公开(公告)号：US20250006540A1

公开(公告)日：2025-01-02

申请号：US18753835

申请日：2024-06-25

Applicant: TOTO LTD.

Inventor： Tetsuro ITOYAMA ,  Jumpei UEFUJI ,  Tomoki UMETSU

IPC: H01L21/683 ,  C23C16/458

Abstract: An electrostatic chuck includes a dielectric substrate, a base plate which is a metallic member joined to the dielectric substrate and in which a gas hole is formed, and a vent plug arranged inside the gas hole. The vent plug has a porous section which is a section made of a porous ceramic with air permeability, and a dense section which is a section made of a dense ceramic without air permeability, and which surrounds a whole circumference of the porous section from an outer circumference side. The porous section and the dense section are formed together into one piece by sintering without sandwiching a joining material made of a material other than a ceramic.

公开(公告)号：US20230317495A1

公开(公告)日：2023-10-05

申请号：US18121627

申请日：2023-03-15

Applicant: TOTO LTD.

Inventor： Akihito ONO ,  Tetsuro ITOYAMA ,  Tomoki UMETSU ,  Jumpei UEFUJI

IPC: H01L21/683 ,  H01J37/32 ,  H05B3/26

CPC classification number: H01L21/6833 ,  H01J37/32715 ,  H05B3/265 ,  H01J2237/2007

Abstract: An electrostatic chuck includes a base plate, a first heater element, and a plurality of first power feeding terminals. The base plate includes a communicating path having a spiral shape. The first heater element includes a plurality of first zones. The plurality of first power feeding terminals feeds power to the plurality of first zones. Each of the plurality of first zones includes a first heater line and a pair of first power feeding portions feeding power to the first heater line. The pair of first power feeding portions is electrically connected to the plurality of first power feeding terminals. The plurality of first power feeding terminals includes a first and a second annular portion. The communicating path includes a first circumferential portion surrounding the second annular portion between the first annular portion and the second annular portion when viewed along a stacking direction.

公开(公告)号：US20230412096A1

公开(公告)日：2023-12-21

申请号：US18242122

申请日：2023-09-05

Applicant: TOTO LTD.

Inventor： Tetsuro ITOYAMA ,  Jumpei UEFUJI

IPC: H02N13/00

CPC classification number: H02N13/00 ,  B23Q3/15

Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, a heater part, and a bypass part. The ceramic dielectric substrate includes a substrate upper surface and a substrate lower surface. The heater part is disposed between the substrate upper surface and the substrate lower surface. The heater part includes at least one heater layer. The heater part includes a heater upper surface and a heater lower surface. The bypass part includes a first bypass portion disposed lower than the substrate lower surface. The first bypass portion including a first bypass upper surface and a first bypass lower surface. A second distance between the heater lower surface and the first bypass upper surface is greater than a first distance between the heater upper surface and the substrate upper surface.

公开(公告)号：US20220319898A1

公开(公告)日：2022-10-06

申请号：US17837115

申请日：2022-06-10

Applicant: TOTO LTD.

Inventor： Masafumi IKEGUCHI ,  Tetsuro ITOYAMA ,  Shuichiro SAIGAN ,  Jun SHIRAISHI

IPC: H01L21/683 ,  H01L21/67

Abstract: An electrostatic chuck includes a base plate and a ceramic dielectric substrate. The ceramic dielectric substrate has a first major surface. The first major surface includes at least a first region and a second region. At least one first gas introduction hole connected to at least one of multiple first grooves. The first grooves include a first boundary groove, and at least one first in-region groove. Multiple second grooves and at least one second gas introduction hole are provided in the second region. The second grooves are include a second boundary groove extending along the first boundary and are provided to be most proximal to the first boundary. A groove end portion-end portion distance between the first boundary groove and the second boundary groove is smaller than a groove end portion-end portion distance between the first boundary groove and the first in-region groove.

公开(公告)号：US20250105045A1

公开(公告)日：2025-03-27

申请号：US18883506

申请日：2024-09-12

Applicant: TOTO LTD.

Inventor： Tetsuro ITOYAMA ,  Jumpei UEFUJI ,  Tomoki UMETSU

IPC: H01L21/683 ,  H01J37/32

Abstract: An electrostatic chuck (10) includes a dielectric substrate (100) and a heater unit (300) configured to heat the dielectric substrate (100). The heater unit (300) includes a power supply portion (390) configured to receive a supply of power from an external source, a heat generation portion (331) that is a conductor drawn in a linear shape and configured to receive the supply of power from the power supply portion (390) and generate heat, and a bypass layer (370) connecting the power supply portion (390) and the heat generation portion (331). The heat generation portion (331) includes a widened portion (332) that is a section in which a line width of the heat generation portion (331) is locally widened. The bypass layer (370) is connected to the heat generation portion (331) at a plurality of locations in the widened portion (332).

公开(公告)号：US20250006539A1

公开(公告)日：2025-01-02

申请号：US18753761

申请日：2024-06-25

Applicant: TOTO LTD.

Inventor： Tetsuro ITOYAMA ,  Jumpei UEFUJI ,  Tomoki UMETSU

IPC: H01L21/683 ,  C23C16/458

Abstract: An electrostatic chuck includes a dielectric substrate, a base plate which is a metallic member joined to the dielectric substrate and in which a gas hole is formed, and a vent plug arranged inside the gas hole. The vent plug has a porous section which is a section made of a porous ceramic with air permeability, and a dense section which is a section made of a dense ceramic without air permeability, and which surrounds a whole circumference of the porous section from an outer circumference side. The porous section and the dense section are formed together into one piece by sintering without sandwiching a joining material made of a material other than a ceramic.

公开(公告)号：US20180286732A1

公开(公告)日：2018-10-04

申请号：US15937126

申请日：2018-03-27

Applicant: TOTO LTD.

Inventor： Jumpei UEFUJI ,  Hitoshi SASAKI ,  Kosuke YAMAGUCHI ,  Kengo MAEHATA ,  Yuichi YOSHII ,  Tetsuro ITOYAMA

IPC: H01L21/683 ,  H01L21/67 ,  H05B3/28

CPC classification number: H01L21/6833 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/68785 ,  H05B3/283

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, an electrode layer, a base plate, and a heater plate. The ceramic dielectric substrate has a first major surface where a processing object is placed. The electrode layer is provided in the ceramic dielectric substrate. The base plate supports the ceramic dielectric substrate. The heater plate is provided between the base plate and the first major surface. The heater plate includes a first heater element and a second heater element. The first heater element emits heat due to a current flowing. The second heater element emits heat due to a current flowing. When viewed along a direction perpendicular to the first major surface, bends of the first heater element is more than bends of the second heater element, and the first heater element includes a portion positioned at a gap of the second heater element.