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公开(公告)号：US3984490A
公开(公告)日：1976-10-05
申请号：US575607
申请日：1975-05-08
CPC分类号： C07C6/126 , C07C2101/14 , Y02P20/52
摘要： A process is described for recovering phenylcyclohexane as principal product from dicyclohexylbenzenes by heating the latter in the presence of at least an equal amount by weight of benzene and an acid clay or zeolite catalyst at a temperature of 190.degree. - 400.degree.C. The period of heating is preferably controlled so that no significant cracking of the phenylcyclohexane is caused. The process is a useful adjunct to the known methods of production of phenylcyclohexane by hydrodimerization by benzene. The latter process gives significant amounts of dicyclohexylbenzenes as by-product. The present process enables this generally undesirable by-product to be converted to phenylcyclohexane thus increasing the overall yield of phenylcyclohexane from benzene in the hydrodimerization process.
摘要翻译： 描述了一种通过在至少相当量的苯和酸性粘土或沸石催化剂存在下在190-400℃的温度下加热后者，从二环己基苯中回收苯基环己烷作为主要产物的方法。 优选控制加热，使得不会引起苯基环己烷的显着裂化。 该方法是通过苯的氢化二聚制备苯基环己烷的已知方法的有用辅助物。 后一种方法产生大量的二环己基苯作为副产物。 本方法使得这种普遍不希望的副产物转化为苯基环己烷，从而在加氢二聚过程中从苯增加了苯基环己烷的总产率。
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公开(公告)号：US07122816B2
公开(公告)日：2006-10-17
申请号：US11088475
申请日：2005-03-23
申请人： J. Martin Algots , Oscar Hemberg , Tae H. Chung
发明人： J. Martin Algots , Oscar Hemberg , Tae H. Chung
摘要： An EUV light source plasma source material handling system and method is disclosed which may comprise a droplet generator having a droplet generator plasma source material reservoir in fluid communication with a droplet formation capillary and maintained within a selected range of temperatures sufficient to keep the plasma source material in a liquid form; a plasma source material supply system having a supply reservoir in fluid communication with the droplet generator plasma source material reservoir and holding at least a replenishing amount of plasma source material in liquid form for transfer to the droplet generator plasma source material reservoir, while the droplet generator is on line; a transfer mechanism transferring liquid plasma source material from the supply reservoir to the droplet generator plasma source material reservoir, while the droplet generator is on line. The supply reservoir may comprise a solid form of the plasma source material used to periodically form from a portion of the material in solid form the material in liquid form.
摘要翻译： 公开了一种EUV光源等离子体源材料处理系统和方法，其可以包括具有与液滴形成毛细管流体连通的液滴发生器等离子体源材料储存器并保持在足以保持等离子体源材料的选定温度范围内的液滴发生器 以液体形式; 等离子体源材料供应系统，其具有与液滴发生器等离子体源材料储存器流体连通的供应储存器，并且至少保持液体形式的补充量的等离子体源材料，用于转移到液滴发生器等离子体源材料储存器，而液滴发生器 在线 在液滴发生器在线时，将液体等离子体源材料从供应储存器传送到液滴发生器等离子体源材料储存器的转印机构。 供应储存器可以包括固体形式的等离子体源材料，其用于从液体形式的固体形式的固体形式的一部分周期性地形成。
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公开(公告)号：US07995637B2
公开(公告)日：2011-08-09
申请号：US12603486
申请日：2009-10-21
申请人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Bryan G. Moosman , Tae H. Chung , Thomas P. Duffey , James J. Ferrell , Terance Hilsabeck
发明人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Bryan G. Moosman , Tae H. Chung , Thomas P. Duffey , James J. Ferrell , Terance Hilsabeck
IPC分类号： H01S3/22
CPC分类号： H01S3/036
摘要： One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.
摘要翻译： 所公开的主题的一个方面描述了气体放电激光室。 气体放电激光室包括形成在第一电极和第二电极之间的放电区域，用于使气体循环通过放电区域的切向风扇，其中风扇靠近放电区域的输入侧，输入侧隔音板接近 到放电区域的输入侧。 输入侧声挡板包括消失点前缘，消失点后缘，气流平滑偏移表面，使来自输入侧声挡板的表面的气流与放电区域中的阴极支撑体的输入侧对准， 由多个沟槽分离的多个脊，其中所述多个脊和所述多个沟槽与通过所述放电区域的气体流动的方向对齐，并且其中所述多个脊具有约0.3和约0.7英寸之间的随机间距 。
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公开(公告)号：US20100142582A1
公开(公告)日：2010-06-10
申请号：US12603486
申请日：2009-10-21
申请人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Bryan G. Moosman , Tae H. Chung , Thomas P. Duffey , James J. Ferrell , Terance Hilsabeck
发明人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Bryan G. Moosman , Tae H. Chung , Thomas P. Duffey , James J. Ferrell , Terance Hilsabeck
CPC分类号： H01S3/036
摘要： One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.
摘要翻译： 所公开的主题的一个方面描述了气体放电激光室。 气体放电激光室包括形成在第一电极和第二电极之间的放电区域，用于使气体循环通过放电区域的切向风扇，其中风扇靠近放电区域的输入侧，输入侧隔音板接近 到放电区域的输入侧。 输入侧声挡板包括消失点前缘，消失点后缘，气流平滑偏移表面，使来自输入侧声挡板的表面的气流与放电区域中的阴极支撑体的输入侧对准， 由多个沟槽分开的多个脊，其中所述多个脊和所述多个沟槽与通过所述放电区域的气体流动方向对齐，并且其中所述多个脊具有约0.3和约0.7英寸之间的随机间距 。
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公开(公告)号：US4159755A
公开(公告)日：1979-07-03
申请号：US855999
申请日：1977-11-30
申请人： Byung K. Kang , Jin C. So , Tae H. Chung , Won Choi
发明人： Byung K. Kang , Jin C. So , Tae H. Chung , Won Choi
CPC分类号： B60T13/52 , B60T11/30 , B60T11/323
摘要： A safety hydraulic brake system for automotive vehicles which includes a control cylinder having an inlet connected to a hydraulic pressure source, and first and second outlets connected to brake cylinders at front and rear wheels, respectively. A valve is located at each outlet and normally allows pressurization of the front and rear wheel cylinders upon actuation of the hydraulic pressure source. First and second pistons, each having a by-pass valve, are slidable in the control cylinder. The pistons and by-pass valves are operable, when there is a loss of brake pressure in the lines to one set of brake cylinders, to effect closing of the control cylinder valve to that brake cylinder set. This allows brake pressure to be maintained at the other set of wheel cylinders and the vehicle to be safely braked. In addition, for heavy vehicles such as buses and trucks, an additional control cylinder device can be incorporated providing separate braking systems for each of the rear wheels so that loss of brake pressure to one rear wheel does not affect brake pressure at the other. Further, the system is designed to accomodate ready air bleeding from the brake lines.
摘要翻译： 一种用于汽车的安全液压制动系统，其包括具有连接到液压源的入口的控制缸，以及分别连接到前轮和后轮处的制动缸的第一和第二出口。 阀位于每个出口处，并且通常允许在驱动液压源时对前轮和后轮缸加压。 每个具有旁通阀的第一和第二活塞可在控制缸中滑动。 当制动压力在一组制动缸中失去制动压力时，活塞和旁通阀可操作，以使控制气缸阀关闭到该制动液压缸组。 这允许制动压力保持在另一组轮缸和车辆被安全地制动。 此外，对于诸如公共汽车和卡车的重型车辆，可以结合附加的控制缸装置，为每个后轮提供单独的制动系统，使得一个后轮的制动压力的损失不会影响另一个后轮的制动压力。 此外，该系统被设计成容纳来自制动管线的就绪空气渗出。
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