公开(公告)号：US20220351944A1

公开(公告)日：2022-11-03

申请号：US17701813

申请日：2022-03-23

Applicant: TOTO LTD.

Inventor： Ryunosuke NAKAGAWA ,  Nobutomo OTSUKA ,  Tatsuya KOGA

IPC: H01J37/32

Abstract: According to one embodiment, a semiconductor manufacturing apparatus member is used inside a chamber of a semiconductor manufacturing apparatus. The member includes a base material and a ceramic layer. The base material includes a first surface, a second surface at a side opposite to the first surface, and at least one hole extending through the first and second surfaces. The ceramic layer is a ceramic layer located on the base material. The at least one hole includes a first hole part continuous with the first surface. The ceramic layer includes a first part and a second part. The first part is located on the first surface. The first part is exposed. The second part is located on the first hole part. An arithmetical mean height Sa of a surface of the first part is less than an arithmetical mean height Sa of a surface of the second part.

公开(公告)号：US20240326088A1

公开(公告)日：2024-10-03

申请号：US18610530

申请日：2024-03-20

Applicant: TOTO LTD.

Inventor： Atsushi KINJO ,  Nobutomo OTSUKA ,  Fumito TODA

IPC: B05D1/02

CPC classification number: B05D1/02 ,  B05D2490/50

Abstract: A structural member 10 includes a base material 100 and a protective film 200 covering a surface 110 of the base material 100. When, in a cross-section of the protective film 200 cut perpendicularly to the surface 110, a proportion of pores per unit area is defined as porosity, the porosity in a first portion 201 that is a portion of the cross-section is lower than the porosity in a second portion 202 that is a portion of the cross-section closer to the base material 100 side thereof than the first portion 201.

公开(公告)号：US20250074837A1

公开(公告)日：2025-03-06

申请号：US18818222

申请日：2024-08-28

Applicant: TOTO LTD.

Inventor： Tatsuya KOGA ,  Nobutomo OTSUKA

IPC: C04B41/45 ,  C04B35/10 ,  C04B41/00 ,  C04B41/50 ,  C04B41/87

Abstract: A structural member 10 includes a base material 100 and a protective film 200 covering a surface 101 of the base material 100. The protective film 200 has been subjected to reduction processing of reducing an in-plane variation in residual stress on a surface 201 of the protective film 200.

公开(公告)号：US20250074836A1

公开(公告)日：2025-03-06

申请号：US18806228

申请日：2024-08-15

Applicant: TOTO LTD.

Inventor： Tatsuya KOGA ,  Nobutomo OTSUKA ,  Yasutaka NITTA

IPC: C04B41/45 ,  C04B41/52

Abstract: A structural member 10 includes a base material 100 which is a ceramic, an underlayer 200 covering a surface S1 of the base material 100, and a protective film 300 covering a surface S2 of the underlayer 200. An orientation of each crystallite 210 on a surface S2 of the underlayer 200 on the protective film 300 side is not aligned and is irregular.