公开(公告)号：US12251786B2

公开(公告)日：2025-03-18

申请号：US16952730

申请日：2020-11-19

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Chwen Yu ,  Chih-Chiang Tseng ,  Yi-Chung Lai ,  Tzu-Sou Chuang ,  Yun-Ju Chia

IPC: B24B37/04 ,  B01D63/06 ,  B01D63/08 ,  B01D65/02 ,  B01D67/00 ,  B01D69/02 ,  B01D69/12 ,  B01D69/14 ,  B01D71/02 ,  B01D71/26 ,  B01D71/52 ,  C04B38/00 ,  C04B41/00 ,  C04B41/48 ,  C04B41/83 ,  H01L21/67

Abstract: A filter device includes one or more filter membranes, and a filter housing enclosing the one or more filter membranes. Each of the filter membranes includes a base membrane made of a ceramic material, and a plurality of through holes. The base membrane is coated with a coating material.

公开(公告)号：US10746635B2

公开(公告)日：2020-08-18

申请号：US14475164

申请日：2014-09-02

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Tzu-Sou Chuang ,  Chi-Wen Kuo

IPC: G01N1/28 ,  G01Q60/24 ,  G01N27/02 ,  G01N27/72 ,  G01Q60/38 ,  G01Q60/46 ,  G01Q60/50 ,  G01Q60/26 ,  G01Q60/30 ,  G01N21/65 ,  G01B5/00 ,  G01N21/84

Abstract: A method for inspecting a process solution is provided. In this method, a process solution is disposed on a surface of a substrate. A liquid of the process solution is removed to form an inspection sample by a spinning method. The surface of the substrate of the inspection sample is inspected by the surface inspection device to identify whether a residue of the process solution is left on the surface of the substrate after removing the liquid of the process solution. Further, an apparatus for inspecting a process solution and a sample preparation apparatus in inspection are also provided herein.

公开(公告)号：US12202015B2

公开(公告)日：2025-01-21

申请号：US17477453

申请日：2021-09-16

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Ming Tsao ,  Tzu-Sou Chuang ,  Chwen Yu

IPC: B08B15/00 ,  B01D46/44 ,  G05B15/02 ,  G06V10/75 ,  G06V20/00 ,  H01J49/00 ,  H01J49/40 ,  H01L21/67 ,  H01L21/677

Abstract: A method includes: generating a contaminant distribution map by sampling an environment of a cleanroom; selecting a first fabrication tool of the cleanroom by comparing the contaminant distribution map with at least one diffusion image in a first database; comparing parameters of the first fabrication tool against process utility information in a second database; and when the parameters are consistent with the process utility information, taking at least one action. The one action may include moving a cleaning tool to a location associated with a contaminant concentration of the contaminant distribution map; turning on a fan of the cleaning tool; stopping pod transit to the first fabrication tool; or halting production by the first fabrication tool.

公开(公告)号：US09352263B2

公开(公告)日：2016-05-31

申请号：US14141693

申请日：2013-12-27

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tzu-Sou Chuang ,  Chieh-Jan Huang ,  Chi-Wen Kuo

IPC: B01D47/05 ,  B01D47/02 ,  F24F3/16

CPC classification number: B01D47/021 ,  B01D47/05 ,  B01D2252/103 ,  F24F3/161

Abstract: Embodiments of mechanisms of an air treatment system are provided. The air treatment system includes a heating tank having a heating chamber containing air. The air includes gas, water vapor, a number of contaminants floating thereon. The air treatment system further includes a cooling tank having a first cooling chamber receiving the air from the heating chamber. Some of the water vapor in the first cooling tank condenses to a number of droplets, and some of the contaminants are mixed with into the droplets.

Abstract translation: 提供了空气处理系统的机构的实施例。 空气处理系统包括具有包含空气的加热室的加热罐。 空气包括气体，水蒸气，漂浮在其上的许多污染物。 空气处理系统还包括具有从加热室接收空气的第一冷却室的冷却箱。 第一冷却罐中的一些水蒸汽冷凝成许多液滴，并且一些污染物与液滴混合。