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    VERY HIGH POWER LASER CHAMBER OPTICAL IMPROVEMENTS
    1.
    发明申请
    VERY HIGH POWER LASER CHAMBER OPTICAL IMPROVEMENTS 审中-公开
    非常大的功率激光室光学改进

    公开(公告)号：US20120307858A1

    公开(公告)日：2012-12-06

    申请号：US13588170

    申请日：2012-08-17

    申请人： Hong Ye ,  Alex Ershov ,  Rajasekhar Rao ,  Daniel Brown ,  Slava Rokitski ,  Rong (Lauren) Liu ,  Ray Cybulski ,  James J. Ferrell ,  Robert Bergstedt ,  John Viatella ,  Thomas Duffey

    发明人： Hong Ye ,  Alex Ershov ,  Rajasekhar Rao ,  Daniel Brown ,  Slava Rokitski ,  Rong (Lauren) Liu ,  Ray Cybulski ,  James J. Ferrell ,  Robert Bergstedt ,  John Viatella ,  Thomas Duffey

    IPC分类号： H01S3/083 ,  G02B5/04

    CPC分类号： G02B5/04 ,  G02B5/12 ,  H01S3/0057 ,  H01S3/0346 ,  H01S3/081 ,  H01S3/225

    摘要： An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.

    摘要翻译： 所公开的主题的一个方面包括减少由以下至少之一组成的光束反向棱镜的激光吸收的方法：增加第一入射点和倒角之间的第一距离，其中第一入射点在 在棱镜的第一反射面和第二反射面之间形成棱镜的第一反射面和倒角，其中倒角具有倒角面; 增加第二入射点和倒角之间的第二距离，其中第二入射点在棱镜的第二反射表面上; 并且增加棱镜倒角的倒角表面的反射率。 还公开了一种确定光学部件的主切割的方法。 还公开了包括至少一个初级切割光学部件的激光器。

    GAS DISCHARGE LASER CHAMBER
    2.
    发明申请
    GAS DISCHARGE LASER CHAMBER 有权
    气体放电激光室

    公开(公告)号：US20100142582A1

    公开(公告)日：2010-06-10

    申请号：US12603486

    申请日：2009-10-21

    申请人： Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Bryan G. Moosman ,  Tae H. Chung ,  Thomas P. Duffey ,  James J. Ferrell ,  Terance Hilsabeck

    发明人： Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Bryan G. Moosman ,  Tae H. Chung ,  Thomas P. Duffey ,  James J. Ferrell ,  Terance Hilsabeck

    IPC分类号： H01S3/038 ,  H01S3/03

    CPC分类号： H01S3/036

    摘要： One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.

    摘要翻译： 所公开的主题的一个方面描述了气体放电激光室。 气体放电激光室包括形成在第一电极和第二电极之间的放电区域，用于使气体循环通过放电区域的切向风扇，其中风扇靠近放电区域的输入侧，输入侧隔音板接近 到放电区域的输入侧。 输入侧声挡板包括消失点前缘，消失点后缘，气流平滑偏移表面，使来自输入侧声挡板的表面的气流与放电区域中的阴极支撑体的输入侧对准， 由多个沟槽分开的多个脊，其中所述多个脊和所述多个沟槽与通过所述放电区域的气体流动方向对齐，并且其中所述多个脊具有约0.3和约0.7英寸之间的随机间距 。

    Gas discharge laser chamber
    4.
    发明授权
    Gas discharge laser chamber 有权
    气体放电激光室

    公开(公告)号：US07995637B2

    公开(公告)日：2011-08-09

    申请号：US12603486

    申请日：2009-10-21

    申请人： Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Bryan G. Moosman ,  Tae H. Chung ,  Thomas P. Duffey ,  James J. Ferrell ,  Terance Hilsabeck

    发明人： Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Bryan G. Moosman ,  Tae H. Chung ,  Thomas P. Duffey ,  James J. Ferrell ,  Terance Hilsabeck

    IPC分类号： H01S3/22

    CPC分类号： H01S3/036

    摘要： One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.

    摘要翻译： 所公开的主题的一个方面描述了气体放电激光室。 气体放电激光室包括形成在第一电极和第二电极之间的放电区域，用于使气体循环通过放电区域的切向风扇，其中风扇靠近放电区域的输入侧，输入侧隔音板接近 到放电区域的输入侧。 输入侧声挡板包括消失点前缘，消失点后缘，气流平滑偏移表面，使来自输入侧声挡板的表面的气流与放电区域中的阴极支撑体的输入侧对准， 由多个沟槽分离的多个脊，其中所述多个脊和所述多个沟槽与通过所述放电区域的气体流动的方向对齐，并且其中所述多个脊具有约0.3和约0.7英寸之间的随机间距 。

    High power excimer laser with a pulse stretcher
    7.
    发明授权
    High power excimer laser with a pulse stretcher 有权
    具有脉冲担架的大功率准分子激光器

    公开(公告)号：US07564888B2

    公开(公告)日：2009-07-21

    申请号：US11805583

    申请日：2007-05-23

    申请人： Alexander I. Ershov ,  James J. Ferrell ,  Thomas Hofmann ,  Daniel J. Reiley ,  Christopher R. Remen ,  Richard L. Sandstrom

    发明人： Alexander I. Ershov ,  James J. Ferrell ,  Thomas Hofmann ,  Daniel J. Reiley ,  Christopher R. Remen ,  Richard L. Sandstrom

    IPC分类号： H01S3/22 ,  H01S3/10

    CPC分类号： H01S3/225 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/034

    摘要： An apparatus and method is disclosed which may comprise a high power excimer or molecular fluorine gas discharge laser DUV light source system which may comprise: a pulse stretcher which may comprise: an optical delay path mirror, an optical delay path mirror gas purging assembly which may comprise: a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror may comprise a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system may comprise: a purging gas supply line; a purging gas distributing and directing mechanism which may direct purging gas across the face of the respective optical delay path mirror.

    摘要翻译： 公开了一种装置和方法，其可以包括高功率准分子或分子氟气体放电激光DUV光源系统，其可以包括：脉冲展宽器，其可以包括：光学延迟路径反射镜，光学延迟路径镜气体清洗组件，其可以 包括：吹扫气体供应系统，其引导净化气体穿过光学延迟线反射镜的表面。 光学延迟路径镜可以包括多个光学延迟路径镜; 净化气体供应系统可以引导净化气体穿过多个光学延迟线反射镜中的每一个的表面。 净化气体供应系统可以包括：净化气体供应管线; 吹扫气体分配和引导机构，其可以将吹扫气体引导通过相应的光学延迟路径反射镜的表面。