摘要:
A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.
摘要翻译:适用于主要由铝组成的金属保护金属氧化物膜。 金属氧化物膜包括厚度为10nm以上的主要由铝构成的金属的氧化物的膜,并且具有1E18mol / cm 2以下的膜的水分释放率。 此外,提供了一种制造金属氧化物膜的方法,其中主要由铝组成的金属在pH值为4至10的化学溶液中进行阳极氧化,以获得金属氧化物膜。
摘要:
A protective film structure of a metal member for use in an apparatus for manufacturing a semiconductor or the like, the protective film structure including a first coating layer of faultless aluminum oxide formed by direct anodic oxidation of a base-material metal of an aluminum alloy; and a second coating layer formed on the first coating layer and made of yttrium oxide by a plasma spraying method.
摘要:
Multifunction production equipment enabling a plurality of processes in which deposition of reaction products on the inner wall of the processing chamber of equipment for producing a semiconductor or a flat-plate display, metal contamination due to corrosion of the inner wall, or the like, and fluctuation of the process due to discharged gas are suppressed, and a protective film structure for use therein. On the surface of a metal material, a first coating layer having an oxide coating of 1μ thick or less formed as an underlying layer by direct oxidation of a parent material, and a second coating layer of about 200 μm thick are formed. With such an arrangement, corrosion resistance against irradiation with ions or radicals can be imparted to a second layer protective film, and the effect of a protective layer for preventing corrosion of the surface of parent metal caused by diffusing molecules or ions into the second layer protective film can be imparted to the first layer oxide film. Consequently, contamination of the substrate with metals generated from each metal member and the inner surface of the process chamber is reduced, and stripping of the second layer protective film due to lowering in adhesion of the second layer protective film due to corrosion of the interface between the parent material and the second layer protective film can be suppressed.
摘要:
A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.
摘要翻译:适用于主要由铝组成的金属保护金属氧化物膜。 金属氧化物膜包括厚度为10nm以上的主要由铝构成的金属的氧化物的膜,并且具有1E18mol / cm 2以下的膜的水分释放率。 此外,提供了一种制造金属氧化物膜的方法,其中主要由铝组成的金属在pH值为4至10的化学溶液中进行阳极氧化,以获得金属氧化物膜。
摘要:
A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.
摘要翻译:适用于主要由铝组成的金属保护金属氧化物膜。 金属氧化物膜包括厚度为10nm以上的主要由铝构成的金属的氧化物的膜,并且具有1E18mol / cm 2以下的膜的水分释放率。 此外,提供了一种制造金属氧化物膜的方法,其中主要由铝组成的金属在pH值为4至10的化学溶液中进行阳极氧化,以获得金属氧化物膜。
摘要:
A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.
摘要翻译:适用于主要由铝组成的金属保护金属氧化物膜。 金属氧化物膜包括厚度为10nm以上的主要由铝构成的金属的氧化物的膜,并且具有1E18mol / cm 2以下的膜的水分释放率。 此外,提供了一种制造金属氧化物膜的方法,其中主要由铝组成的金属在pH值为4至10的化学溶液中进行阳极氧化,以获得金属氧化物膜。
摘要:
Method for producing at low cost bellows which show high durability even when used in a quite reactive atmosphere. The method for manufacturing bellows includes the steps of: I: forming an untreated bellows from a flat base plate, the base plate including 15 to 30 wt % of Cr, 5 to 40 wt % of Ni, 0.9 to 6 wt % of Al, less than 1 wt % of Mo, less than 0.1 wt % of Mn, less than 0.1 wt % of C, less than 0.1 wt % of S, less than 0.1 wt % of P and a balance of Fe and an unavoidable impurity (relative to 100 wt % of the base plate); and II: heating the untreated bellows at a temperature of 750 to 895° C. in an atmosphere which contains water and hydrogen and in which the volume ratio of hydrogen to water (H2/H2O) is in the range of 2×103 to 1×1012, thereby forming an Al2O3 passivation film on a surface of the untreated bellows.
摘要翻译:低成本波纹管的生产方法,即使在相当活跃的气氛中使用也显示出高耐用性。 制造波纹管的方法包括以下步骤:I:从平的基板形成未处理的波纹管,基板包括15至30重量%的Cr,5至40重量%的Ni,0.9至6重量%的Al, 小于1重量%的Mo,小于0.1重量%的Mn,小于0.1重量%的C,小于0.1重量%的S,小于0.1重量%的P和余量的Fe和不可避免的杂质(相对 至100重量%); 和II:在含有水和氢的气氛中,在750至895℃的温度下加热未处理的波纹管,其中氢与水的体积比(H 2 / H 2 O)在2×10 3至1的范围内 ×1012,由此在未处理的波纹管的表面上形成Al 2 O 3钝化膜。
摘要:
A vacuum pump having a high corrosion resistance is disclosed. A member constituting the vacuum pump is composed of aluminum or an aluminum alloy, and the surface of the member is subjected to a plasma oxidation treatment such as an oxidation treatment using oxygen radicals, so that a dense and smooth aluminum oxide coating film is formed thereon.
摘要:
A conventional microwave plasma processing apparatus, even when krypton (Kr) is used as a plasma-generation gas, can only obtain an oxide film or a nitride film having the same level of characteristics as those obtained when a rare gas such as argon (Ar) is used as a plasma-generation gas. Accordingly, instead of forming a dielectric window of a microwave plasma processing apparatus with only a ceramic member, a planarization film capable of obtaining a stoichiometric SiO2 composition by thermal treatment is coated on one of a plurality of surfaces of the ceramic member, the surface facing a process space, and then thermally-treated, thereby forming a planarization insulation film having a very flat and dense surface. A corrosion-resistant film is formed on the planarization insulation film.
摘要:
Method for producing at low cost bellows which show high durability even when used in a quite reactive atmosphere. A method for manufacturing bellows includes the steps of: I: forming an untreated bellows from a flat base plate, the base plate including 15 to 30 wt % of Cr, 5 to 40 wt % of Ni, 0.9 to 6 wt % of Al, less than 1 wt % of Mo, less than 0.1 wt % of Mn, less than 0.1 wt % of C, less than 0.1 wt % of S, less than 0.1 wt % of P and a balance of Fe and an unavoidable impurity (relative to 100 wt % of the base plate); and II: heating the untreated bellows at a temperature of 750 to 895° C. in an atmosphere which contains water and hydrogen and in which the volume ratio of hydrogen to water (H2/H2O) is in the range of 2×103 to 1×1012, thereby forming an Al2O3 passivation film on a surface of the untreated bellows.
摘要翻译:低成本波纹管的生产方法,即使在相当活跃的气氛中使用也显示出高耐用性。 制造波纹管的方法包括以下步骤:I:从平的基板形成未经处理的波纹管,基板包括15至30重量%的Cr,5至40重量%的Ni,0.9至6重量%的Al, 小于1重量%的Mo,小于0.1重量%的Mn,小于0.1重量%的C,小于0.1重量%的S,小于0.1重量%的P和余量的Fe和不可避免的杂质(相对 至100重量%); 和II:在含有水和氢的气氛中在750至895℃的温度下加热未处理的波纹管,其中氢与水的体积比(H 2 / H 2 O)在2×10 3至1×10 12的范围内,从而 在未处理的波纹管的表面上形成Al 2 O 3钝化膜。