METHOD AND DEVICE FOR WAFER-LEVEL TESTING
    1.
    发明公开

    公开(公告)号:US20230366925A1

    公开(公告)日:2023-11-16

    申请号:US18359906

    申请日:2023-07-27

    IPC分类号: G01R31/28 G01R31/26

    摘要: The present disclosure provides a method and a system for testing semiconductor device. The method includes providing a device under test (DUT) having an input terminal and an output terminal; applying a voltage having a first voltage level to the input terminal of the DUT during a first period; applying a stress signal to the input terminal of the DUT during a second period subsequent to the first period; obtaining an output signal in response to the stress signal at the output terminal of the DUT; and comparing the output signal with the stress signal. The stress signal includes a plurality of sequences, each having a ramp-up stage and a ramp-down stage. The stress signal has a second voltage level and a third voltage level.

    METHOD AND SYSTEM FOR WAFER-LEVEL TESTING
    2.
    发明公开

    公开(公告)号:US20230251306A1

    公开(公告)日:2023-08-10

    申请号:US18301274

    申请日:2023-04-17

    IPC分类号: G01R31/28

    CPC分类号: G01R31/2879 G01R31/2886

    摘要: The present disclosure provides a method and a system for testing semiconductor device. The method includes the following operations. A wafer having an IC formed thereon is provided. The IC is energized by raising the voltage of the IC to a first voltage level during a first period. A stress signal is applied to the IC. The stress signal includes a plurality of sequences during a second period subsequent to the first period. Each of the sequence has a ramp-up stage and a ramp-down stage. The stress signal causes the voltage of the IC to fluctuate between a second voltage level and a third voltage level. Whether the IC complies with a test criterion is determined after applying the stress signal.

    METHOD AND DEVICE FOR WAFER-LEVEL TESTING
    3.
    发明公开

    公开(公告)号:US20240361380A1

    公开(公告)日:2024-10-31

    申请号:US18765343

    申请日:2024-07-08

    IPC分类号: G01R31/28 G01R31/26

    摘要: The present disclosure provides a method and a system for testing semiconductor device. The system includes a signal generator and a module. The signal generator is configured to apply an initial signal to an input terminal of a DUT during a first period; and apply a stress signal to the input terminal in a second period. The module is configured to: obtain an output signal in response to the initial signal and the stress signal at an output terminal of the DUT, the output signal in response to the stress signal including a first sequence and a second sequence, each of the first sequence and the second sequence having a ramp-up stage and a ramp-down stage, wherein a duration of the first sequence is longer than that of the second sequence; and compare the output signal with the stress signal.

    METHOD AND SYSTEM FOR WAFER-LEVEL TESTING

    公开(公告)号:US20210311110A1

    公开(公告)日:2021-10-07

    申请号:US17353543

    申请日:2021-06-21

    IPC分类号: G01R31/28

    摘要: The present disclosure provides a method and a system for testing semiconductor device. The method includes the following operations. A wafer having an IC formed thereon is provided. The IC is energized by raising the voltage of the IC to a first voltage level during a first period. A stress signal is applied to the IC. The stress signal includes a plurality of sequences during a second period subsequent to the first period. Each of the sequence has a ramp-up stage and a ramp-down stage. The stress signal causes the voltage of the IC to fluctuate between a second voltage level and a third voltage level. Whether the IC complies with a test criterion is determined after applying the stress signal.

    METHOD AND SYSTEM FOR WAFER-LEVEL TESTING
    5.
    发明公开

    公开(公告)号:US20240310434A1

    公开(公告)日:2024-09-19

    申请号:US18672047

    申请日:2024-05-23

    IPC分类号: G01R31/28

    CPC分类号: G01R31/2879 G01R31/2886

    摘要: The present disclosure provides a method and a system for testing semiconductor device. The method includes the following operations: energizing an integrated circuit (IC) on a wafer by raising a voltage of the IC to a first voltage level during a first period, and applying to the IC a stress signal including a first sequence and a second sequence during a second period subsequent to the first period, each of the first sequence and the second sequence having a ramp-up stage and a ramp-down stage. The stress signal causes the voltage of the IC to fluctuate between a second voltage level and a third voltage level, wherein a duration of the first sequence is longer than that of the second sequence.

    METHOD AND DEVICE FOR WAFER-LEVEL TESTING

    公开(公告)号:US20220326300A1

    公开(公告)日:2022-10-13

    申请号:US17809577

    申请日:2022-06-29

    IPC分类号: G01R31/28 G01R31/26

    摘要: The present disclosure provides a method and a system for testing semiconductor device. The method includes providing a device under test (DUT) having an input terminal and an output terminal; applying a voltage having a first voltage level to the input terminal of the DUT during a first period; applying a stress signal to the input terminal of the DUT during a second period subsequent to the first period; obtaining an output signal in response to the stress signal at the output terminal of the DUT; and comparing the output signal with the stress signal. The stress signal includes a plurality of sequences, each having a ramp-up stage and a ramp-down stage. The stress signal has a second voltage level and a third voltage level.

    METHOD AND DEVICE FOR WAFER-LEVEL TESTING

    公开(公告)号:US20210199710A1

    公开(公告)日:2021-07-01

    申请号:US17198764

    申请日:2021-03-11

    IPC分类号: G01R31/28 G01R31/26

    摘要: The present disclosure provides a method and a system for testing semiconductor device. The method includes providing a device under test (DUT) having an input terminal and an output terminal; applying a voltage having a first voltage level to the input terminal of the DUT during a first period; applying a stress signal to the input terminal of the DUT during a second period subsequent to the first period; obtaining an output signal in response to the stress signal at the output terminal of the DUT; and comparing the output signal with the stress signal. The stress signal includes a plurality of sequences, each having a ramp-up stage and a ramp-down stage. The stress signal has a second voltage level and a third voltage level.

    METHOD AND SYSTEM FOR WAFER-LEVEL TESTING
    8.
    发明申请

    公开(公告)号:US20200064396A1

    公开(公告)日:2020-02-27

    申请号:US16522551

    申请日:2019-07-25

    IPC分类号: G01R31/28

    摘要: The present disclosure provides a method and a system for testing semiconductor device. The method includes the following operations. A wafer having an IC formed thereon is provided. The IC is energized by raising the voltage of the IC to a first voltage level during a first period. A stress signal is applied to the IC. The stress signal includes a plurality of sequences during a second period subsequent to the first period. Each of the sequence has a ramp-up stage and a ramp-down stage. The stress signal causes the voltage of the IC to fluctuate between a second voltage level and a third voltage level. Whether the IC complies with a test criterion is determined after applying the stress signal.