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公开(公告)号：US20240365460A1
公开(公告)日：2024-10-31
申请号：US18769896
申请日：2024-07-11
发明人： Yu-Kuang SUN , Ming-Hsun TSAI , Wei-Shin CHENG , Cheng-Hao LAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Jou-Hsuan LU , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
CPC分类号： H05G2/006 , G03F7/70033 , G05D23/19
摘要： The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.
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公开(公告)号：US20230189422A1
公开(公告)日：2023-06-15
申请号：US18064858
申请日：2022-12-12
发明人： Yu-Kuang SUN , Cheng-Hao LAI , Yu-Huan CHEN , Wei-Shin CHENG , Ming-Hsun TSAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.
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公开(公告)号：US20240365461A1
公开(公告)日：2024-10-31
申请号：US18769912
申请日：2024-07-11
发明人： Yu-Kuang SUN , Ming-Hsun TSAI , Wei-Shin CHENG , Cheng-Hao LAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Jou-Hsuan LU , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
CPC分类号： H05G2/006 , G03F7/70033 , G05D23/19
摘要： The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.
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公开(公告)号：US20220338335A1
公开(公告)日：2022-10-20
申请号：US17483298
申请日：2021-09-23
发明人： Yu-Kuang SUN , Ming-Hsun TSAI , Wei-Shin CHENG , Cheng-Hao LAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Jou-Hsuan LU , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
摘要： The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.
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公开(公告)号：US20230375938A1
公开(公告)日：2023-11-23
申请号：US18366092
申请日：2023-08-07
发明人： Cheng-Hao LAI , Ming-Hsun TSAI , Hsin-Feng CHEN , Wei-Shin CHENG , Yu-Kuang SUN , Cheng-Hsuan WU , Yu-Fa LO , Shih-Yu TU , Jou-Hsuan LU , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
IPC分类号： G03F7/00
CPC分类号： G03F7/70033
摘要： Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.
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公开(公告)号：US20220338334A1
公开(公告)日：2022-10-20
申请号：US17233220
申请日：2021-04-16
发明人： Yu-Kuang SUN , Cheng-Hao LAI , Yu-Huan CHEN , Wei-Shin CHENG , Ming-Hsun TSAI , Hsin-Feng CHEN , Chiao-Hua CHENG , Cheng-Hsuan WU , Yu-Fa LO , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
摘要： An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.
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公开(公告)号：US20220334495A1
公开(公告)日：2022-10-20
申请号：US17494558
申请日：2021-10-05
发明人： Cheng-Hao LAI , Ming-Hsun TSAI , Hsin-Feng CHEN , Wei-Shin CHENG , Yu-Kuang SUN , Cheng-Hsuan WU , Yu-Fa LO , Shih-Yu TU , Jou-Hsuan LU , Shang-Chieh CHIEN , Li-Jui CHEN , Heng-Hsin LIU
IPC分类号： G03F7/20
摘要： Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.
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