Current control biasing to protect electrode seals
    1.
    发明授权
    Current control biasing to protect electrode seals 有权
    电流控制偏压保护电极密封

    公开(公告)号:US06714580B2

    公开(公告)日:2004-03-30

    申请号:US10005285

    申请日:2001-12-05

    IPC分类号: H01S3083

    摘要: Current control biasing of a ring laser gyroscope is employed to protect electrode seals. A frame of a ring laser gyroscope has more than one electrode attached to it. An electric field is created between the electrodes during the operation of the gyroscope, which causes ions in the frame to migrate towards a lowest electrical potential. Electrode seals are located between the electrodes and the frame. By providing a positive power supply voltage and connecting the current control to the non-ground side of the power supply, the mounting structure may be at the lowest electrical potential. The ions will then migrate towards the mounting structure, which significantly reduces migration to the electrodes.

    摘要翻译: 使用环形激光陀螺仪的电流控制偏置来保护电极密封。 环形激光陀螺仪的框架具有多个连接到其上的电极。 在陀螺仪的操作期间在电极之间产生电场,这导致框架中的离子朝向最低电位迁移。 电极密封件位于电极和框架之间。 通过提供正电源电压并将电流控制连接到电源的非接地侧,安装结构可以处于最低电位。 然后离子将迁移到安装结构,这显着减少了向电极的迁移。

    High temperature electrode seal in a ring laser gyro
    2.
    发明授权
    High temperature electrode seal in a ring laser gyro 失效
    环形激光陀螺仪中的高温电极密封

    公开(公告)号:US06704111B2

    公开(公告)日:2004-03-09

    申请号:US09952302

    申请日:2001-09-11

    IPC分类号: G01C1966

    CPC分类号: G01C19/661 H01S3/0388

    摘要: A ring laser gyro having a high temperature seal. The ring laser gyro includes a laser block of known construction having a closed loop passage formed within the block in the shape of a polygon. Mirrors positioned at the intersection of each side of the polygon-shaped closed loop passage create an optical closed loop path through passage. A lasing gas is sealed within the closed loop passage, and electrodes mounted to the block and in fluid communication with the passage create at least one laser that traverses the optical closed loop path in the passage. The electrodes are mounted on the laser block with a high temperature seal comprising a washer having a low coefficient of thermal expansion and an optical bond between the washer and the laser block In a preferred embodiment, the laser block and the washer are formed from the same material to ensure that these structures expand at substantially the same rate when the ring laser gyro is used in a high temperature application.

    摘要翻译: 具有高温密封的环形激光陀螺仪。 环形激光陀螺仪包括已知结构的激光器块,其具有形成在多边形形状的块内的闭环通道。 位于多边形闭环通道的每一侧的交叉处的镜子形成通过光学闭环路径。 激光气体密封在闭环通道内,并且安装到块上并与通道流体连通的电极产生穿过通道中的光学闭环路径的至少一个激光器。 电极通过高温密封件安装在激光器块上,该高温密封件包括具有低热膨胀系数的垫圈和垫圈与激光块之间的光学接合。在一个优选实施例中,激光块和垫圈由相同的 材料,以确保当环形激光陀螺在高温应用中使用时这些结构以基本上相同的速率膨胀。

    VARIABLE PATH LENGTH CONTROL MODULATION FREQUENCY
    3.
    发明申请
    VARIABLE PATH LENGTH CONTROL MODULATION FREQUENCY 有权
    可变路径长度控制调制频率

    公开(公告)号:US20120026502A1

    公开(公告)日:2012-02-02

    申请号:US12847119

    申请日:2010-07-30

    IPC分类号: G01C19/68

    CPC分类号: G01C19/665 G01C19/70

    摘要: A gyroscope system comprises a gyroscope block having a plurality of cavities and a plurality of passages that define a path; a plurality of mirrors each located in one of the plurality of cavities; at least one mirror drive coupled to one of the plurality of mirrors and configured to change a position of the respective mirror, wherein the path's length is changed by the change in the position of the respective mirror; a dither system coupled to the gyroscope block and configured to induce an angular rotation of the gyroscope block; and a controller configured to provide a dither signal indicative of a dither frequency to the dither system and a path length control (PLC) signal indicative of a PLC frequency to the at least one mirror drive. The controller is configured to calculate the PLC frequency as a function of the dither frequency.

    摘要翻译: 陀螺仪系统包括具有多个空腔的陀螺仪块和限定路径的多个通道; 多个反射镜,每个反射镜均位于所述多个空腔中的一个中; 耦合到所述多个反射镜中的一个并且被配置为改变相应反射镜的位置的至少一个反射镜驱动器,其中所述路径的长度由于相应反射镜的位置的变化而改变; 耦合到陀螺仪块并被配置为引起陀螺仪块的角旋转的抖动系统; 以及控制器,被配置为向抖动系统提供指示抖动频率的抖动信号,以及将指示PLC频率的路径长度控制(PLC)信号提供给至少一个反射镜驱动器。 控制器配置为根据抖动频率计算PLC频率。

    USE OF TOKEN SWITCH TO INDICATE UNAUTHORIZED MANIPULATION OF A PROTECTED DEVICE
    4.
    发明申请
    USE OF TOKEN SWITCH TO INDICATE UNAUTHORIZED MANIPULATION OF A PROTECTED DEVICE 审中-公开
    使用TOKEN开关来显示受保护装置的未经授权的操纵

    公开(公告)号:US20110199225A1

    公开(公告)日:2011-08-18

    申请号:US12705701

    申请日:2010-02-15

    IPC分类号: G08B21/00

    CPC分类号: H05K5/0208

    摘要: An apparatus to indicate unauthorized manipulation of at least one protected device enclosed in a housing is provided. The apparatus includes a structure attached to a first portion of the housing and a token switch attached to a second portion of the housing. The token switch is operably positioned with reference to the structure. The token switch includes a plunger, and a register programmed with a value. The register is communicatively coupled with a processor in a circuit. The circuit is communicatively coupled to drive the device. The structure, the token switch, and the circuit are internal to the housing when the housing is in a closed position. The plunger and the structure are positioned to generate a current when the housing is opened. The programmed value in the register is changed by the generated current and the processor takes an action responsive to the change in the programmed value.

    摘要翻译: 提供了一种用于指示未封装在壳体中的至少一个受保护装置的未经授权的操纵的装置。 该装置包括附接到壳体的第一部分的结构和附接到壳体的第二部分的令牌开关。 令牌开关可参照该结构可操作地定位。 令牌开关包括一个柱塞和一个用一个值编程的寄存器。 寄存器与电路中的处理器通信耦合。 该电路通信耦合以驱动该设备。 当外壳处于关闭位置时,结构,令牌开关和电路在外壳内部。 柱塞和结构被定位成当壳体打开时产生电流。 寄存器中的编程值由生成的电流改变,并且处理器响应于编程值的变化而采取动作。

    SYSTEMS AND METHODS FOR PACKAGING AND MOUNTING READOUT AND LASER INTENSITY MONITOR SENSORS
    5.
    发明申请
    SYSTEMS AND METHODS FOR PACKAGING AND MOUNTING READOUT AND LASER INTENSITY MONITOR SENSORS 审中-公开
    包装和安装读出和激光强度监测传感器的系统和方法

    公开(公告)号:US20080304076A1

    公开(公告)日:2008-12-11

    申请号:US11761083

    申请日:2007-06-11

    IPC分类号: G01B9/02

    摘要: Methods and apparatus for applying sensors to a ring laser gyro. An example apparatus includes a housing having a cavity, a laser intensity monitor (LIM) sensor mechanically and electrically connected within the cavity of the housing, and a readout sensor mechanically and electrically connected within the cavity of the housing. The LIM sensor and readout sensor are connected within the housing based on predetermined light output properties of a sensor mirror of a ring laser gyro. When the readout sensor is properly aligned with the sensor mirror, then the LIM sensor is automatically aligned with the sensor mirror.

    摘要翻译: 将传感器应用于环形激光陀螺仪的方法和装置。 示例性装置包括具有空腔的壳体,机械地和电连接在壳体的空腔内的激光强度监视器(LIM)传感器,以及机械和电连接在壳体的空腔内的读出传感器。 LIM传感器和读出传感器基于环形激光陀螺仪的传感器镜的预定光输出特性连接在外壳内。 当读出传感器与传感器镜正确对准时,LIM传感器将自动与传感器镜对齐。

    Methods and systems for substrate surface evaluation
    6.
    发明授权
    Methods and systems for substrate surface evaluation 有权
    用于衬底表面评估的方法和系统

    公开(公告)号:US07312866B2

    公开(公告)日:2007-12-25

    申请号:US11243866

    申请日:2005-10-05

    IPC分类号: G01N21/00

    CPC分类号: G02B21/0016

    摘要: A method for determining a surface quality of a substrate sample using a differential interference contrast microscope is described. The microscope includes an eyepiece, an eyepiece focus adjustment, a microscope focus adjustment, a light source, at least one of an aperture or reticule, a camera view, a prism and an eyepiece. The method includes calibrating the focus of the eyepiece with the focus of the camera and determining a peak response ratio for the microscope through adjustment of phase between differential beams of the microscope. The substrate sample is placed under the microscope, illuminated with the light source, and brought into focus with the microscope focus. Phase between differential beams is adjusted, at least one image of the substrate sample is captured and processed to determine a level of surface structure on the substrate sample.

    摘要翻译: 描述了使用微分干涉对比显微镜来确定衬底样品的表面质量的方法。 显微镜包括目镜,目镜对焦调整,显微镜焦点调节,光源,孔径或网状物,照相机视图,棱镜和目镜中的至少一个。 该方法包括用相机的焦点校准目镜的焦点,并通过调整显微镜的差分光束之间的相位来确定显微镜的峰值响应比。 将基板样品置于显微镜下,用光源照射,并用显微镜聚焦。 调整差分光束之间的相位,捕获并处理衬底样品的至少一个图像,以确定衬底样品上的表面结构的水平。

    Variable path length control modulation frequency
    7.
    发明授权
    Variable path length control modulation frequency 有权
    可变路径长度控制调制频率

    公开(公告)号:US08259302B2

    公开(公告)日:2012-09-04

    申请号:US12847119

    申请日:2010-07-30

    IPC分类号: G01C19/68

    CPC分类号: G01C19/665 G01C19/70

    摘要: A gyroscope system comprises a gyroscope block having a plurality of cavities and a plurality of passages that define a path; a plurality of mirrors each located in one of the plurality of cavities; at least one mirror drive coupled to one of the plurality of mirrors and configured to change a position of the respective mirror, wherein the path's length is changed by the change in the position of the respective mirror; a dither system coupled to the gyroscope block and configured to induce an angular rotation of the gyroscope block; and a controller configured to provide a dither signal indicative of a dither frequency to the dither system and a path length control (PLC) signal indicative of a PLC frequency to the at least one mirror drive. The controller is configured to calculate the PLC frequency as a function of the dither frequency.

    摘要翻译: 陀螺仪系统包括具有多个空腔的陀螺仪块和限定路径的多个通道; 多个反射镜,每个反射镜均位于所述多个空腔中的一个中; 耦合到所述多个反射镜中的一个并且被配置为改变相应反射镜的位置的至少一个反射镜驱动器,其中所述路径的长度由于相应反射镜的位置的变化而改变; 耦合到陀螺仪块并被配置为引起陀螺仪块的角旋转的抖动系统; 以及控制器,被配置为向所述抖动系统提供指示抖动频率的抖动信号,以及将指示PLC频率的路径长度控制(PLC)信号提供给所述至少一个反射镜驱动器。 控制器配置为根据抖动频率计算PLC频率。

    Methods and systems for substrate surface evaluation

    公开(公告)号:US06995847B2

    公开(公告)日:2006-02-07

    申请号:US10376972

    申请日:2003-02-27

    IPC分类号: G01N21/55

    CPC分类号: G02B21/0016

    摘要: A method for determining a surface quality of a substrate sample using a differential interference contrast microscope is described. The microscope includes an eyepiece, an eyepiece focus adjustment, a microscope focus adjustment, a light source, at least one of an aperture or reticule, a camera view, a prism and an eyepiece. The method includes calibrating the focus of the eyepiece with the focus of the camera and determining a peak response ratio for the microscope through adjustment of phase between differential beams of the microscope. The substrate sample is placed under the microscope, illuminated with the light source, and brought into focus with the microscope focus. Phase between differential beams is adjusted, at least one image of the substrate sample is captured and processed to determine a level of surface structure on the substrate sample.