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公开(公告)号：US5532822A
公开(公告)日：1996-07-02
申请号：US406171
申请日：1995-03-17
CPC分类号： G03F7/70716
摘要： A method of measuring the orthogonality of a movement coordinate system of a stage unit having a stage which two-dimensionally moves along the movement coordinate system determined by first and second axes that cross each other, by mounting a measurement substrate having at least three measurement patterns on the stage, the at least three measurement patterns including at least two first patterns arranged on a line parallel to a third axis on an array coordinate system determined by the third and fourth axes crossing each other, and at least two second patterns arranged on a line parallel to the fourth axis; aligning the third axis with respect to the first axis of the movement coordinate system; obtaining a difference in an angle between the fourth axis of the array coordinate system and the second axis of the movement coordinate system as a first deviation by detecting the positions of the second patterns on the movement coordinate system in an aligned state; rotating the measurement substrate by 90 degrees from the aligned state and mounting the measurement substrate on the stage; aligning the fourth axis with respect to the first axis of the movement coordinate system; obtaining a difference in an angle between the third axis of the array coordinate system and the second axis of the movement coordinate system as a second deviation by detecting the positions of the first patterns on the movement coordinate system in the aligned state; and obtaining the orthogonality of the movement coordinate system on the basis of the first and second deviations.
摘要翻译： 一种测量具有通过安装具有至少三个测量图案的测量基板沿着彼此交叉的第一和第二轴确定的运动坐标系二维运动的台架的台架单元的运动坐标系的正交性的方法 在舞台上，至少三个测量图案包括布置在由彼此交叉的第三和第四轴确定的阵列坐标系上平行于第三轴线的线上的至少两个第一图案，以及布置在 平行于第四轴线; 相对于移动坐标系的第一轴对准第三轴; 通过在对准状态下检测移动坐标系上的第二图案的位置，获得阵列坐标系的第四轴与移动坐标系的第二轴之间的角度作为第一偏差; 将测量基板从对准状态旋转90度并将测量基板安装在平台上; 使第四轴相对于运动坐标系的第一轴对准; 通过在对准状态下检测移动坐标系上的第一图案的位置，获得阵列坐标系的第三轴与移动坐标系的第二轴之间的角度的差作为第二偏差; 并基于第一和第二偏差获得运动坐标系的正交性。
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公开(公告)号：US06288772B1
公开(公告)日：2001-09-11
申请号：US09500489
申请日：2000-02-09
IPC分类号： G03B2742
CPC分类号： G03F7/70066 , G03F7/70191 , G03F7/70275 , G03F7/70358 , G03F7/70433 , G03F7/70475 , G03F9/7076
摘要： In the scanning exposure method of the present invention, a mask and a substrate are moved in a synchronous manner, and first patterns and a second pattern are connectedly exposed on the substrate. At least a portion of the first patterns and at least a portion of the second pattern form a common pattern, and the common pattern and non-common patterns, which differ from the common pattern, are formed in mask as the first patterns and the second pattern. The first patterns and the second pattern are connected by means of the common pattern.
摘要翻译： 在本发明的扫描曝光方法中，掩模和基板以同步方式移动，并且第一图案和第二图案被连接地暴露在基板上。 第一图案的至少一部分和第二图案的至少一部分形成公共图案，并且与公共图案不同的公共图案和非共同图案在掩模中形成为第一图案，第二图案 模式。 第一图案和第二图案通过公共图案连接。
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3.发明授权Position measurement method for measuring a position of an exposure mask and exposure method for transferring an image of the pattern formed in an exposure mask 失效用于测量曝光掩模的位置的位置测量方法和用于传送在曝光掩模中形成的图案的图像的曝光方法
公开(公告)号：US5995199A
公开(公告)日：1999-11-30
申请号：US877998
申请日：1997-06-18
CPC分类号： G03F7/70241 , G03F7/70858 , G03F7/70883 , G03F9/70
摘要： Positions of a plurality of marks formed in a correction mask are measured as first positions. A plurality of marks in the correction mask are transferred onto a photosensitive substrate, and transferred positions of the plurality of marks are determined as second positions. Subsequently, amounts of deviation of the first positions from the second positions are determined as correction data. After that, positions of a plurality of marks formed in an exposure mask are measured as third positions by a method similar to that used for measurement of the first positions, and the third positions are corrected on the basis of the correction data.
摘要翻译： 在校正掩模中形成的多个标记的位置被测量为第一位置。 将校正掩模中的多个标记转印到感光基板上，并将多个标记的转印位置确定为第二位置。 随后，将第一位置与第二位置的偏差量确定为校正数据。 之后，通过与用于测量第一位置的方法类似的方法将形成在曝光掩模中的多个标记的位置测量为第三位置，并且基于校正数据来校正第三位置。
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