公开(公告)号：US11204545B2

公开(公告)日：2021-12-21

申请号：US16744732

申请日：2020-01-16

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Pei-Cheng Hsu ,  Ching-Huang Chen ,  Hung-Yi Tsai ,  Ming-Wei Chen ,  Ta-Cheng Lien ,  Hsin-Chang Lee

IPC: G03F1/24

Abstract: A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorber layer disposed on the capping layer. The absorber layer includes one or more alternating pairs of a first Cr based layer and a second Cr based layer different from the first Cr based layer.

公开(公告)号：US11448956B2

公开(公告)日：2022-09-20

申请号：US16562400

申请日：2019-09-05

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Ching-Huang Chen ,  Chi-Yuan Sun ,  Hua-Tai Lin ,  Hsin-Chang Lee ,  Ming-Wei Chen

IPC: G03F1/24 ,  H01L21/033

Abstract: A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, a photo catalytic layer disposed on the capping layer, and an absorber layer disposed on the photo catalytic layer and carrying circuit patterns having openings. Part of the photo catalytic layer is exposed at the openings of the absorber layer, and the photo catalytic layer includes one selected from the group consisting of titanium oxide (TiO2), tin oxide (SnO), zinc oxide (ZnO) and cadmium sulfide (CdS).

公开(公告)号：US10274818B2

公开(公告)日：2019-04-30

申请号：US15618422

申请日：2017-06-09

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Hua-Tai Lin ,  Yu-Chuan Yang ,  Wen-Ta Liang ,  Ching-Huang Chen ,  Chi-Yuan Sun ,  Shih-Che Wang

IPC: G03B27/42 ,  G03F1/36 ,  G03F7/20

Abstract: A photolithography system includes a substrate stage for holding a workpiece, and a mask having main patterns and sub-resolution assistant patterns. The system further includes a diffractive optical element (DOE) for directing a radiation having an aerial image of the main patterns onto the workpiece. The DOE includes a first pair of poles that is positioned symmetrically about a center of the DOE along a first direction. The main patterns are oriented lengthwise along a second direction that is perpendicular to the first direction. The sub-resolution assistant patterns are oriented lengthwise along the first direction.

公开(公告)号：US20180174839A1

公开(公告)日：2018-06-21

申请号：US15618422

申请日：2017-06-09

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Hua-Tai Lin ,  Yu-Chuan Yang ,  Wen-Ta Liang ,  Ching-Huang Chen ,  Chi-Yuan Sun ,  Shih-Che Wang

IPC: H01L21/033 ,  G03F1/36 ,  G03F1/60 ,  G03F1/54 ,  G03F7/20

CPC classification number: G03F1/36 ,  G03F7/70125 ,  G03F7/70441

Abstract: A photolithography system includes a substrate stage for holding a workpiece, and a mask having main patterns and sub-resolution assistant patterns. The system further includes a diffractive optical element (DOE) for directing a radiation having an aerial image of the main patterns onto the workpiece. The DOE includes a first pair of poles that is positioned symmetrically about a center of the DOE along a first direction. The main patterns are oriented lengthwise along a second direction that is perpendicular to the first direction. The sub-resolution assistant patterns are oriented lengthwise along the first direction.