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公开(公告)号:US11258006B2
公开(公告)日:2022-02-22
申请号:US16996559
申请日:2020-08-18
Applicant: TOHOKU UNIVERSITY
Inventor: Tetsuo Endoh , Masaaki Niwa , Hiroaki Honjo , Hideo Sato , Shoji Ikeda , Toshinari Watanabe
Abstract: Provided are a magnetic memory element in which an improvement in properties, such as an improvement in coercive properties or a reduction in a leak current, can be attained, a method for producing the same, and a magnetic memory. The magnetic memory element, includes: a columnar stack ST in which a reference layer FX having a fixed magnetization direction, a barrier layer TL including a non-magnetic body, and a recording layer FR having a reversible magnetization direction are stacked in this order; and an insulating film which contains nitrogen and is provided to cover a lateral surface of the columnar stack, in which in one or both of the recording layer and the barrier layer, a nitrogen concentration is 7×1030 atoms/m2 or more in a position of 2 nm inside from an outer circumferential end of the columnar stack.
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公开(公告)号:US20210091304A1
公开(公告)日:2021-03-25
申请号:US16996559
申请日:2020-08-18
Applicant: TOHOKU UNIVERSITY
Inventor: Tetsuo Endoh , Masaaki Niwa , Hiroaki Honjo , Hideo Sato , Shoji Ikeda , Toshinari Watanabe
Abstract: [Problem] Provided are a magnetic memory element in which an improvement in properties, such as an improvement in coercive properties or a reduction in a leak current, can be attained, a method for producing the same, and a magnetic memory.
[Means for Resolution] The magnetic memory element, includes: a columnar stack ST in which a reference layer FX having a fixed magnetization direction, a barrier layer TL including a non-magnetic body, and a recording layer FR having a reversible magnetization direction are stacked in this order; and an insulating film (a second insulating film 20) which contains nitrogen and is provided to cover a lateral surface of the columnar stack, in which in one or both of the recording layer and the barrier layer, a nitrogen concentration is 7×1030 atoms/m2 or more in a position of 2 nm inside from an outer circumferential end of the columnar stack.
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