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Patent Agency Ranking
公开(公告)号：US20230189422A1
公开(公告)日：2023-06-15
申请号：US18064858
申请日：2022-12-12
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yu-Kuang SUN , Cheng-Hao LAI , Yu-Huan CHEN , Wei-Shin CHENG , Ming-Hsun TSAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/005 , H05G2/008
Abstract: An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.
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公开(公告)号：US20240365460A1
公开(公告)日：2024-10-31
申请号：US18769896
申请日：2024-07-11
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yu-Kuang SUN , Ming-Hsun TSAI , Wei-Shin CHENG , Cheng-Hao LAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Jou-Hsuan LU , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
CPC classification number: H05G2/006 , G03F7/70033 , G05D23/19
Abstract: The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.
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公开(公告)号：US20220338334A1
公开(公告)日：2022-10-20
申请号：US17233220
申请日：2021-04-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yu-Kuang SUN , Cheng-Hao LAI , Yu-Huan CHEN , Wei-Shin CHENG , Ming-Hsun TSAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
Abstract: An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.
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公开(公告)号：US20240365461A1
公开(公告)日：2024-10-31
申请号：US18769912
申请日：2024-07-11
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yu-Kuang SUN , Ming-Hsun TSAI , Wei-Shin CHENG , Cheng-Hao LAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Jou-Hsuan LU , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
CPC classification number: H05G2/006 , G03F7/70033 , G05D23/19
Abstract: The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.
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公开(公告)号：US20220338335A1
公开(公告)日：2022-10-20
申请号：US17483298
申请日：2021-09-23
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yu-Kuang SUN , Ming-Hsun TSAI , Wei-Shin CHENG , Cheng-Hao LAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Jou-Hsuan LU , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
Abstract: The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.
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