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    Method of manufacturing bellows
    1.
    发明授权
    Method of manufacturing bellows 有权
    制造波纹管的方法

    公开(公告)号：US08250966B2

    公开(公告)日：2012-08-28

    申请号：US12327261

    申请日：2008-12-03

    申请人： Tsutomu Yoshida ,  Tadahiro Ohmi ,  Yasuyuki Shirai ,  Masafumi Kitano

    发明人： Tsutomu Yoshida ,  Tadahiro Ohmi ,  Yasuyuki Shirai ,  Masafumi Kitano

    IPC分类号： F16J3/04

    CPC分类号： C23C8/18

    摘要： Method for producing at low cost bellows which show high durability even when used in a quite reactive atmosphere. The method for manufacturing bellows includes the steps of: I: forming an untreated bellows from a flat base plate, the base plate including 15 to 30 wt % of Cr, 5 to 40 wt % of Ni, 0.9 to 6 wt % of Al, less than 1 wt % of Mo, less than 0.1 wt % of Mn, less than 0.1 wt % of C, less than 0.1 wt % of S, less than 0.1 wt % of P and a balance of Fe and an unavoidable impurity (relative to 100 wt % of the base plate); and II: heating the untreated bellows at a temperature of 750 to 895° C. in an atmosphere which contains water and hydrogen and in which the volume ratio of hydrogen to water (H2/H2O) is in the range of 2×103 to 1×1012, thereby forming an Al2O3 passivation film on a surface of the untreated bellows.

    摘要翻译： 低成本波纹管的生产方法，即使在相当活跃的气氛中使用也显示出高耐用性。 制造波纹管的方法包括以下步骤：I：从平的基板形成未处理的波纹管，基板包括15至30重量％的Cr，5至40重量％的Ni，0.9至6重量％的Al， 小于1重量％的Mo，小于0.1重量％的Mn，小于0.1重量％的C，小于0.1重量％的S，小于0.1重量％的P和余量的Fe和不可避免的杂质（相对 至100重量％）; 和II：在含有水和氢的气氛中，在750至895℃的温度下加热未处理的波纹管，其中氢与水的体积比（H 2 / H 2 O）在2×10 3至1的范围内 ×1012，由此在未处理的波纹管的表面上形成Al 2 O 3钝化膜。

    Method of Manufacturing Bellows
    2.
    发明申请
    Method of Manufacturing Bellows 有权
    制造波纹管的方法

    公开(公告)号：US20090139397A1

    公开(公告)日：2009-06-04

    申请号：US12327261

    申请日：2008-12-03

    申请人： Tsutomu Yoshida ,  Tadahiro Ohmi ,  Yasuyuki Shirai ,  Masafumi Kitano

    发明人： Tsutomu Yoshida ,  Tadahiro Ohmi ,  Yasuyuki Shirai ,  Masafumi Kitano

    IPC分类号： F01B19/00 ,  C23C8/18

    CPC分类号： C23C8/18

    摘要： Method for producing at low cost bellows which show high durability even when used in a quite reactive atmosphere. A method for manufacturing bellows includes the steps of: I: forming an untreated bellows from a flat base plate, the base plate including 15 to 30 wt % of Cr, 5 to 40 wt % of Ni, 0.9 to 6 wt % of Al, less than 1 wt % of Mo, less than 0.1 wt % of Mn, less than 0.1 wt % of C, less than 0.1 wt % of S, less than 0.1 wt % of P and a balance of Fe and an unavoidable impurity (relative to 100 wt % of the base plate); and II: heating the untreated bellows at a temperature of 750 to 895° C. in an atmosphere which contains water and hydrogen and in which the volume ratio of hydrogen to water (H2/H2O) is in the range of 2×103 to 1×1012, thereby forming an Al2O3 passivation film on a surface of the untreated bellows.

    摘要翻译： 低成本波纹管的生产方法，即使在相当活跃的气氛中使用也显示出高耐用性。 制造波纹管的方法包括以下步骤：I：从平的基板形成未经处理的波纹管，基板包括15至30重量％的Cr，5至40重量％的Ni，0.9至6重量％的Al， 小于1重量％的Mo，小于0.1重量％的Mn，小于0.1重量％的C，小于0.1重量％的S，小于0.1重量％的P和余量的Fe和不可避免的杂质（相对 至100重量％）; 和II：在含有水和氢的气氛中在750至895℃的温度下加热未处理的波纹管，其中氢与水的体积比（H 2 / H 2 O）在2×10 3至1×10 12的范围内，从而 在未处理的波纹管的表面上形成Al 2 O 3钝化膜。

    Pump
    5.
    发明申请
    Pump 审中-公开
    泵

    公开(公告)号：US20060127245A1

    公开(公告)日：2006-06-15

    申请号：US10548764

    申请日：2004-03-05

    申请人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Masafumi Kitano

    发明人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Masafumi Kitano

    IPC分类号： F04B17/00

    CPC分类号： F04C18/16 ,  F04C2220/12 ,  F04C2230/92 ,  F04C2280/04 ,  F05C2201/903 ,  F05C2203/0869

    摘要： A vacuum pump having a high corrosion resistance is disclosed. A member constituting the vacuum pump is composed of aluminum or an aluminum alloy, and the surface of the member is subjected to a plasma oxidation treatment such as an oxidation treatment using oxygen radicals, so that a dense and smooth aluminum oxide coating film is formed thereon.

    摘要翻译： 公开了一种耐腐蚀性高的真空泵。 构成真空泵的构件由铝或铝合金构成，并且使用氧自由基进行诸如使用氧自由基的氧化处理的等离子体氧化处理，从而在其上形成致密且平滑的氧化铝涂层 。

    Protective Film Structure of Metal Member, Metal Component Employing Protective Film Structure, and Equipment for Producing Semiconductor or Flat-Plate Display Employing Protective Film Structure
    8.
    发明申请
    Protective Film Structure of Metal Member, Metal Component Employing Protective Film Structure, and Equipment for Producing Semiconductor or Flat-Plate Display Employing Protective Film Structure 有权
    金属部件的保护膜结构，使用保护膜结构的金属部件以及使用保护膜结构的半导体或平板显示器的生产设备

    公开(公告)号：US20090142588A1

    公开(公告)日：2009-06-04

    申请号：US11917633

    申请日：2006-06-16

    申请人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Hitoshi Morinaga ,  Yasuhiro Kawase ,  Masafumi Kitano ,  Fumikazu Mizutani ,  Makoto Ishikawa ,  Yukio Kishi

    发明人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Hitoshi Morinaga ,  Yasuhiro Kawase ,  Masafumi Kitano ,  Fumikazu Mizutani ,  Makoto Ishikawa ,  Yukio Kishi

    IPC分类号： B32B15/00

    CPC分类号： C23C4/02 ,  C23C8/80 ,  C23C28/00 ,  C23C28/042 ,  C25D11/02 ,  C25D11/04 ,  C25D11/08 ,  C25D11/10 ,  C25D11/16 ,  C25D11/18 ,  Y10T428/26 ,  Y10T428/265 ,  Y10T428/31678

    摘要： Multifunction production equipment enabling a plurality of processes in which deposition of reaction products on the inner wall of the processing chamber of equipment for producing a semiconductor or a flat-plate display, metal contamination due to corrosion of the inner wall, or the like, and fluctuation of the process due to discharged gas are suppressed, and a protective film structure for use therein. On the surface of a metal material, a first coating layer having an oxide coating of 1μ thick or less formed as an underlying layer by direct oxidation of a parent material, and a second coating layer of about 200 μm thick are formed. With such an arrangement, corrosion resistance against irradiation with ions or radicals can be imparted to a second layer protective film, and the effect of a protective layer for preventing corrosion of the surface of parent metal caused by diffusing molecules or ions into the second layer protective film can be imparted to the first layer oxide film. Consequently, contamination of the substrate with metals generated from each metal member and the inner surface of the process chamber is reduced, and stripping of the second layer protective film due to lowering in adhesion of the second layer protective film due to corrosion of the interface between the parent material and the second layer protective film can be suppressed.

    摘要翻译： 多功能生产设备能够实现多个工艺，其中在用于制造半导体或平板显示器的设备的处理室的内壁上沉积反应产物，由于内壁的腐蚀而引起的金属污染等，以及 排出气体的处理的波动被抑制，以及用于其中的保护膜结构。 在金属材料的表面上，形成通过母材直接氧化形成作为下层的1μm厚以下的氧化物被膜的第1被覆层和200μm厚的第2被覆层。 通过这样的布置，可以对第二层保护膜赋予对离子或自由基的照射的耐腐蚀性，以及用于防止母体金属表面由于扩散分子或离子而导致的第二层保护层的腐蚀的保护层的效果 可以将膜施加到第一层氧化物膜。 因此，由金属构件和处理室的内表面产生的金属对衬底的污染减少，并且由于第二层保护膜的粘附性的降低而导致的第二层保护膜的剥离 可以抑制母材和第二层保护膜。