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公开(公告)号：US20140087313A1
公开(公告)日：2014-03-27
申请号：US14026407
申请日：2013-09-13
发明人： Naohisa Ueno , Daijiro Mori , Takayuki Haraguchi
IPC分类号： G03F7/42
摘要： A stripping solution for photolithography which can effectively strip away residual materials of a photoresist pattern and etching residual materials, and has excellent anticorrosion properties on SiO2 and a variety of metal materials; and a method for forming a pattern using the stripping solution. A prescribed basic compound is used as a counter amine of the hydrofluoric acid contained in the stripping solution for photolithography, and the stripping solution for photolithography is adjusted to a pH measured at 23° C. of not more than 6.0 or 8.5 or more.
摘要翻译： 一种用于光刻的剥离溶液，可以有效地剥离光致抗蚀剂图案的残留材料并蚀刻残留材料，并且对SiO 2和各种金属材料具有优异的耐腐蚀性; 以及使用剥离溶液形成图案的方法。 使用规定的碱性化合物作为用于光刻的剥离溶液中的氢氟酸的抗衡胺，并将用于光刻的剥离溶液调节至在23℃下测得的pH不大于6.0或8.5或更高。
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2.发明申请公开(公告)号：US20140017902A1
公开(公告)日：2014-01-16
申请号：US13939549
申请日：2013-07-11
发明人： Daijiro Mori , Takayuki Haraguchi
IPC分类号： G03F7/42 , H01L21/306
CPC分类号： G03F7/426 , B81C1/00849 , C11D7/06 , C11D7/261 , C11D7/28 , C11D7/3209 , C11D7/3281 , C11D7/34 , C11D7/5022 , C11D11/0047 , G03F7/425 , H01L21/02057 , H01L21/30604 , H01L21/30655 , H01L21/31133 , H01L21/3212 , H01L21/76898
摘要： A nonaqueous cleaning liquid comprising a fluoroalkanol, a quaternary ammonium hydroxide, and an organic solvent. Compounds represented by formulae (1) and (2). Fluoroalkanol compounds include (1) H(CF2)aCH2—OH and (2) F(CF2)b(CH2)c—OH In which a and b are each an integer of from 2 to 6, and c is an integer of 1 or 2.
摘要翻译： 包含氟烷醇，季铵氢氧化物和有机溶剂的非水性清洗液。 由式（1）和（2）表示的化合物。 氟烷醇化合物包括（1）H（CF 2）a CH 2 -OH和（2）F（CF 2）b（CH 2）c -OH其中a和b各自为2至6的整数，c为整数1 或2。
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公开(公告)号：US20130172224A1
公开(公告)日：2013-07-04
申请号：US13728728
申请日：2012-12-27
IPC分类号： C23G1/26
CPC分类号： C23G1/26 , C23F11/161 , C23G1/20
摘要： In a cleaning liquid containing (A) an anticorrosive agent, and (B) a solvent, a compound represented by the following formula (1): wherein, R represents a substituent group; m is an integer of 1 to 3; and n is an integer of 0 to 3, wherein provided that m is 2 or 3, R may be the same or different; or the following formula (2): HS—(CH2)x—OH (2) wherein, x is an integer of no less than 3, is used as the anticorrosive agent (A).
摘要翻译： 在含有（A）防腐剂的清洗液和（B）溶剂中，由下式（1）表示的化合物：其中，R表示取代基; m为1〜3的整数。 n为0〜3的整数，m为2或3的情况下，R可以相同或不同， 或下式（2）表示：HS-（CH2）x-OH（2）其中x为不小于3的整数，用作防腐剂（A）。
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公开(公告)号：US10597616B2
公开(公告)日：2020-03-24
申请号：US15855362
申请日：2017-12-27
发明人： Takumi Namiki , Takayuki Haraguchi , Yu-Geng Wu
摘要： A cleaning liquid having an excellent corrosion inhibition function, and a method for manufacturing the same. The cleaning liquid contains alkanol hydroxyamine represented by general formula (1), and a basic compound other than the alkanol hydroxyamine. In the formula, Ra1 and Ra2 each independently represents a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, and Ra1 and Ra2 are not simultaneously a hydrogen atom.
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公开(公告)号：US10597609B2
公开(公告)日：2020-03-24
申请号：US15855173
申请日：2017-12-27
发明人： Takumi Namiki , Takayuki Haraguchi , Yu-Geng Wu
IPC分类号： C11D7/50 , C11D3/00 , C11D3/30 , C11D11/00 , B08B3/08 , C23F11/06 , C23F11/04 , H01L21/311 , C11D7/32 , C23F11/14 , H01L21/02 , H01L21/321
摘要： A cleaning liquid and an anticorrosion agent having an excellent corrosion inhibition function, and a method for manufacturing the same. The cleaning liquid contains alkanol hydroxyamine represented by general formula (1), alkanolamine represented by general formula (2), a solvent, and a basic compound other than the alkanol hydroxyamine and the alkanolamine or an acidic compound. In the general formula (1), Ra1 and Ra2 each independently represents a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, Ra1 and Ra2 are not simultaneously a hydrogen atom, and Rb1 and Rb2 are not simultaneously a hydrogen atom.
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公开(公告)号：US20180187133A1
公开(公告)日：2018-07-05
申请号：US15855362
申请日：2017-12-27
发明人： Takumi Namiki , Takayuki Haraguchi , Yu-Geng Wu
CPC分类号： C11D7/3218 , C11D7/06 , C11D7/261 , C11D7/3209 , C11D7/5013 , C11D11/0041 , C11D11/0047 , H01L21/02068
摘要： A cleaning liquid having an excellent corrosion inhibition function, and a method for manufacturing the same. The cleaning liquid contains alkanol hydroxyamine represented by general formula (1), and a basic compound other than the alkanol hydroxyamine. In the formula, Ra1 and Ra2 each independently represents a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, and Ra1 and Ra2 are not simultaneously a hydrogen atom.
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公开(公告)号：US09436094B2
公开(公告)日：2016-09-06
申请号：US14026407
申请日：2013-09-13
发明人： Naohisa Ueno , Daijiro Mori , Takayuki Haraguchi
IPC分类号： G03F7/42
摘要： A stripping solution for photolithography which can effectively strip away residual materials of a photoresist pattern and etching residual materials, and has excellent anticorrosion properties on SiO2 and a variety of metal materials; and a method for forming a pattern using the stripping solution. A prescribed basic compound is used as a counter amine of the hydrofluoric acid contained in the stripping solution for photolithography, and the stripping solution for photolithography is adjusted to a pH measured at 23° C. of not more than 6.0 or 8.5 or more.
摘要翻译： 一种用于光刻的剥离溶液，可以有效地剥离光致抗蚀剂图案的残留材料并蚀刻残留材料，并且对SiO 2和各种金属材料具有优异的耐腐蚀性; 以及使用剥离溶液形成图案的方法。 使用规定的碱性化合物作为用于光刻的剥离溶液中的氢氟酸的抗衡胺，并将用于光刻的剥离溶液调节至在23℃下测得的pH不大于6.0或8.5或更高。
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公开(公告)号：US20140018281A1
公开(公告)日：2014-01-16
申请号：US14021505
申请日：2013-09-09
IPC分类号： C23G1/26
CPC分类号： C23G1/26 , C23F11/161 , C23G1/20
摘要： A method of cleaning a substrate having a metal layer including copper or a copper-containing alloy, the method including cleaning the substrate using a cleaning liquid that includes a mercapto compound represented by one or both of the following formulas (1) and (2), and a solvent containing water and a water-soluble organic solvent: in which R represents a substituent group; m is an integer of 1 to 3; and n is an integer of 0 to 3, when m is 2 or 3, R may be the same or different; HS—(CH2)x—OH (2), in which x is an integer of no less than 3.
摘要翻译： 一种清洗具有包含铜或含铜合金的金属层的基板的方法，所述方法包括使用包括由下式（1）和（2）中的一个或两个表示的巯基化合物的清洗液清洗所述基板， 和含有水和水溶性有机溶剂的溶剂：其中R表示取代基; m为1〜3的整数。 n为0〜3的整数，当m为2或3时，R可以相同或不同， HS-（CH2）x-OH（2），其中x为不小于3的整数。
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9.发明授权Cleaning liquid and anticorrosive agent comprising a mercapto compound and solvent 有权包含巯基化合物和溶剂的清洁液体和防腐剂公开(公告)号：US08802610B2
公开(公告)日：2014-08-12
申请号：US14021505
申请日：2013-09-09
IPC分类号： C11D7/34
CPC分类号： C23G1/26 , C23F11/161 , C23G1/20
摘要： A method of cleaning a substrate having a metal layer including copper or a copper-containing alloy, the method including cleaning the substrate using a cleaning liquid that includes a mercapto compound represented by one or both of the following formulas (1) and (2), and a solvent containing water and a water-soluble organic solvent: in which R represents a substituent group; m is an integer of 1 to 3; and n is an integer of 0 to 3, when m is 2 or 3, R may be the same or different; HS—(CH2)x—OH (2), in which x is an integer of no less than 3.
摘要翻译： 一种清洗具有包含铜或含铜合金的金属层的基板的方法，所述方法包括使用包括由下式（1）和（2）中的一个或两个表示的巯基化合物的清洗液清洗所述基板， 和含有水和水溶性有机溶剂的溶剂：其中R表示取代基; m为1〜3的整数。 n为0〜3的整数，当m为2或3时，R可以相同或不同， HS-（CH2）x-OH（2），其中x为不小于3的整数。
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10.发明授权公开(公告)号：US09250534B2
公开(公告)日：2016-02-02
申请号：US13939549
申请日：2013-07-11
发明人： Daijiro Mori , Takayuki Haraguchi
IPC分类号： G03F7/42 , H01L21/32 , H01L21/306 , H01L21/321 , H01L21/02 , H01L21/3065 , H01L21/311 , C11D7/06 , C11D7/28 , C11D7/32 , C11D7/50 , C11D11/00 , H01L21/768 , B81C1/00 , C11D7/26 , C11D7/34
CPC分类号： G03F7/426 , B81C1/00849 , C11D7/06 , C11D7/261 , C11D7/28 , C11D7/3209 , C11D7/3281 , C11D7/34 , C11D7/5022 , C11D11/0047 , G03F7/425 , H01L21/02057 , H01L21/30604 , H01L21/30655 , H01L21/31133 , H01L21/3212 , H01L21/76898
摘要： A nonaqueous cleaning liquid comprising a fluoroalkanol, a quaternary ammonium hydroxide, and an organic solvent. Compounds represented by formulae (1) and (2). Fluoroalkanol compounds include (1) H(CF2)aCH2—OH and (2) F(CF2)b(CH2)c—OH In which a and b are each an integer of from 2 to 6, and c is an integer of 1 or 2.
摘要翻译： 包含氟烷醇，季铵氢氧化物和有机溶剂的非水性清洗液。 由式（1）和（2）表示的化合物。 氟烷醇化合物包括（1）H（CF 2）a CH 2 -OH和（2）F（CF 2）b（CH 2）c -OH其中a和b各自为2至6的整数，c为整数1 或2。
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