公开(公告)号：US20190148206A1

公开(公告)日：2019-05-16

申请号：US16249397

申请日：2019-01-16

Applicant: TOTO LTD.

Inventor： Kosuke YAMAGUCHI ,  Hitoshi SASAKI ,  Kengo MAEHATA ,  Shumpei KONDO ,  Yuichi YOSHII

IPC: H01L21/683 ,  H01L21/67

Abstract: According to an aspect of the invention, an electrostatic chuck includes: a ceramic dielectric substrate having a first major surface, and a second major surface on a side opposite to the first major surface; a base plate supporting the ceramic dielectric substrate and being provided at a position separated from the ceramic dielectric substrate; and a heater plate provided between the ceramic dielectric substrate and the base plate, the heater plate including a first support plate including a metal, a heater element emitting heat due to a current flowing, and a first resin layer provided between the first support plate and the heater element, the heater element having a first surface and a second surface, the first surface opposing the first resin layer, the second surface facing a side opposite to the first surface, a width of the first surface being different from a width of the second surface.

公开(公告)号：US20190148204A1

公开(公告)日：2019-05-16

申请号：US16243756

申请日：2019-01-09

Applicant: TOTO LTD.

Inventor： Kosuke YAMAGUCHI ,  Hitoshi SASAKI ,  Kengo MAEHATA ,  Shumpei KONDO ,  Yuichi YOSHII

IPC: H01L21/683 ,  H01L21/67 ,  H05B1/02 ,  H05B3/03 ,  H05B3/26

Abstract: According to an aspect of the invention, an electrostatic chuck comprises: a ceramic dielectric substrate; a base plate; and a heater plate. The heater plate includes a first and a second support plates including a metal, a heater element provided between the first and the second support plates, a first resin layer provided between the first support plate and the heater element, and a second resin layer provided between the second support plate and the heater element. A surface of the first support plate on the second support plate side includes a first region and a second region, the first region overlapping the heater element when viewed along the stacking direction, the second region not overlapping the heater element when viewed along the stacking direction. In a cross section parallel to the stacking direction, the second region protrudes toward the second support plate side compared to the first region.

公开(公告)号：US20190287839A1

公开(公告)日：2019-09-19

申请号：US16352899

申请日：2019-03-14

Applicant: TOTO LTD.

Inventor： Kosuke YAMAGUCHI ,  Jun SHIRAISHI ,  Ikuo ITAKURA ,  Yutaka MOMIYAMA ,  Shuichiro SAIGAN

IPC: H01L21/683

Abstract: According to the embodiment, the electrostatic chuck includes a ceramic dielectric substrate having a first major surface and a second major surface on an opposite side to the first major surface, a base plate supporting the ceramic dielectric substrate and including a gas introduction path, and a first porous part provided at a position between the base plate and the first major surface and being opposite to the gas introduction path. The ceramic dielectric substrate includes a first hole part positioned between the first major surface and the first porous part. At least one of the ceramic dielectric substrate or the first porous part includes a second hole part positioned between the first hole part and the first porous part, and a dimension of the second hole part is smaller than a dimension of the first porous part and larger than a dimension of the first hole part.

公开(公告)号：US20180286732A1

公开(公告)日：2018-10-04

申请号：US15937126

申请日：2018-03-27

Applicant: TOTO LTD.

Inventor： Jumpei UEFUJI ,  Hitoshi SASAKI ,  Kosuke YAMAGUCHI ,  Kengo MAEHATA ,  Yuichi YOSHII ,  Tetsuro ITOYAMA

IPC: H01L21/683 ,  H01L21/67 ,  H05B3/28

CPC classification number: H01L21/6833 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/68785 ,  H05B3/283

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, an electrode layer, a base plate, and a heater plate. The ceramic dielectric substrate has a first major surface where a processing object is placed. The electrode layer is provided in the ceramic dielectric substrate. The base plate supports the ceramic dielectric substrate. The heater plate is provided between the base plate and the first major surface. The heater plate includes a first heater element and a second heater element. The first heater element emits heat due to a current flowing. The second heater element emits heat due to a current flowing. When viewed along a direction perpendicular to the first major surface, bends of the first heater element is more than bends of the second heater element, and the first heater element includes a portion positioned at a gap of the second heater element.

公开(公告)号：US20170309510A1

公开(公告)日：2017-10-26

申请号：US15647369

申请日：2017-07-12

Applicant: TOTO LTD.

Inventor： Kengo MAEHATA ,  Shumpei KONDO ,  Hitoshi SASAKI ,  Kosuke YAMAGUCHI ,  Yuichi YOSHII

IPC: H01L21/683 ,  B23Q3/15 ,  H02N13/00

CPC classification number: H01L21/6833 ,  B23Q3/15 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67248 ,  H01L21/6831 ,  H01L21/68757 ,  H01L21/68785 ,  H02N13/00

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater plate. The ceramic dielectric substrate has a surface where a processing object is placed. The base plate supports the ceramic dielectric substrate. The heater plate is provided between the ceramic dielectric substrate and the base plate. The heater plate includes a first support plate including a metal, a second support plate including a metal, a heater element, a first resin layer, and a second resin layer. The heater element is provided between the first support plate and the second support plate. The heater element emits heat due to a current flowing. The first resin layer is provided between the first support plate and the heater element. The second resin layer is provided between the second support plate and the heater element.

公开(公告)号：US20190287840A1

公开(公告)日：2019-09-19

申请号：US16352904

申请日：2019-03-14

Applicant: TOTO LTD.

Inventor： Takara KATAYAMA ,  Kosuke YAMAGUCHI ,  Ikuo ITAKURA ,  Yutaka MOMIYAMA ,  Jun SHIRAISHI ,  Shuichiro SAIGAN

IPC: H01L21/683

Abstract: According to the embodiment, an electrostatic chuck includes a ceramic dielectric substrate having a first major surface placing a suction object, a second major surface on an opposite side to the first major surface, a base plate supporting the ceramic dielectric substrate and including a gas introduction path, and a first porous part provided at a position between the base plate and the first major surface of the ceramic dielectric substrate and being opposite to the gas introduction path. The first porous part includes a first region positioned on the ceramic dielectric substrate side. The ceramic dielectric substrate includes a first substrate region positioned on the first region side. The first region and the first substrate region are provided in contact with each other, and an average particle diameter in the first region is different from an average particle diameter in the first substrate region.

公开(公告)号：US20190019715A1

公开(公告)日：2019-01-17

申请号：US16131245

申请日：2018-09-14

Applicant: TOTO LTD.

Inventor： Jumpei UEFUJI ,  Hitoshi SASAKI ,  Kosuke YAMAGUCHI ,  Kengo MAEHATA ,  Yuichi YOSHII

IPC: H01L21/683 ,  B32B18/00

Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater plate. The heater plate is provided between the ceramic dielectric substrate and the base plate. The heater plate includes first and second support plates, first and second resin layers, and a heater element. Each of the first and second resin layers is provided between the first support plate and the second support plate. The heater element includes first and second electrically conductive portions. The first electrically conductive portion is provided between the first resin layer and the second resin layer. The second electrically conductive portion is separated from the first electrically conductive portion in an in-plane direction. The first resin layer contacts the second resin layer between the first electrically conductive portion and the second electrically conductive portion.

公开(公告)号：US20150279714A1

公开(公告)日：2015-10-01

申请号：US14663526

申请日：2015-03-20

Applicant: TOTO LTD.

Inventor： Kosuke YAMAGUCHI ,  Kazuki ANADA ,  Tatsuya KOGA ,  Hiroki MATSUI

IPC: H01L21/683 ,  H02N13/00

CPC classification number: H01L21/6833 ,  H01L21/6831 ,  H01L21/68757 ,  H01L2221/683 ,  H02N13/00 ,  Y10T279/23 ,  Y10T279/33

Abstract: According to an aspect of the invention, there is provided an electrostatic chuck including: a ceramic dielectric substrate having a first major surface, a second major surface, and a through-hole; a metallic base plate which has a gas introduction path that communicates with the through-hole; and a bonding layer which is provided between the ceramic dielectric substrate and the base plate and includes a resin material, the bonding layer having a space which is provided between an opening of the through-hole in the second major surface and the gas introduction path and is larger than the opening in a horizontal direction, and a first area in which an end face of the bonding layer on a side of the space intersects with the second major surface being recessed from the opening further than another second area of the end face which is different from the first area.

Abstract translation: 根据本发明的一个方面，提供了一种静电卡盘，其包括：具有第一主表面，第二主表面和通孔的陶瓷电介质基板; 金属基板，其具有与通孔连通的气体导入路径; 以及接合层，其设置在所述陶瓷电介质基板和所述基板之间并且包括树脂材料，所述接合层具有设置在所述第二主表面中的通孔的开口和所述气体引入路径之间的空间， 大于所述开口部的水平方向，并且所述接合层的与所述第二主面相交的端面的端面比所述端面的另一第二区域从所述开口凹进的第一区域， 与第一个区域不同。

公开(公告)号：US20190287838A1

公开(公告)日：2019-09-19

申请号：US16352565

申请日：2019-03-13

Applicant: TOTO LTD.

Inventor： Kosuke YAMAGUCHI ,  Jun SHIRAISHI ,  Ikuo ITAKURA ,  Yutaka MOMIYAMA ,  Shuichiro SAIGAN

IPC: H01L21/683 ,  H01L21/67

Abstract: According to the embodiment, the first invention relates to an electrostatic chuck. The electrostatic chuck includes a ceramic dielectric substrate having a first major surface placing a suction object and a second major surface on an opposite side to the first major surface, a base plate supporting the ceramic dielectric substrate and including a gas introduction path, and a first porous part provided at a position between the base plate and the first major surface and being opposite to the gas introduction path. The first porous part includes sparse portions including pores and a dense portion having a density higher than a density of the sparse portions. Each of the sparse portions extends from the base plate toward the ceramic dielectric substrate. The dense portion is positioned between the sparse portions. The sparse portions include a wall portion provided between the pores and the pores.

公开(公告)号：US20190013231A1

公开(公告)日：2019-01-10

申请号：US16131818

申请日：2018-09-14

Applicant: TOTO LTD.

Inventor： Kosuke YAMAGUCHI ,  Yuichi YOSHII ,  Hitoshi SASAKI ,  Kengo MAEHATA

IPC: H01L21/683 ,  B23Q3/15 ,  H01L21/67

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate having a first major surface placing an object to be processed and a second major surface on an opposite side of the first major surface, and a base plate provided on a side of the second major surface and supporting the ceramic dielectric substrate. The base plate includes a first communicating passage passing a medium which adjusts a temperature of the object to be processed. The first communicating passage has an upper surface, a side surface, and a lower surface. A ratio of variation of a maximum height Sz in the upper surface to a height of the first communicating passage is not more than 1%.