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    Chemically amplified positive-type photosensitive resin composition
    1.
    发明授权
    Chemically amplified positive-type photosensitive resin composition 有权
    化学放大正型感光性树脂组合物

    公开(公告)号：US09557651B2

    公开(公告)日：2017-01-31

    申请号：US14662659

    申请日：2015-03-19

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Shota Katayama ,  Yasushi Washio ,  Takahiro Shimizu

    IPC分类号： G03F7/30 ,  G03F7/32 ,  G03F7/20 ,  G03F7/40 ,  G03F7/09 ,  G03F7/039 ,  G03F7/004

    CPC分类号： G03F7/30 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/09 ,  G03F7/20 ,  G03F7/322 ,  G03F7/40

    摘要： A chemically amplified positive-type photosensitive resin composition capable of suppressing the phenomenon of footing in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the composition. A mercapto compound is contained in the composition which includes an acid generator capable of producing an acid when irradiated with an active ray or radiation and a resin whose solubility in alkali increases under the action of acid.

    摘要翻译： 一种化学放大型正型感光性树脂组合物，其能够抑制底部的宽度（支撑体的表面近侧）的宽度变得比顶部（接近表面的一侧 抗蚀剂层），当使用该组合物在基板的金属表面上形成用作电镀制品的模板的抗蚀剂图案时。 在组合物中含有巯基化合物，该组合物包含能够在用活性射线或辐射照射时能够产生酸的酸发生剂和在酸的作用下在碱中溶解度增加的树脂。

    CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION
    2.
    发明申请
    CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION 有权
    化学放大型阳离子型光敏树脂组合物

    公开(公告)号：US20150268553A1

    公开(公告)日：2015-09-24

    申请号：US14662659

    申请日：2015-03-19

    申请人： Tokyo Ohka Kogyo Co., Ltd.

    发明人： Shota Katayama ,  Yasushi Washio ,  Takahiro Shimizu

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/30 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/09 ,  G03F7/20 ,  G03F7/322 ,  G03F7/40

    摘要： A chemically amplified positive-type photosensitive resin composition capable of suppressing the phenomenon of footing in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the composition. A mercapto compound is contained in the composition which includes an acid generator capable of producing an acid when irradiated with an active ray or radiation and a resin whose solubility in alkali increases under the action of acid.

    摘要翻译： 一种化学放大型正型感光性树脂组合物，其能够抑制底部的宽度（支撑体的表面近侧）的宽度变得比顶部（接近表面的一侧 抗蚀剂层），当使用该组合物在基板的金属表面上形成用作电镀制品的模板的抗蚀剂图案时。 在组合物中含有巯基化合物，该组合物包含能够在用活性射线或辐射照射时能够产生酸的酸发生剂和在酸的作用下在碱中溶解度增加的树脂。

    POLYMER AND TRIAZINE COMPOUND
    3.
    发明公开
    POLYMER AND TRIAZINE COMPOUND 审中-公开

    公开(公告)号：US20240052103A1

    公开(公告)日：2024-02-15

    申请号：US18355899

    申请日：2023-07-20

    申请人： TOKYO OHKA KOGYO CO., LTD.

    发明人： Takahiro Shimizu ,  Shigeo Yasuda ,  Shingo Isobe

    IPC分类号： C08G73/06 ,  C07D251/42 ,  C08J5/18

    CPC分类号： C08G73/0644 ,  C08G73/065 ,  C07D251/42 ,  C08J5/18 ,  G02B1/041

    摘要： A polymer having a high refractive index and providing a molded product that has excellent solvent resistance; a triazine compound; a method for producing the triazine compound; a method for producing the polymer using the triazine compound; a non-photosensitive liquid composition including the polymer; a method for producing a molded product using the composition; a molded product of the composition; a film formed from the molded product; a microlens formed from the molded product; and an optical element including the microlens. A polymer including a unit having a specific structure in which an aromatic group having a hydroxy group protected with a tert-butoxycarbonyloxy group, a tert-butoxycarbonylamino group, or an acetal protecting group is linked to a triazine ring through a specific linking group.