-
公开(公告)号:US20190244785A1
公开(公告)日:2019-08-08
申请号:US16270236
申请日:2019-02-07
发明人: Noriyasu Ido , Hiroyuki Kariya , Masahide Ooura
IPC分类号: H01J37/317 , H01J37/304 , H01J37/02 , H01J37/147 , H01J37/244
摘要: A measurement device includes a plurality of slits, a beam current measurement unit provided at a position away from the slits in a beam traveling direction, and a measurement control unit. The beam current measurement unit is configured to be capable of measuring a beam current at a plurality of measurement positions to be different positions in a first direction perpendicular to the beam traveling direction. The slits are disposed to be spaced apart in the first direction such that the first direction coincides with a slit width direction and are configured to be movable in the first direction. The measurement control unit acquires a plurality of beam current values measured at the plurality of measurement positions to be the different positions in the first direction with the beam current measurement unit while moving the slits in the first direction.
-
公开(公告)号:US09837248B2
公开(公告)日:2017-12-05
申请号:US14605404
申请日:2015-01-26
发明人: Masahide Ooura , Daisuke Imai , Shiro Ninomiya
IPC分类号: H01J37/317 , H01J37/30
CPC分类号: H01J37/3171 , H01J37/3002 , H01J2237/0206 , H01J2237/18 , H01J2237/304 , H01J2237/30472
摘要: In an ion implantation apparatus, an interruption member interrupts an ion beam B in the middle of a beam line. A plasma shower device is provided at the downstream side of the interruption member in the beam line. A control unit causes the interruption member to interrupt the ion beam B during an ignition start period of the plasma shower device. The interruption member may be provided at the upstream side of at least one high-voltage electric field type electrode in the beam line. A gas supply unit may supply a source gas to the plasma shower device. The control unit may start the supply of the source gas from the gas supply unit after the ion beam B is interrupted by the interruption member.
-
公开(公告)号:US10825654B2
公开(公告)日:2020-11-03
申请号:US16270236
申请日:2019-02-07
发明人: Noriyasu Ido , Hiroyuki Kariya , Masahide Ooura
IPC分类号: H01J37/317 , H01J37/304 , H01J37/02 , H01J37/244 , H01J37/147
摘要: A measurement device includes a plurality of slits, a beam current measurement unit provided at a position away from the slits in a beam traveling direction, and a measurement control unit. The beam current measurement unit is configured to be capable of measuring a beam current at a plurality of measurement positions to be different positions in a first direction perpendicular to the beam traveling direction. The slits are disposed to be spaced apart in the first direction such that the first direction coincides with a slit width direction and are configured to be movable in the first direction. The measurement control unit acquires a plurality of beam current values measured at the plurality of measurement positions to be the different positions in the first direction with the beam current measurement unit while moving the slits in the first direction.
-
-