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公开(公告)号：US20210191268A1
公开(公告)日：2021-06-24
申请号：US17121190
申请日：2020-12-14
IPC分类号： G03F7/039 , G03F7/004 , G03F7/038 , C08F220/18 , C08F212/14 , C08F220/30 , C08F212/32 , C08F220/28
摘要： A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1), and an acid generator component composed of an anion moiety and a cation moiety. In General Formula (a01-1), W1 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, R11 represents an unsaturated hydrocarbon group which may have a substituent, R12 and R13 represent a chain saturated hydrocarbon group which may have a substituent, and a carbon atom at an α-position of Ct constitutes a carbon-carbon unsaturated bond. In General Formula (a02-1), W2 represents a polymerizable group-containing group, Wa2 represents an aromatic hydrocarbon group, and n2 represents an integer in a range of 1 to 3
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2.发明申请公开(公告)号：US20220011665A1
公开(公告)日：2022-01-13
申请号：US17304442
申请日：2021-06-21
发明人： KhanhTin NGUYEN
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , C07D319/20 , C07C381/12 , C07D327/06 , C07D311/66 , C07D317/50 , C07D333/70
摘要： A resist composition that contains a base material component exhibiting changed solubility in a developing solution under action of acid and a compound (D0) represented by General Formula (d0), in which R01, R02, R03, and R04 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group; alternatively, R01 and R02, R02 and R03, or R03 and R04 are bonded to each other to form an aromatic ring; R05 represents a hydrogen atom or an alkyl group; Y represents a group that forms an alicyclic group together with a carbon atom *C; provided that at least one of the carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group; m represents an integer of 1 or more, and Mm+ represents an m-valent organic cation
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公开(公告)号：US20180022916A1
公开(公告)日：2018-01-25
申请号：US15641959
申请日：2017-07-05
发明人： Yoshitaka KOMURO , Masatoshi ARAI , Koshi ONISHI , KhanhTin NGUYEN , Masahiro SHIOSAKI , Takuya IKEDA , Takaya MAEHASHI
CPC分类号： C08L67/07 , C08F8/12 , C08F12/22 , C08F212/14 , C08L25/02 , C08L53/005 , C08L2205/02 , C08L2205/025 , C09D125/18 , G03F7/0397 , C08F220/18 , C08F220/06 , C08F220/40 , C08L25/18
摘要： A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.
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公开(公告)号：US20200183273A1
公开(公告)日：2020-06-11
申请号：US16686925
申请日：2019-11-18
IPC分类号： G03F7/004 , C07C65/05 , C07C321/30
摘要： A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, Mm+ represents an m-valent organic cation, Rd0 represents a substituent, p represents an integer of 0 to 3, q represents an integer of 0 to 3, n represents an integer of 2 or greater, and a relationship of “n+p≤(q×2)+5” is satisfied.
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5.发明申请公开(公告)号：US20190219920A1
公开(公告)日：2019-07-18
申请号：US16334302
申请日：2017-10-04
发明人： Takashi NAGAMINE , Hideto NITO , Masafumi FUJISAKI , Tatsuya FUJII , Yuki FUKUMURA , Takahiro KOJIMA , Issei SUZUKI , Takuya IKEDA , KhanhTin NGUYEN
CPC分类号： G03F7/039 , C08F20/26 , G03F7/0045 , G03F7/038 , G03F7/20 , G03F7/2002 , G03F7/2059
摘要： A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a polymeric compound having a structural unit represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va0 represents a divalent hydrocarbon group; na0 represents an integer of 0 to 2; Ra00 represents an acid dissociable group represented by general formula (a0-r1-1); Ra01 and Ra02 represents a hydrocarbon group; Ra01 and Ra02 may be mutually bonded to form a ring; Ya0 represents a quaternary carbon atom; Ra031, Ra032 and Ra033 each independently represents a hydrocarbon group, provided that at least one of Ra031, Ra032 and Ra033 is a hydrocarbon group having a polar group).
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6.发明申请公开(公告)号：US20220397825A1
公开(公告)日：2022-12-15
申请号：US17660576
申请日：2022-04-25
发明人： KhanhTin NGUYEN
摘要： A resist composition containing a base material component and a compound represented by General Formula (d0), in which in the formula, Rd0 represents a condensed cyclic group containing a condensed ring containing at least one aromatic rings, the condensed cyclic group having, as a substituent, an acid decomposable group which is decomposed under action of acid to form a polar group, Yd0 represents a divalent linking group or a single bond, Mm+ represents an m-valent organic cation, and m represents an integer of 1 or more
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公开(公告)号：US20220019142A1
公开(公告)日：2022-01-20
申请号：US17304622
申请日：2021-06-23
发明人： Masatoshi ARAI , KhanhTin NGUYEN
IPC分类号： G03F7/039 , G03F7/038 , C08F220/18 , C08F212/14 , C08F220/30 , C08F220/28
摘要： A resist composition containing a resin component (A1) having a constitutional unit derived from a compound represented by General Formula (a01-1). In the formula, W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, and Xt represents a group that forms a monocyclic or polycyclic alicyclic group together with Ct, Ra1 to Ra3 represents a hydrocarbon group having 1 to 10 carbon atoms, which may have a substituent, or a hydrogen atom, or two or more of Ra1 to Ra3 are bonded to each other to form an aliphatic ring, not all of Ra1 to Ra3 are hydrogen atoms, n represents 0 or 1
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公开(公告)号：US20210200088A1
公开(公告)日：2021-07-01
申请号：US17129218
申请日：2020-12-21
发明人： Toshiaki YATSUNAMI , Takaya MAEHASHI , Masahiro SHIOSAKI , Hiroshi GOHARA , Seiji TODOROKI , Koshi ONISHI , KhanhTin NGUYEN , Nobuhiro MICHIBAYASHI , Takuya IKEDA
摘要： A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, a total amount of a basic component including a compound represented by general formula (d0) and an acid-generator component is 25 to 60 parts by weight relative to 100 parts by weight of a base material component. In formula (d0), Rd0 represents a monovalent organic group; Xd0 represents —O—, —C(═O)—, —O—C(═O)—, —C(═O)—O—, —S— or —SO2—; Yd0 represents a single bond or a divalent hydrocarbon group which may have a substituent; Mm+ represents a m-valent organic cation; and m represents an integer of 1 or more Rd0-Xd0-Yd0-COO⊖(Mm⊕)1/m (d0).
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公开(公告)号：US20180024433A1
公开(公告)日：2018-01-25
申请号：US15651177
申请日：2017-07-17
CPC分类号： G03F7/0382 , C08F18/02 , G03F7/0392 , G03F7/0397 , H01L21/02
摘要： A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0″ is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.
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