胆酸钠,其中胆酸钠是一种碘酸锂。 特别优选的碘鎓螯合物是烷氧基苯基苯基碘鎓螯合物,最特别优选的是辛氧基苯基碘鎓胆酸盐。 光致抗蚀剂组合物在暴露于辐射时不会产生氮气或其它气体副产物,不需要用于光活化的水,具有可接受的UV辐射透射特性,并且在除去溶剂所需的温度下是热稳定的。