-
1.发明申请公开(公告)号：US20190107779A1
公开(公告)日：2019-04-11
申请号：US16148315
申请日：2018-10-01
发明人： Masatoshi ARAI , Takuya IKEDA , Koshi ONISHI
IPC分类号： G03F7/038 , G03F7/039 , G03F7/16 , C08F220/38 , C07D409/04 , C07D307/42 , C07D333/22 , C08F220/28 , G03F7/20 , G03F7/38 , G03F7/32
摘要： A resist composition including a resin component having a structural unit derived from a compound represented by formula (a0-1), in which W represents a polymerizable group-containing group; Ra01 represents an alkyl group or an aromatic heterocyclic group containing an oxygen atom or a sulfur atom; in the case where Ra01 is an aromatic heterocyclic group containing an oxygen atom or a sulfur atom, Ra02 is a group which forms an aliphatic cyclic group containing an electron-withdrawing group, together with the tertiary carbon atom (*C) to which Ra01 is bonded; and when Ra01 is an alkyl group, Ra02 is a group in which an aliphatic cyclic group containing an electron-withdrawing group forms a condensed ring together with an aromatic heterocyclic group containing an oxygen atom or a sulfur atom.
-
公开(公告)号：US20220121116A1
公开(公告)日：2022-04-21
申请号：US17450528
申请日：2021-10-11
发明人： Koshi ONISHI , Masatoshi ARAI , Masahito YAHAGI , Yosuke SUZUKI , Yuta IWASAWA
IPC分类号： G03F7/004 , G03F7/039 , G03F7/038 , C08F212/14
摘要： A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formulae (a0-1) and one or more compounds selected from the group consisting of a compound (B01) represented by General Formula (b0-1) and a compound (B02) represented by General Formula (b0-2), W01 represents a polymerizable group-containing group, Ya01 represents a single bond or the like, Rx01 represents an acid dissociable group, Rb1 and Rb4 represents an aryl group having a fluorine atom, Rb2, Rb3, and Rb5 represents an aryl group or the like which may have a substituent, and X01− and X02− represents a counter anion
-
公开(公告)号：US20220121118A1
公开(公告)日：2022-04-21
申请号：US17450150
申请日：2021-10-06
发明人： Masahito YAHAGI , Tasuku MATSUMIYA , Yosuke SUZUKI , Yuta IWASAWA , Takahiro KOJIMA , Koshi ONISHI
摘要： A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1) and containing a compound (D0) represented by General Formula (d0), W01 represents a polymerizable group-containing group, Ya01 represents a single bond or the like, Rx01 represents an acid dissociable group, Mm+ represents an m-valent organic cation, and Rd0 represents a substituent
-
4.发明申请公开(公告)号：US20190384175A1
公开(公告)日：2019-12-19
申请号：US16443001
申请日：2019-06-17
发明人： Masatoshi ARAI , Takaya MAEHASHI , Koshi ONISHI
IPC分类号： G03F7/039 , G03F7/038 , C08F212/14 , C07C69/76 , C08F220/14
摘要： A resist composition including a resin component which exhibits changed solubility in a developing solution under action of acid, the resin component including a structural unit represented by general formula (a0) shown below in which Vax0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Ya0 represents a carbon atom; Xa0 represents a group which forms a cyclic hydrocarbon group together with Ya0; Ra00 represents a hydrocarbon group which may have a substituent; provided that at least one of Xa0 and Ra00 has a carbon atom constituting a carbon-carbon unsaturated bond at an α-position of Ya0.
-
公开(公告)号：US20210200088A1
公开(公告)日：2021-07-01
申请号：US17129218
申请日：2020-12-21
发明人： Toshiaki YATSUNAMI , Takaya MAEHASHI , Masahiro SHIOSAKI , Hiroshi GOHARA , Seiji TODOROKI , Koshi ONISHI , KhanhTin NGUYEN , Nobuhiro MICHIBAYASHI , Takuya IKEDA
摘要： A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, a total amount of a basic component including a compound represented by general formula (d0) and an acid-generator component is 25 to 60 parts by weight relative to 100 parts by weight of a base material component. In formula (d0), Rd0 represents a monovalent organic group; Xd0 represents —O—, —C(═O)—, —O—C(═O)—, —C(═O)—O—, —S— or —SO2—; Yd0 represents a single bond or a divalent hydrocarbon group which may have a substituent; Mm+ represents a m-valent organic cation; and m represents an integer of 1 or more Rd0-Xd0-Yd0-COO⊖(Mm⊕)1/m (d0).
-
公开(公告)号：US20180024433A1
公开(公告)日：2018-01-25
申请号：US15651177
申请日：2017-07-17
CPC分类号： G03F7/0382 , C08F18/02 , G03F7/0392 , G03F7/0397 , H01L21/02
摘要： A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0″ is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.
-
公开(公告)号：US20220121117A1
公开(公告)日：2022-04-21
申请号：US17450535
申请日：2021-10-11
发明人： Koshi ONISHI , Masatoshi ARAI , Junichi MIYAKAWA
摘要： A resist composition that generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, which contains a resin component (A1) exhibiting changed solubility in a developing solution under action of acid, the resin component (A1) has a constitutional unit (a01) derived from a compound represented by General Formula (a0-1), W01 represents a polymerizable group-containing group, Ya01 represents a single bond or a divalent linking group, Ra01 represents a cyclic acid dissociable group, q represents an integer in a range of 0 to 3, and n represents an integer of 1 or more, provided that n≤q×2+4 is satisfied
-
公开(公告)号：US20210055656A1
公开(公告)日：2021-02-25
申请号：US16997764
申请日：2020-08-19
发明人： Koshi ONISHI , Masatoshi ARAI , Yoshitaka KOMURO
摘要： A resist composition including a resin component having a structural unit (a0) represented by general formula (a0) in which Va0 represents a linear or branched alkylene group, a linear or branched fluorinated alkylene group, —Y01—O—C(═O)—Y02— or —Y01—C(═O)—O—Y02—; Y01 and Y02 each independently represents a linear or branched alkylene group; Ya0 represents a carbon atom; Xa0 represents a group which forms a monocyclic hydrocarbon group together with Ya0, provided that part or all of the hydrogen atoms of the cyclic hydrocarbon group may be substituted with a substituent; Ra00 represents a hydrocarbon group which may have a substituent; provided that at least one of Xa0 and Ra00 has a carbon-carbon unsaturated bond at an α-position of Ya0.
-
公开(公告)号：US20190384174A1
公开(公告)日：2019-12-19
申请号：US16441652
申请日：2019-06-14
发明人： Masatoshi ARAI , Takaya MAEHASHI , Koshi ONISHI
IPC分类号： G03F7/039 , G03F7/038 , G03F7/004 , C08F212/14 , C08F220/18
摘要： A resist composition including a base component and an acid generator component, the base component including a resin component having a structural unit (a0) represented by general formula (a0) shown below, and the acid generator component containing at least one of a compound (b-1), a compound (b-2) and a compound (b-3) represented by general formula (b-3) shown below in which Wa represents a divalent aromatic hydrocarbon group; Ra00 represents an acid dissociable group; R101, R104 and R106 each independently represents a hydrocarbon group containing an aromatic ring; R105, R107 and R108 each independently represents a cyclic group, a chain alkyl group which may have a substituent or a chain alkenyl group; R102 represents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms and M′m+ represents an m-valent onium cation.
-
公开(公告)号：US20180022916A1
公开(公告)日：2018-01-25
申请号：US15641959
申请日：2017-07-05
发明人： Yoshitaka KOMURO , Masatoshi ARAI , Koshi ONISHI , KhanhTin NGUYEN , Masahiro SHIOSAKI , Takuya IKEDA , Takaya MAEHASHI
CPC分类号： C08L67/07 , C08F8/12 , C08F12/22 , C08F212/14 , C08L25/02 , C08L53/005 , C08L2205/02 , C08L2205/025 , C09D125/18 , G03F7/0397 , C08F220/18 , C08F220/06 , C08F220/40 , C08L25/18
摘要： A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.
-
-
-
-
-
-
-
-
-
搜索结果
10 条记录 (耗时 0.022 秒)
