公开(公告)号：US06964279B2

公开(公告)日：2005-11-15

申请号：US10469151

申请日：2002-11-22

申请人： Tadahiro Ohmi ,  Tomio Uno ,  Osamu Nakamura ,  Nobukazu Ikeda ,  Ryousuke Dohi ,  Kouji Nishino ,  Atsushi Matsumoto ,  Kazuhiko Sugiyama ,  Shujiro Inui ,  Taiji Sakai ,  Masanori Ueyama

发明人： Tadahiro Ohmi ,  Tomio Uno ,  Osamu Nakamura ,  Nobukazu Ikeda ,  Ryousuke Dohi ,  Kouji Nishino ,  Atsushi Matsumoto ,  Kazuhiko Sugiyama ,  Shujiro Inui ,  Taiji Sakai ,  Masanori Ueyama

IPC分类号： G01F1/00 ,  G01F1/36 ,  G01F1/42 ,  G05D7/06

CPC分类号： G05D7/0635 ,  Y10T137/7759 ,  Y10T137/7761

摘要： A pressure-type flow rate control apparatus controls the flow rate of fluid passing through an orifice to a target flow rate. The flow rate of a compressible fluid under non-critical conditions (sub-sonic) passing through the orifice is calculated by: Qc=KP2m(P1−P2)n so that the flow rate can be controlled to the target flow rate with high precision and speed. Also provided is an improved pressure-type flow rate control apparatus in which a pressure ratio P2/P1=r, obtained from an upstream pressure P1 and a downstream pressure P2 is constantly compared with a critical value r, and under critical conditions (r≦rc), the flow rate is calculated by: Qc=KP1. Under non-critical conditions (r>rc), the flow rate is calculated by Qc=KP2m(P1−P2)n.

摘要翻译： 压力式流量控制装置将通过孔口的流体的流量控制为目标流量。 通过孔口的非临界条件（亚音）的可压缩流体的流量通过以下公式计算：<？in-line-formula description =“In-line Formulas”end =“lead”？> Qc = KP （P 1→P 2） -formulae description =“在线公式”end =“tail”？>，可以以高精度和高速度将流量控制在目标流量上。 还提供了一种改进的压力型流量控制装置，其中从上游压力P 1获得的压力比P 2 / P 1 / / SUB>和下游压力P 2 2不断与临界值r进行比较，在临界条件（r≤Rc c）下，流量由下式计算： ：<？in-line-formula description =“In-line Formulas”end =“lead”？> Qc = KP <1> <？in-line-formula description =“In-line Formulas” end =“tail”？>在非关键条件下（r> r> c ），流量通过Qc = KP 2 / （P 1→P 2）。

公开(公告)号：US07367241B2

公开(公告)日：2008-05-06

申请号：US10563226

申请日：2004-06-18

申请人： Tadahiro Ohmi ,  Kazuhiko Sugiyama ,  Tomio Uno ,  Nobukazu Ikeda ,  Kouji Nishino ,  Osamu Nakamura ,  Ryousuke Dohi ,  Atsushi Matsumoto

发明人： Tadahiro Ohmi ,  Kazuhiko Sugiyama ,  Tomio Uno ,  Nobukazu Ikeda ,  Kouji Nishino ,  Osamu Nakamura ,  Ryousuke Dohi ,  Atsushi Matsumoto

IPC分类号： G01F1/37

CPC分类号： G01F1/50 ,  G01F1/42 ,  G05D7/0635

摘要： A differential pressure type flowmeter comprises an orifice, a detector to detect a fluid pressure P1 on the upstream side of an orifice, a detector to detect a fluid pressure P2 on the downstream side of an orifice, a detector to detect a fluid temperature T on the upstream side of an orifice, and a control computation circuit to compute a fluid's flow rate Q passing through an orifice by using the pressure P1, where P2 and temperature T detected with the aforementioned detectors, and the aforementioned fluid's flow rate Q is computed with the equation Q=C1•P1/√T•((P2/P1)m−(P2/P1)m)1/2 (where C1 is a proportional constant, and m and n are constants).

摘要翻译： 差压式流量计包括孔口，用于检测孔口上游侧的流体压力P 1> 1的检测器，用于检测流体压力P 2> 2的检测器 孔的下游侧，用于检测孔口上游侧的流体温度T的检测器，以及控制计算电路，用于通过使用压力P 1计算通过孔口的流体的流量Q， SUB>，其中P＆lt; 2＆gt;和用上述检测器检测的温度T，并且上述流体的流量Q用公式<？in-line-formula description =“In-line Formulas”end =“铅”→Q = C 1 P 1 <？in-line-formula description =“In-line Formulas”end =“tail”？>（其中C <1> 是比例常数，m和n是常数）。

公开(公告)号：US07085628B2

公开(公告)日：2006-08-01

申请号：US10476973

申请日：2002-11-22

申请人： Tadahiro Ohmi ,  Tomio Uno ,  Osamu Nakamura ,  Nobukazu Ikeda ,  Ryousuke Dohi ,  Kouji Nishino ,  Atsushi Matsumoto ,  Kazuhiko Sugiyama

发明人： Tadahiro Ohmi ,  Tomio Uno ,  Osamu Nakamura ,  Nobukazu Ikeda ,  Ryousuke Dohi ,  Kouji Nishino ,  Atsushi Matsumoto ,  Kazuhiko Sugiyama

IPC分类号： G06D23/00

CPC分类号： G05D7/0635 ,  G01D3/022 ,  G01F1/50 ,  G01F15/046 ,  G01L9/025

摘要： A pressure sensor, a pressure control apparatus, and a flow rate control apparatus are provided to automatically correct temperature drift of the pressure sensor and accurately detect pressure despite changes in temperature. An embodiment includes an upstream side pressure sensor between an orifice and a control valve, to control flow rate through the orifice by a regulating control valve, while calculating the flow from the upstream side pressure. With a temperature sensor, a memory means, and a temperature drift correcting means which calculates drift of the upstream side pressure sensor from data in the memory means when the temperature of the fluid changes and offsets the output drift of the upstream side pressure sensor with the calculated amount of the output drift, temperature drift of the pressure sensor is automatically corrected, enabling accurate control of flow rate.

摘要翻译： 提供压力传感器，压力控制装置和流量控制装置来自动校正压力传感器的温度漂移并且尽管温度变化来精确地检测压力。 一个实施例包括在孔口和控制阀之间的上游侧压力传感器，用于通过调节控制阀控制通过孔口的流量，同时计算从上游侧压力的流量。 利用温度传感器，存储装置和温度漂移校正装置，当流体的温度变化时，上游侧压力传感器的输出漂移与 输出漂移的计算量，压力传感器的温度漂移自动校正，可以精确控制流量。

公开(公告)号：US20060236781A1

公开(公告)日：2006-10-26

申请号：US10563226

申请日：2004-06-18

申请人： Tadahiro Ohmi ,  Kazuhiko Sugiyama ,  Tomio Uno ,  Nobukazu Ikeda ,  Kouji Nishino ,  Osamu Nakamura ,  Ryousuke Dohi ,  Atsushi Matsumoto

发明人： Tadahiro Ohmi ,  Kazuhiko Sugiyama ,  Tomio Uno ,  Nobukazu Ikeda ,  Kouji Nishino ,  Osamu Nakamura ,  Ryousuke Dohi ,  Atsushi Matsumoto

IPC分类号： G01F1/37

CPC分类号： G01F1/50 ,  G01F1/42 ,  G05D7/0635

摘要： A cost reduction can be achieved by making a differential pressure type flowmeter simple in structure, and highly accurate flow rate measurements can be attained over the wide flow rate range of 100% to 1% with errors E of less than 1 (% SP) both in real time and in a state of inline. To achieve the ends, a differential pressure type flowmeter comprises an orifice, a detector to detect a fluid pressure P1 on the upstream side of an orifice, a detector to detect a fluid pressure P2 on the downstream side of an orifice, a detector to detect a fluid temperature T on the upstream side of an orifice, and a control computation circuit to compute a fluid's flow rate Q passing through an orifice by using the pressure P1, pressure P2 and temperature T detected with the aforementioned detectors, and the aforementioned fluid's flow rate Q is computed with the equation Q=C1·P1/√{square root over ( )}T·((P2/P1)m−(P2/P1)n)1/2 (where C1 is a proportional constant, and m and n are constants).

摘要翻译： 通过使差压式流量计结构简单，可以实现成本降低，并且在100％至1％的宽流量范围内可以获得高精度的流量测量，误差E小于1（％SP），均为 在实时和处于内联状态。 为了实现这一目的，差压式流量计包括孔口，用于检测孔口上游侧的流体压力P 1> 1的检测器，检测流体压力P 2 在孔的下游侧具有用于检测孔口上游侧的流体温度T的检测器，以及控制计算电路，其通过使用压力P <0而计算通过孔口的流体流量Q， 使用上述检测器检测到的SUB> 1 <！ - SIPO - >压力P <2>和温度T，并且上述流体的流量Q用等式Q = （P（（P 2/2 / P 1）） （P 2 / P 1/2）其中C 1 ）其中C 1 是比例常数，m和n是常数）。

公开(公告)号：US07798167B2

公开(公告)日：2010-09-21

申请号：US11278909

申请日：2006-04-06

申请人： Tadahiro Ohmi ,  Akniobu Teramoto ,  Tomio Uno ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Atsushi Matsumoto ,  Masaaki Nagase ,  Nobukazu Ikeda

发明人： Tadahiro Ohmi ,  Akniobu Teramoto ,  Tomio Uno ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Atsushi Matsumoto ,  Masaaki Nagase ,  Nobukazu Ikeda

IPC分类号： G05D7/06

CPC分类号： G05D16/208 ,  Y10T137/7761 ,  Y10T137/8741 ,  Y10T137/87507

摘要： A gas supply facility includes a plurality of pressure type flow controllers connected in parallel, and a first controller to control operation of the plurality of pressure type flow controllers so as to supply a desired gas exhausted by a vacuum pump to a chamber while controlling its flow rate, one of the pressure type flow controllers operates as a second controller to control the gas flow rate range up to 10% of the maximum flow rate supplied to the chamber, while the remaining pressure type flow controllers are made to be ones that control the rest of the gas flow rate range. Furthermore, pressure inside the chamber is controlled by installing a pressure detector in the chamber, inputting the value detected by the detector to the controller, and by adjusting a control signal to the pressure type flow controllers.

摘要翻译： 气体供给设备包括并联连接的多个压力式流量控制器和控制多个压力式流量控制器的操作的第一控制器，以便在控制其流动的同时将由真空泵排出的期望气体供应到腔室 压力型流量控制器中的一个作为第二控制器操作，以将气体流量范围控制在高达供应给腔室的最大流速的10％，而剩余的压力式流量控制器被制成控制 剩余的气体流量范围。 此外，通过在室内安装压力检测器，将检测器检测到的值输入到控制器，并通过调节压力型流量控制器的控制信号来控制室内的压力。

公开(公告)号：US20050257603A1

公开(公告)日：2005-11-24

申请号：US11015097

申请日：2004-12-16

申请人： Tadahiro Ohmi ,  Masaaki Nagase ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Tomio Uno ,  Nobukazu Ikeda

发明人： Tadahiro Ohmi ,  Masaaki Nagase ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Tomio Uno ,  Nobukazu Ikeda

IPC分类号： G01B13/10

CPC分类号： G01B13/10 ,  Y10T29/49432

摘要： A small hole diameter measuring apparatus including: a flow rate measurement section comprised of an automatic pressure control device which supplies a fluid to the inlet side of small holes in a plate while maintaining the outlet- and inlet-side pressures of the small holes in the critical state of the fluid and controlling the inlet-side pressure to a predetermined inlet-side pressure; a plate holding section comprised of a plate supporting device which rotatably holds the plate, and a test probe supporting device which supports a test probe so that the test probe is moved vertically and horizontally; and a control section comprised of a calculation and judgment part, which calculates the hole diameter during the supply of the fluid based upon the measured value of the flow rate from the flow rate measurement section, and an external output part, which outputs the calculated value to the outside.

摘要翻译： 一种小孔直径测量装置，包括：流量测量部分，包括自动压力控制装置，该自动压力控制装置将流体供应到板中的小孔的入口侧，同时保持小孔的出口和入口侧压力 流体的临界状态并将入口侧压力控制到预定的入口侧压力; 由可转动地保持该板的板支撑装置构成的板保持部和支撑测试探针的测试探针支撑装置，使得测试探针垂直和水平地移动; 以及控制部，包括计算判断部，其基于来自流量测量部的流量的测定值，计算流体供给时的孔径，以及输出计算值的外部输出部 到外面

公开(公告)号：US07219533B2

公开(公告)日：2007-05-22

申请号：US11015097

申请日：2004-12-16

申请人： Tadahiro Ohmi ,  Masaaki Nagase ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Tomio Uno ,  Nobukazu Ikeda

发明人： Tadahiro Ohmi ,  Masaaki Nagase ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Tomio Uno ,  Nobukazu Ikeda

IPC分类号： G01M3/02

CPC分类号： G01B13/10 ,  Y10T29/49432

摘要： A small hole diameter measuring apparatus including: a flow rate measurement section comprised of an automatic pressure control device which supplies a fluid to the inlet side of small holes in a plate while maintaining the outlet- and inlet-side pressures of the small holes in the critical state of the fluid and controlling the inlet-side pressure to a predetermined inlet-side pressure; a plate holding section comprised of a plate supporting device which rotatably holds the plate, and a test probe supporting device which supports a test probe so that the test probe is moved vertically and horizontally; and a control section comprised of a calculation and judgment part, which calculates the hole diameter during the supply of the fluid based upon the measured value of the flow rate from the flow rate measurement section, and an external output part, which outputs the calculated value to the outside.

摘要翻译： 一种小孔直径测量装置，包括：流量测量部分，包括自动压力控制装置，该自动压力控制装置将流体供应到板中的小孔的入口侧，同时保持小孔的出口和入口侧压力 流体的临界状态并将入口侧压力控制到预定的入口侧压力; 由可转动地保持该板的板支撑装置构成的板保持部和支撑测试探针的测试探针支撑装置，使得测试探针垂直和水平地移动; 以及控制部，包括计算判断部，其基于来自流量测量部的流量的测定值，计算流体供给时的孔径，以及输出计算值的外部输出部 到外面

公开(公告)号：US20070193628A1

公开(公告)日：2007-08-23

申请号：US10566495

申请日：2004-07-28

申请人： Hiroshi Kannan ,  Tomio Uno ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Atsushi Matsumoto ,  Nobukazu Ikeda

发明人： Hiroshi Kannan ,  Tomio Uno ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Atsushi Matsumoto ,  Nobukazu Ikeda

IPC分类号： G05D7/06

CPC分类号： G05D7/0652 ,  Y10T137/7761 ,  Y10T137/8741 ,  Y10T137/87507

摘要： The present invention makes it possible to prevent substantial reduction of flow rate control accuracy in a small flow quantity range, to achieve an accurate flow rate control over the entire range of a flow rate control, and also to allow control of a wide pressure range of a chamber with an accurate flow rate control. Namely, with a gas supply facility having a plurality of pressure type flow controllers connected in parallel and a controller to control operation of pressure type flow controllers to supply a desired gas exhausted by a vacuum pump to a chamber while controlling its flow rate, one pressure type flow controller is made to be a controller to control a gas flow rate range up to 10% of the maximum flow rate to be supplied to a chamber, while the remaining pressure type flow controllers are made to be ones to control the rest of the gas flow rate range.

摘要翻译： 本发明使得可以防止在小流量范围内的流量控制精度的显着降低，从而在流量控制的整个范围内实现精确的流量控制，并且还可以控制宽的压力范围 具有精确流量控制的室。 也就是说，具有并联连接的多个压力式流量控制器的气体供给装置和控制器，用于控制压力式流量控制器的操作，以在控制其流量的同时将由真空泵排出的所需气体供应到腔室，一个压力 型流量控制器被制成控制器，以控制最高流量的10％的气体流量范围供给到室，而剩余的压力式流量控制器被制成控制其余的 气体流量范围。

公开(公告)号：US07594517B2

公开(公告)日：2009-09-29

申请号：US10566495

申请日：2004-07-28

申请人： Hiroshi Kannan ,  Tomio Uno ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Atsushi Matsumoto ,  Nobukazu Ikeda

发明人： Hiroshi Kannan ,  Tomio Uno ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Atsushi Matsumoto ,  Nobukazu Ikeda

IPC分类号： G05D7/06

CPC分类号： G05D7/0652 ,  Y10T137/7761 ,  Y10T137/8741 ,  Y10T137/87507

摘要： The present invention prevents substantial reduction of flow rate control accuracy in a small flow quantity range, achieves accurate flow rate control over the entire range of flow rate control, and also allows control of a wide pressure range of a chamber with accurate flow rate control. Specifically, a gas supply facility having a plurality of pressure type flow controllers connected in parallel, and a third controller to control operation of the pressure type flow controllers to supply a desired gas exhausted by a vacuum pump to a chamber while controlling its flow rate, is provided wherein one pressure type flow controller is a controller used to control a gas flow rate range up to 10% of the maximum flow rate supplied to the chamber, while the remaining pressure type flow controllers are made to be ones controlling the rest of the gas flow rate range.

摘要翻译： 本发明防止了在小流量范围内的流量控制精度的显着降低，在整个流量控制范围内实现精确的流量控制，并且还允许以精确的流量控制来控制腔室的宽压力范围。 具体而言，具有并联连接的多个压力式流量控制器的气体供给装置和控制压力式流量控制器的动作的第三控制装置，在控制其流量的同时将由真空泵排出的期望气体供给到室， 其中一个压力式流量控制器是用于控制高达提供给腔室的最大流量的10％的气体流量范围的控制器，而剩余的压力型流量控制器被制成控制其余的 气体流量范围。

公开(公告)号：US20070231225A1

公开(公告)日：2007-10-04

申请号：US11760330

申请日：2007-06-08

申请人： Tadahiro Ohmi ,  Nobukazu Ikeda ,  Yukio Minami ,  Kouji Kawada ,  Katunori Komehana ,  Teruo Honiden ,  Touru Hirai ,  Akihiro Morimoto ,  Toshirou Nariai ,  Keiji Hirao ,  Masaharu Taguchi ,  Osamu Nakamura

发明人： Tadahiro Ohmi ,  Nobukazu Ikeda ,  Yukio Minami ,  Kouji Kawada ,  Katunori Komehana ,  Teruo Honiden ,  Touru Hirai ,  Akihiro Morimoto ,  Toshirou Nariai ,  Keiji Hirao ,  Masaharu Taguchi ,  Osamu Nakamura

IPC分类号： B01J23/40

CPC分类号： B01J3/006 ,  B01J7/00 ,  B01J12/007 ,  C01B5/00

摘要： A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.

摘要翻译： 一种用于从氢气和氧气产生水蒸汽并将高纯度水分提供给诸如半导体生产的过程的安全的减压装置。 该设备通过保持催化反应器的内部压力以消除气体点燃的可能性，以产生高水平的水分，同时在减压下从反应器中提供湿气。 散热反应器的改进通过有效冷却反应器耐氧化铝处理的翅片而大大地增加了水分产生而不会扩大尺寸。