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    BRUSH COMPOSITION, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
    2.
    发明申请
    BRUSH COMPOSITION, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE 有权
    刷子组合物及其生产包含相分离结构的结构的方法

    公开(公告)号：US20160194751A1

    公开(公告)日：2016-07-07

    申请号：US14957922

    申请日：2015-12-03

    申请人： TOKYO OHKA KOGYO CO., LTD.

    发明人： Masahito YAHAGI ,  Takaya MAEHASHI ,  Akiya KAWAUE ,  Issei SUZUKI ,  Tasuku MATSUMIYA ,  Tsuyoshi KUROSAWA ,  Hitoshi YAMANO

    IPC分类号： C23C14/58 ,  C09D153/00

    CPC分类号： B05D1/38 ,  B05D3/0254 ,  B05D7/52 ,  C09D153/00 ,  G03F7/0002

    摘要： A brush composition used for phase-separation of a layer containing a block copolymer having plural kinds of blocks bonded formed on a substrate, the brush composition including a resin component, the resin component having a structural unit (u1) represented by genera formula (u1-1), and having a hydroxy group on at least one terminal portion of the main chain thereof: in formula (u1-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R1 represents a halogen atom, or a linear, branched or cyclic hydrocarbon group of 1 to 20 carbon atoms optionally containing an oxygen atom, a halogen atom or a silicon atom, or a combination of the linear, branched or cyclic hydrocarbon group; and p represents an integer of 1 to 5.

    摘要翻译： 一种刷组合物，用于相分离含有在基材上形成的具有多种结块的嵌段共聚物的层，所述刷组合物包含树脂组分，所述树脂组分具有由式（u1）表示的结构单元（u1） -1），并且在其主链的至少一个末端部分具有羟基：在式（u1-1）中，R表示氢原子，1〜5个碳原子的烷基或卤代烷基 1至5个碳原子; R 1表示卤素原子或任选含有氧原子，卤素原子或硅原子的碳原子数1〜20的直链状，支链状或环状的烃基，或者直链状，支链状或环状的烃基的组合。 p表示1〜5的整数。

    RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    3.
    发明申请
    RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权

    公开(公告)号：US20210405527A1

    公开(公告)日：2021-12-30

    申请号：US17304620

    申请日：2021-06-23

    申请人： TOKYO OHKA KOGYO CO., LTD.

    发明人： Yuta IWASAWA ,  Yosuke SUZUKI ,  Tasuku MATSUMIYA

    IPC分类号： G03F7/004 ,  G03F7/32 ,  G03F7/20 ,  G03F7/039

    摘要： A resist composition that contains a base material component (A), a first acid generator, and a second acid generator, the first acid generator is a compound represented by General Formula (b1), the second acid generator is a compound (B2) having an anion moiety having a molar volume of 250 cm3/mol or less, and the molar volume of the anion moiety of the compound (B2) is smaller than the molar volume of the anion moiety of the compound (B1). In the formula, Rb0 represents a specific condensed cyclic group, Yb0 represents a divalent linking group, Vb0 represents a single bond, Rc1 represents an aryl group having an electron-withdrawing group, Rc2 and Rc3 each independently represent an aryl group or are bonded to each other to form a ring together with a sulfur atom in the formula

    RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    7.
    发明申请
    RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权

    公开(公告)号：US20210003918A1

    公开(公告)日：2021-01-07

    申请号：US16890501

    申请日：2020-06-02

    申请人： TOKYO OHKA KOGYO CO., LTD.

    发明人： Yuki FUKUMURA ,  Tasuku MATSUMIYA ,  Tatsuya FUJII

    IPC分类号： G03F7/039 ,  G03F7/004 ,  C08F20/26 ,  G03F7/038 ,  G03F7/20

    摘要： A resist composition containing a polymer compound having a constitutional unit (a01) represented by Formula (a01), and a fluororesin component having a constitutional unit (f10) represented by Formula (f1-01) or (f1-02), in which the constitutional unit (a01) is a constitutional unit which contains a specific acid dissociable group (a01-r-1) containing an aliphatic cyclic group and an aromatic cyclic group; in Formulae (f1-01) and (f1-02), R represents a hydrogen atom, at least one of Raf01 and Raf02 and at least one of Raf03 and Raf04 represent a hydrocarbon group substituted with a fluorine atom, and the total number of fluorine atoms is 3 or greater.