公开(公告)号：US20220293664A1

公开(公告)日：2022-09-15

申请号：US17752994

申请日：2022-05-25

Applicant: TOPPAN Inc.

Inventor： Yasutake AKENO ,  Reiko IWATA ,  Yuri NAGAI

IPC: H01L27/146

Abstract: A method of manufacturing a filter for a solid-state imaging element, including forming a color filter on a semiconductor substrate, forming an etching stopper layer on the semiconductor substrate and the color filter, forming an infrared cut precursor layer on the etching stopper layer, forming a resist pattern that covers a portion on the color filter in the infrared cut precursor layer, and forming an infrared cut filter by dry etching the infrared cut precursor layer using the resist pattern. The dry etching of the infrared cut precursor layer is conducted at an etching rate different from an etching rate of the etching stopper layer.

公开(公告)号：US20220213325A1

公开(公告)日：2022-07-07

申请号：US17697077

申请日：2022-03-17

Applicant: TOPPAN Inc.

Inventor： Reiko IWATA ,  Yuri HIRAI ,  Hanae TAGAMI ,  Takenori GODA ,  Hiroyuki CHINONE

IPC: C09B67/20 ,  C09B23/16 ,  C08K5/529 ,  C08F20/18 ,  G02B5/20 ,  G02B1/04

Abstract: An infrared cut-off filter including a cyanine dye including a tris(pentafluoroethyl) trifluorophosphate anion and a cation having a polymethine and a nitrogen-containing heterocycle located at each end of the polymethine, and an acrylic polymer having a unit structure of formula (1).

公开(公告)号：US20230151229A1

公开(公告)日：2023-05-18

申请号：US18092537

申请日：2023-01-03

Applicant: TOPPAN Inc.

Inventor： Reiko IWATA ,  Yuri NAGAI ,  Hanae TAGAMI ,  Shigeki FURUKAWA

IPC: C09D5/32 ,  C08F220/18 ,  C08K5/521 ,  C09D7/41 ,  C09D7/63 ,  C09D7/20 ,  C09D133/10 ,  G01J1/04

CPC classification number: C09D5/32 ,  C08F220/1806 ,  C08F220/1811 ,  C08K5/521 ,  C09D7/20 ,  C09D7/41 ,  C09D7/63 ,  C09D133/10 ,  G01J1/0488 ,  C08F2800/20

Abstract: An infrared cut filter including a film that includes a cyanine dye including a cation having a polymethine and a nitrogen-containing heterocycle at each end of the polymethine, and a tris(pentafluoroethyl)trifluorophosphate anion, and a copolymer including a first repeating unit from a first monomer that is an acrylic monomer having a cyclic ether group, and a second repeating unit from a second monomer that is a monomer having a functional group that reacts with the cyclic ether group.

公开(公告)号：US20220317352A1

公开(公告)日：2022-10-06

申请号：US17847723

申请日：2022-06-23

Applicant: TOPPAN Inc.

Inventor： Reiko IWATA ,  Yuri NAGAI ,  Yasutake AKENO

IPC: G02B5/20 ,  G02B1/04 ,  H04N5/225

Abstract: A method for producing an infrared light cut filter, including forming an infrared light cut layer comprising an infrared light absorbing dye, forming a protective layer on the infrared light cut layer which provides protection against a stripping solution, forming a resist pattern on the protective layer, patterning the protective layer and the infrared light cut layer by dry etching based on the resist pattern, and removing the resist pattern from the protective layer by applying the stripping solution.

公开(公告)号：US20230322987A1

公开(公告)日：2023-10-12

申请号：US18336635

申请日：2023-06-16

Applicant: TOPPAN Inc.

Inventor： Reiko IWATA ,  Yuri NAGAI ,  Akihiro YAMADA ,  Shuto HARA

IPC: C08F220/32 ,  C08F220/18 ,  C08F220/30 ,  C09B23/04 ,  C09B23/06 ,  G02B5/20 ,  G02B5/22

CPC classification number: C08F220/325 ,  C08F220/1806 ,  C08F220/301 ,  C09B23/04 ,  C09B23/06 ,  G02B5/208 ,  G02B5/223

Abstract: A colored resin component includes a colorant having maximum absorbance in a wavelength band of 700 nm or higher and 1100 nm or lower, a copolymer including a first repeating unit derived from an acrylic monomer having an epoxy group, a second repeating unit derived from a monomer having a phenolic hydroxyl group, and a third repeating unit derived from an acrylic monomer having an aromatic ring, or a third repeating unit derived from an acrylic monomer having an alicyclic structure, and a solvent compatible with the colorant and the copolymer.

公开(公告)号：US20220372181A1

公开(公告)日：2022-11-24

申请号：US17812768

申请日：2022-07-15

Applicant: TOPPAN Inc.

Inventor： Reiko IWATA ,  Yuri NAGAI ,  Hanae TAGAMI ,  Shigeki FURUKAWA

IPC: C08F20/18 ,  H01L27/146 ,  G02B5/20 ,  G02B1/04

Abstract: An infrared cut-off filter, including a cyanine dye and a copolymer. The cyanine dye includes tris(pentafluoroethyl) trifluorophosphate and a cation having a polymethine and a nitrogen-containing heterocycle at each end of the polymethine. The copolymer includes a first repeating unit from a first monomer and a second repeating unit from a second monomer different from the first monomer. The first monomer includes a phenolic hydroxyl group.