公开(公告)号：US20100215909A1

公开(公告)日：2010-08-26

申请号：US12064454

申请日：2006-09-06

Applicant: Susan S. MacDonald

Inventor： Susan S. MacDonald

IPC: B32B3/00 ,  B44C1/22

CPC classification number: D07B1/142 ,  D07B1/162 ,  D07B2201/104 ,  D07B2201/1096 ,  D07B2205/2071 ,  D07B2205/507 ,  Y10T428/24612 ,  D07B2801/16

Abstract: A photomask for the fabrication of dual damascene structures and a method for forming the same are provided. A method for fabricating a multilayer step-and-print lithography (SFIL) template includes providing a blank having a substrate, an absorber layer and a first resist layer. A metal layer pattern of a dual damascene structure is formed in the substrate at a first depth using a lithography system. The first resist layer is removed from the blank and a second resist later is applied. The lithography system is used to form a via layer pattern of the dual damascene structure at the first depth while the metal layer pattern is simultaneously etched to a second depth.

Abstract translation: 提供了用于制造双镶嵌结构的光掩模及其形成方法。 制造多层步进印刷光刻（SFIL）模板的方法包括提供具有基底，吸收层和第一抗蚀剂层的坯料。 使用光刻系统在第一深度的基板中形成双镶嵌结构的金属层图案。 将第一抗蚀剂层从坯料上除去，然后施加第二抗蚀剂。 光刻系统用于在第一深度形成双镶嵌结构的通孔层图案，同时将金属层图案同时蚀刻到第二深度。

公开(公告)号：US20080248408A1

公开(公告)日：2008-10-09

申请号：US12064453

申请日：2006-09-06

Applicant: Susan S. MacDonald ,  David Mellenthin

Inventor： Susan S. MacDonald ,  David Mellenthin

IPC: G03F1/00

CPC classification number: G03F1/68 ,  G03F1/00 ,  G03F1/78

Abstract: A photomask and method for forming a non-orthogonal feature on the photomask are provided. A method for forming a non-orthogonal feature on a photomask blank includes providing a mask layout file including a primitive shape and fracturing the primitive shape to create a plurality of writeable shapes in a mask pattern file. A non-orthogonal feature formed by the writeable shapes is formed on a photomask blank by using a lithography system to image the writeable shapes from the mask pattern file onto a resist layer of the photomask blank.

Abstract translation: 提供了一种用于在光掩模上形成非正交特征的光掩模和方法。 一种用于在光掩模坯料上形成非正交特征的方法包括提供包括原始形状的掩模布局文件并且压缩原始形状以在掩模图案文件中创建多个可写形状。 通过使用光刻系统将可写形状形成的非正交特征形成在光掩模坯料上，以将可写形状从掩模图案图像成像到光掩模坯料的抗蚀剂层上。

公开(公告)号：US06894766B1

公开(公告)日：2005-05-17

申请号：US10106605

申请日：2002-03-26

Applicant: Craig A. West ,  Glenn Edward Storm ,  Susan S. MacDonald ,  Joseph S. Gordon ,  James A. Carroll, III

Inventor： Craig A. West ,  Glenn Edward Storm ,  Susan S. MacDonald ,  Joseph S. Gordon ,  James A. Carroll, III

IPC: G03B27/62 ,  G03F1/14

CPC classification number: G03F1/64 ,  G03F1/38

Abstract: A method for constructing a photomask assembly using an encoded mark is disclosed. The method includes comparing a first encoded mark located on a photomask with a second encoded mark located on a pellicle. The first encoded mark includes one or more first symbols and the second encoded mark includes one or more second symbols. The method further includes mounting the pellicle on the photomask if at least one of the symbols of the first encoded mark matches at least one of the symbols of the second encoded mark.

Abstract translation: 公开了一种使用编码标记构造光掩模组件的方法。 该方法包括将位于光掩模上的第一编码标记与位于防护薄膜上的第二编码标记进行比较。 第一编码标记包括一个或多个第一符号，第二编码标记包括一个或多个第二符号。 该方法还包括如果第一编码标记中的至少一个符号与第二编码标记的符号中的至少一个匹配，则将防护薄膜组件安装在光掩模上。