公开(公告)号：US20160163425A1

公开(公告)日：2016-06-09

申请号：US14907893

申请日：2014-07-22

Applicant: TANAKA KIKINZOKU KOGYO K.K.

Inventor： Naoji KASHIMA ,  Tomonori WATANABE ,  Shigeo NAGAYA ,  Kunihiro SHIMA ,  Shuichi KUBOTA ,  Ryosuke SUGANUMA

IPC: H01B12/06 ,  C30B29/02 ,  C30B29/22 ,  C30B19/12

CPC classification number: H01B12/06 ,  C30B19/12 ,  C30B23/025 ,  C30B25/183 ,  C30B25/186 ,  C30B29/02 ,  C30B29/225 ,  H01L39/2461

Abstract: The present invention provides a textured substrate for forming an epitaxial film, including a textured metal layer on at least one surface of the layer, the textured metal layer including a copper layer having a cube texture, the textured metal layer having, on a surface of the layer, palladium added in an amount of 10 to 300 ng/mm2 per unit area, the hydrogen content of the surface of the textured metal layer being 700 to 2000 ppm. This textured substrate is produced through a step of adding 10 to 300 ng/mm2 per unit area of palladium by strike plating to a surface of the copper layer having a cube texture.

Abstract translation: 本发明提供了一种用于形成外延膜的织构化衬底，其包括在该层的至少一个表面上的织构化金属层，该纹理化金属层包括具有立体结构的铜层，该织构化金属层在 该层，每单位面积添加量为10〜300ng / mm 2的钯，织构化金属层的表面的氢含量为700〜2000ppm。 这种织构化的基板是通过在具有立体结构的铜层的表面上通过冲击镀添加10至300ng / mm 2的每单位面积钯的步骤而制造的。