公开(公告)号：US20250162807A1

公开(公告)日：2025-05-22

申请号：US19032918

申请日：2025-01-21

Applicant: Tokyo Electron Limited

Inventor： Koichi SHIMADA

IPC: B65G1/14

Abstract: A substrate holder includes a first boat configured to hold a substrate in a shelf-like manner, and a second boat coaxial with the first boat and provided to move up and down relative to the first boat. The second boat holds a substrate in a shelf-like manner. The first boat includes a first bottom plate and a first ceiling plate provided to face each other, a first support column connecting the first bottom plate and the first ceiling plate to each other, and a first placement surface on which the substrate is placed. The second boat includes a second bottom plate and a second ceiling plate provided to vertically face each other, a second support column connecting the second bottom plate and the second ceiling plate, and a second placement surface on which the substrate is placed. The second ceiling plate overlaps the first ceiling plate in a plan view.

公开(公告)号：US20230018009A1

公开(公告)日：2023-01-19

申请号：US17811373

申请日：2022-07-08

Applicant: Tokyo Electron Limited

Inventor： Koichi SHIMADA

IPC: B65G1/14

Abstract: A substrate holder includes a first boat configured to hold a substrate in a shelf-like manner, and a second boat coaxial with the first boat and provided to move up and down relative to the first boat. The second boat holds a substrate in a shelf-like manner. The first boat includes a first bottom plate and a first ceiling plate provided to face each other, a first support column connecting the first bottom plate and the first ceiling plate to each other, and a first placement surface on which the substrate is placed. The second boat includes a second bottom plate and a second ceiling plate provided to vertically face each other, a second support column connecting the second bottom plate and the second ceiling plate, and a second placement surface on which the substrate is placed. The second ceiling plate overlaps the first ceiling plate in a plan view.

公开(公告)号：US20230033715A1

公开(公告)日：2023-02-02

申请号：US17869096

申请日：2022-07-20

Applicant: Tokyo Electron Limited

Inventor： Koichi SHIMADA

IPC: H01L21/673

Abstract: A substrate processing apparatus includes: a first boat configured to hold substrates in a shelf shape; a second boat provided coaxially with the first boat and configured to hold substrates in a shelf shape; and a drive configured to rotate the first boat and the second boat in a synchronized manner and configured to raise and lower the second boat relative to the first boat.

公开(公告)号：US20150107515A1

公开(公告)日：2015-04-23

申请号：US14583404

申请日：2014-12-26

Applicant: TOKYO ELECTRON LIMITED

Inventor： Koichi SHIMADA

IPC: C23C16/458 ,  C23C16/455

CPC classification number: C23C16/458 ,  C23C16/4412 ,  C23C16/455 ,  H01L21/67178 ,  Y10T29/49947 ,  Y10T137/0402

Abstract: The disclosure provides an assembly method of a vacuum processing apparatus having a reaction vessel and an exhaust port that are made of quartz and airtightly connected to each other, in order to prevent breakage of the vessel. The method includes (a) mounting an attachment member on one end portion of the reaction vessel, (b) connecting and fixing at least a flange portion of an exhaust pipe to the exhaust port, (c) fixing the attachment member to a portion of the exhaust pipe including at least the flange portion connected and fixed to the exhaust port by using fixing members after (a) and (b), (d) fixing the attachment member to a support portion after (a), and (e) fixing the exhaust pipe to an exhaust pipe fixing portion different from the attachment member at a lower position than a fixing position of the attachment member after completing (a) to (d).

Abstract translation: 本发明提供一种真空处理装置的组装方法，其具有由石英制成并彼此气密连接的反应容器和排气口，以防止容器破裂。 该方法包括：（a）将安装构件安装在反应容器的一个端部，（b）至少将排气管的凸缘部分连接并固定到排气口，（c）将安装构件固定到 所述排气管至少包括在（a）和（b）之后通过使用固定构件连接并固定到排气口的凸缘部分，（d）在（a）之后将附接构件固定到支撑部分，以及（e）固定 在完成（a）至（d）之后，将排气管排放到比安装构件的固定位置低的位置处与安装构件不同的排气管固定部。

公开(公告)号：US20150007772A1

公开(公告)日：2015-01-08

申请号：US14312137

申请日：2014-06-23

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kohei FUKUSHIMA ,  Hiroyuki MATSUURA ,  Yutaka MOTOYAMA ,  Koichi SHIMADA ,  Takeshi ANDO

IPC: C23C16/509

CPC classification number: C23C16/507 ,  C23C16/452 ,  H01J37/321 ,  H01J37/32357 ,  H01J37/32779

Abstract: A substrate processing apparatus includes: a processing vessel configured to be vacuumed; a holding unit configured to hold a plurality of substrates and to be inserted into or separated from the processing vessel; a gas supply unit configured to supply gas into the processing vessel; a plasma generation box partitioned and formed by a plasma partition wall; an inductively coupled electrode located at an outer sidewall of the plasma generation box along its length direction; a high frequency power supply connected to the inductively coupled electrode through a feed line; and a ground electrode located outside the plasma generation box and between the processing vessel and the inductively coupled electrode and arranged in the vicinity of the outer sidewall of the plasma generation box or at least partially in contact with the outer sidewall.

Abstract translation: 基板处理装置包括：被配置为被抽真空的处理容器; 保持单元，其构造成保持多个基板并插入到处理容器中或与处理容器分离; 气体供给单元，其构造成将气体供给到所述处理容器内; 由等离子体隔壁分隔和形成的等离子体产生箱; 电感耦合电极，位于等离子体发生箱的沿其长度方向的外侧壁; 高频电源，通过馈电线连接到电感耦合电极; 位于等离子体生成箱的外部，处理容器与电感耦合电极之间的配置在等离子体生成箱的外侧壁附近，或至少部分地与外侧壁接触的接地电极。