公开(公告)号：US20230313413A1

公开(公告)日：2023-10-05

申请号：US18022417

申请日：2022-08-17

Applicant: TOKUYAMA CORPORATION

Inventor： Masayuki FUKUDA ,  Reo YAMAMOTO

IPC: C30B23/02 ,  C30B33/00 ,  B08B3/08 ,  B08B3/12 ,  C11D7/24 ,  C30B29/40 ,  C11D7/30

CPC classification number: C30B33/00 ,  B08B3/08 ,  B08B3/12 ,  C11D7/24 ,  C11D7/30 ,  C30B23/02 ,  C30B29/403

Abstract: Provided are a method of cleaning a group III nitride single crystal substrate which enables the roughness of a nitrogen-polar face of the group III nitride single crystal substrate to be suppressed to remove foreign substances, and a method of producing a group III nitride single crystal substrate. The method of cleaning a group III nitride single crystal substrate having a group III element-polar face, and the nitrogen-polar face opposite the group III element-polar face includes: cleaning the nitrogen-polar face with a detergent including a fluoroorganic compound.

公开(公告)号：US20250011971A1

公开(公告)日：2025-01-09

申请号：US18708259

申请日：2022-12-08

Applicant: TOKUYAMA CORPORATION

Inventor： Masayuki FUKUDA ,  Tatsuya HITOMI ,  Reo YAMAMOTO

IPC: C30B33/00 ,  B24B7/22 ,  B28D5/00 ,  B28D5/04 ,  C30B29/40

Abstract: A method of producing a group III nitride single crystal substrate includes: processing a face of a group III nitride single crystal layer of a layered body, so that the face is parallel to a crystal lattice plane, the layered body including a base substrate, and the group III nitride single crystal layer over the base substrate; after said processing, cutting and separating a group III nitride single crystal in a form of plate from the base substrate or the group III nitride single crystal layer, or cutting and separating the base substrate and the group III nitride single crystal layer on an interface therebetween in a form of plate; and after said cutting and separating, polishing a cut surface of the group III nitride single crystal, the cut surface being formed by said cutting.

公开(公告)号：US20170296690A1

公开(公告)日：2017-10-19

申请号：US15514395

申请日：2015-09-03

Applicant: Tokuyama Corporation

Inventor： Shingo MATSUI ,  Yuriko HORII ,  Reo YAMAMOTO ,  Keiichiro HIRONAKA ,  Yasutaka HAMA

IPC: A61L9/20

CPC classification number: A61L9/20 ,  A61L2/10 ,  A61L2202/11 ,  A61L2202/122 ,  A61L2209/12 ,  A61L2209/13 ,  A61L2209/14 ,  A61N5/06 ,  C02F1/32 ,  F24F7/00

Abstract: To provide an ultraviolet sterilizing apparatus that is capable of efficiently performing ultraviolet sterilization on a large volume of gas or pressurized liquid in a short time, can be made compact, and can be stably and safely used for a long time.A pressurized fluid sterilizing apparatus including a pressure-resistant container or piping that provides pressurizing space, the pressurized fluid sterilizing apparatus sterilizing pressurized fluid such as pressurized gas and pressurized liquid in the container or piping by irradiating the pressurized fluid with ultraviolet rays, the pressurized fluid sterilizing apparatus being characterized in that the pressurized gas or pressurized liquid in the pressurizing space is irradiated with ultraviolet rays by placing an optical member for ultraviolet emission such as a diffusion lens and a light guide plate in the pressurizing space, transmitting ultraviolet rays emitted from an ultraviolet light source such as an ultraviolet light emitting diode by using a light transmission path such as an optical fiber to the optical member for ultraviolet emission, and emitting the ultraviolet rays.