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公开(公告)号：US20230189422A1
公开(公告)日：2023-06-15
申请号：US18064858
申请日：2022-12-12
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yu-Kuang SUN , Cheng-Hao LAI , Yu-Huan CHEN , Wei-Shin CHENG , Ming-Hsun TSAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/005 , H05G2/008
Abstract: An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.
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公开(公告)号：US20240365460A1
公开(公告)日：2024-10-31
申请号：US18769896
申请日：2024-07-11
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yu-Kuang SUN , Ming-Hsun TSAI , Wei-Shin CHENG , Cheng-Hao LAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Jou-Hsuan LU , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
CPC classification number: H05G2/006 , G03F7/70033 , G05D23/19
Abstract: The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.
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公开(公告)号：US20200292946A1
公开(公告)日：2020-09-17
申请号：US16887245
申请日：2020-05-29
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Wei-Shin CHENG , Hsin-Feng CHEN , Cheng-Hao LAI , Shao-Hua WANG , Han-Lung CHANG , Li-Jui CHEN , Po-Chung CHENG
Abstract: A method includes providing a plurality of fuel droplets into an EUV source vessel by a fuel droplet generator, in which the fuel droplet generator has a first portion inside the EUV source vessel and a second portion outside the EUV source vessel; generating a plurality of output signals respectively from a plurality of oscillation sensors on the fuel droplet generator; determining whether the output signals are acceptable; and determining whether an unwanted oscillation originates from the first portion of the fuel droplet generator or the second portion of the fuel droplet generator when the output signals is determined as unacceptable.
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公开(公告)号：US20190137882A1
公开(公告)日：2019-05-09
申请号：US16002180
申请日：2018-06-07
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Cheng-Hao LAI , Han-Lung CHANG , Li-Jui CHEN
IPC: G03F7/20
CPC classification number: G03F7/70033 , G03F7/70025 , H05G2/008
Abstract: A method for generating a radiation light in a lithography exposure system. The method includes producing a predetermined gas pressure in a storage chamber to supply a first load of a target fuel in the storage chamber via a nozzle. The method further includes irradiating the target fuel from the nozzle with a laser to generate the radiation light. The method also includes increasing the gas pressure in a buffer chamber which receives a second load of target fuel to the predetermined gas pressure. In addition, the method includes actuating the flow of the target fuel from the buffer chamber to the storage chamber.
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Patent Agency Ranking
公开(公告)号：US20240365461A1
公开(公告)日：2024-10-31
申请号：US18769912
申请日：2024-07-11
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yu-Kuang SUN , Ming-Hsun TSAI , Wei-Shin CHENG , Cheng-Hao LAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Jou-Hsuan LU , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
CPC classification number: H05G2/006 , G03F7/70033 , G05D23/19
Abstract: The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.
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公开(公告)号：US20220338335A1
公开(公告)日：2022-10-20
申请号：US17483298
申请日：2021-09-23
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yu-Kuang SUN , Ming-Hsun TSAI , Wei-Shin CHENG , Cheng-Hao LAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Jou-Hsuan LU , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
Abstract: The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.
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公开(公告)号：US20230375938A1
公开(公告)日：2023-11-23
申请号：US18366092
申请日：2023-08-07
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Cheng-Hao LAI , Ming-Hsun TSAI , Hsin-Feng CHEN , Wei-Shin CHENG , Yu-Kuang SUN , Cheng-Hsuan WU , Yu-Fa LO , Shih-Yu TU , Jou-Hsuan LU , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
IPC: G03F7/00
CPC classification number: G03F7/70033
Abstract: Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.
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公开(公告)号：US20220338334A1
公开(公告)日：2022-10-20
申请号：US17233220
申请日：2021-04-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Yu-Kuang SUN , Cheng-Hao LAI , Yu-Huan CHEN , Wei-Shin CHENG , Ming-Hsun TSAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
Abstract: An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.
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公开(公告)号：US20220334495A1
公开(公告)日：2022-10-20
申请号：US17494558
申请日：2021-10-05
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Cheng-Hao LAI , Ming-Hsun TSAI , Hsin-Feng CHEN , Wei-Shin CHENG , Yu-Kuang SUN , Cheng-Hsuan WU , Yu-Fa LO , Shih-Yu TU , Jou-Hsuan LU , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
IPC: G03F7/20
Abstract: Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.
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