ELECTROSTATIC CHUCK
    1.
    发明申请
    ELECTROSTATIC CHUCK 审中-公开

    公开(公告)号:US20190148206A1

    公开(公告)日:2019-05-16

    申请号:US16249397

    申请日:2019-01-16

    Applicant: TOTO LTD.

    Abstract: According to an aspect of the invention, an electrostatic chuck includes: a ceramic dielectric substrate having a first major surface, and a second major surface on a side opposite to the first major surface; a base plate supporting the ceramic dielectric substrate and being provided at a position separated from the ceramic dielectric substrate; and a heater plate provided between the ceramic dielectric substrate and the base plate, the heater plate including a first support plate including a metal, a heater element emitting heat due to a current flowing, and a first resin layer provided between the first support plate and the heater element, the heater element having a first surface and a second surface, the first surface opposing the first resin layer, the second surface facing a side opposite to the first surface, a width of the first surface being different from a width of the second surface.

    ELECTROSTATIC CHUCK
    2.
    发明申请
    ELECTROSTATIC CHUCK 审中-公开

    公开(公告)号:US20190148204A1

    公开(公告)日:2019-05-16

    申请号:US16243756

    申请日:2019-01-09

    Applicant: TOTO LTD.

    Abstract: According to an aspect of the invention, an electrostatic chuck comprises: a ceramic dielectric substrate; a base plate; and a heater plate. The heater plate includes a first and a second support plates including a metal, a heater element provided between the first and the second support plates, a first resin layer provided between the first support plate and the heater element, and a second resin layer provided between the second support plate and the heater element. A surface of the first support plate on the second support plate side includes a first region and a second region, the first region overlapping the heater element when viewed along the stacking direction, the second region not overlapping the heater element when viewed along the stacking direction. In a cross section parallel to the stacking direction, the second region protrudes toward the second support plate side compared to the first region.

    ELECTROSTATIC CHUCK
    3.
    发明申请
    ELECTROSTATIC CHUCK 审中-公开

    公开(公告)号:US20180286732A1

    公开(公告)日:2018-10-04

    申请号:US15937126

    申请日:2018-03-27

    Applicant: TOTO LTD.

    Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, an electrode layer, a base plate, and a heater plate. The ceramic dielectric substrate has a first major surface where a processing object is placed. The electrode layer is provided in the ceramic dielectric substrate. The base plate supports the ceramic dielectric substrate. The heater plate is provided between the base plate and the first major surface. The heater plate includes a first heater element and a second heater element. The first heater element emits heat due to a current flowing. The second heater element emits heat due to a current flowing. When viewed along a direction perpendicular to the first major surface, bends of the first heater element is more than bends of the second heater element, and the first heater element includes a portion positioned at a gap of the second heater element.

    ELECTROSTATIC CHUCK
    4.
    发明申请
    ELECTROSTATIC CHUCK 审中-公开

    公开(公告)号:US20170309510A1

    公开(公告)日:2017-10-26

    申请号:US15647369

    申请日:2017-07-12

    Applicant: TOTO LTD.

    Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater plate. The ceramic dielectric substrate has a surface where a processing object is placed. The base plate supports the ceramic dielectric substrate. The heater plate is provided between the ceramic dielectric substrate and the base plate. The heater plate includes a first support plate including a metal, a second support plate including a metal, a heater element, a first resin layer, and a second resin layer. The heater element is provided between the first support plate and the second support plate. The heater element emits heat due to a current flowing. The first resin layer is provided between the first support plate and the heater element. The second resin layer is provided between the second support plate and the heater element.

    ELECTROSTATIC CHUCK
    5.
    发明申请
    ELECTROSTATIC CHUCK 审中-公开

    公开(公告)号:US20190019715A1

    公开(公告)日:2019-01-17

    申请号:US16131245

    申请日:2018-09-14

    Applicant: TOTO LTD.

    Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater plate. The heater plate is provided between the ceramic dielectric substrate and the base plate. The heater plate includes first and second support plates, first and second resin layers, and a heater element. Each of the first and second resin layers is provided between the first support plate and the second support plate. The heater element includes first and second electrically conductive portions. The first electrically conductive portion is provided between the first resin layer and the second resin layer. The second electrically conductive portion is separated from the first electrically conductive portion in an in-plane direction. The first resin layer contacts the second resin layer between the first electrically conductive portion and the second electrically conductive portion.

    ELECTROSTATIC CHUCK AND WAFER PROCESSING APPARATUS

    公开(公告)号:US20180261486A1

    公开(公告)日:2018-09-13

    申请号:US15534798

    申请日:2015-12-10

    Applicant: TOTO LTD.

    Abstract: An electrostatic chuck includes a ceramic dielectric substrate having a first major surface on which an object to be processed is mounted, and a second major surface, the ceramic dielectric substrate being a polycrystalline ceramic sintered body, an electrode layer provided on the ceramic dielectric substrate, a base plate provided on a side of the second major surface and supporting the ceramic dielectric substrate, and a heater provided between the electrode layer and the base plate. The base plate includes a through hole piercing the base plate and a communication path passing a medium adjusting a temperature of the object to be processed, and when viewed in a direction perpendicular to the first major surface, at least a part of the heater exists on a side of the through hole as viewed from a first portion of the communication path which is closest to the through hole.

    ELECTROSTATIC CHUCK
    7.
    发明申请
    ELECTROSTATIC CHUCK 审中-公开

    公开(公告)号:US20190013231A1

    公开(公告)日:2019-01-10

    申请号:US16131818

    申请日:2018-09-14

    Applicant: TOTO LTD.

    Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate having a first major surface placing an object to be processed and a second major surface on an opposite side of the first major surface, and a base plate provided on a side of the second major surface and supporting the ceramic dielectric substrate. The base plate includes a first communicating passage passing a medium which adjusts a temperature of the object to be processed. The first communicating passage has an upper surface, a side surface, and a lower surface. A ratio of variation of a maximum height Sz in the upper surface to a height of the first communicating passage is not more than 1%.

    ELECTROSTATIC CHUCK AND WAFER PROCESSING APPARATUS

    公开(公告)号:US20180040499A1

    公开(公告)日:2018-02-08

    申请号:US15788132

    申请日:2017-10-19

    Applicant: TOTO LTD.

    Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate including a sealing ring provided at a peripheral edge portion of the ceramic dielectric substrate, and an electrode layer including a plurality of electrode components. An outer perimeter of the ceramic dielectric substrate is provided to cause a spacing between the outer perimeter of the ceramic dielectric substrate and an outer perimeter of the electrode layer to be uniform. The spacing between the outer perimeter of the electrode layer and the outer perimeter of the ceramic dielectric substrate is narrower than a spacing of the electrode components. A width of the sealing ring is not less than 0.3 millimeters and not more than 3 millimeters. A width where the electrode layer overlaps the sealing ring is not less than −0.7 millimeters and not more than 2 millimeters.

    ELECTROSTATIC CHUCK
    9.
    发明申请
    ELECTROSTATIC CHUCK 有权
    静电卡

    公开(公告)号:US20160276198A1

    公开(公告)日:2016-09-22

    申请号:US14777879

    申请日:2014-03-27

    Applicant: TOTO LTD.

    CPC classification number: H01L21/6833 H01L21/67109 H01L21/6831 Y10T279/23

    Abstract: According to an aspect of an embodiment of the invention, there is provided an electrostatic chuck including: a ceramic dielectric substrate including a first major surface for mounting a clamped target, a second major surface on opposite side from the first major surface, and a through hole provided from the second major surface to the first major surface; a metallic base plate supporting the ceramic dielectric substrate and including a gas feed channel communicating with the through hole; and an insulator plug including a ceramic porous body provided in the gas feed channel and a ceramic insulating film provided between the ceramic porous body and the gas feed channel and being denser than the ceramic porous body, the ceramic insulating film biting into the ceramic porous body from a surface of the ceramic porous body.

    Abstract translation: 根据本发明的实施例的一个方面,提供了一种静电卡盘,其包括:陶瓷电介质基板,包括用于安装夹持的目标的第一主表面,与第一主表面相对的第二主表面,以及通孔 孔,从第二主表面提供到第一主表面; 支撑陶瓷电介质基板的金属底板,并且包括与通孔连通的气体供给通道; 以及绝缘体塞,其包括设置在所述气体供给路径中的陶瓷多孔体和设置在所述陶瓷多孔体和所述气体供给路径之间并且比所述陶瓷多孔体更致密的陶瓷绝缘膜,所述陶瓷绝缘膜咬入所述陶瓷多孔体 从陶瓷多孔体的表面。

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