公开(公告)号：US11715656B2

公开(公告)日：2023-08-01

申请号：US16837507

申请日：2020-04-01

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Yu-Cheng Chang ,  Keng-Hui Pan ,  Chieh-Jan Huang ,  Ming-Lee Lee ,  Chiang-Jeh Chen

IPC: H01L21/02 ,  H01L21/67 ,  H01L21/306

CPC classification number: H01L21/67253 ,  H01L21/02008 ,  H01L21/306 ,  H01L21/6715 ,  H01L21/67294

Abstract: In accordance with some embodiments, a method for processing semiconductor wafer is provided. The method includes connecting a drum which stores the chemical liquid with a testing pipe. The method also includes guiding the chemical liquid in the drum into the testing pipe. In addition, the method includes detecting a condition of the chemical liquid in the testing pipe. The method further includes determining if the condition of the chemical liquid is acceptable. When the condition of the chemical liquid is acceptable, supplying the chemical liquid to a processing tool at which the semiconductor wafer is processed.

公开(公告)号：US09632516B2

公开(公告)日：2017-04-25

申请号：US14203788

申请日：2014-03-11

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd

Inventor： Yung-Long Chen ,  Chun-Feng Hsu ,  Heng-Yi Tseng ,  Chieh-Jan Huang ,  Chin-Hsing Su ,  Yung-Ching Chen

IPC: F16K31/12 ,  G05D16/20 ,  H01L21/67

CPC classification number: G05D16/204 ,  H01L21/67017 ,  Y10T137/0379 ,  Y10T137/2567 ,  Y10T137/2569 ,  Y10T137/7761

Abstract: A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a buffer tank coupled to the gas flow controller and configured to receive the gas from the gas container via the gas flow controller. Furthermore, a pressure transducer disposed on the buffer tank and configured to generate a pressure signal to the operation device according to the pressure of the gas in the buffer tank. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas according to the control signal to keep the pressure of the gas in the buffer tank in a predetermined pressure range.

公开(公告)号：US09352263B2

公开(公告)日：2016-05-31

申请号：US14141693

申请日：2013-12-27

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tzu-Sou Chuang ,  Chieh-Jan Huang ,  Chi-Wen Kuo

IPC: B01D47/05 ,  B01D47/02 ,  F24F3/16

CPC classification number: B01D47/021 ,  B01D47/05 ,  B01D2252/103 ,  F24F3/161

Abstract: Embodiments of mechanisms of an air treatment system are provided. The air treatment system includes a heating tank having a heating chamber containing air. The air includes gas, water vapor, a number of contaminants floating thereon. The air treatment system further includes a cooling tank having a first cooling chamber receiving the air from the heating chamber. Some of the water vapor in the first cooling tank condenses to a number of droplets, and some of the contaminants are mixed with into the droplets.

Abstract translation: 提供了空气处理系统的机构的实施例。 空气处理系统包括具有包含空气的加热室的加热罐。 空气包括气体，水蒸气，漂浮在其上的许多污染物。 空气处理系统还包括具有从加热室接收空气的第一冷却室的冷却箱。 第一冷却罐中的一些水蒸汽冷凝成许多液滴，并且一些污染物与液滴混合。