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公开(公告)号：US09793143B2
公开(公告)日：2017-10-17
申请号：US14147741
申请日：2014-01-06
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd
Inventor： Ching-Hai Yang , Yao-Hwan Kao , Shang-Sheng Li , Yung-Chang Lu , Jian-Yuan Lai , Kai-Yuan Cheng
CPC classification number: H01L21/67109 , B08B5/02 , H01L21/67028
Abstract: Embodiments of a semiconductor processing apparatus are provided. The semiconductor processing apparatus includes a housing and a support base disposed in the housing. The semiconductor processing apparatus also includes a carrying arm movably disposed on the support base and a nozzle device disposed on the carrying arm. The semiconductor processing apparatus further includes a wafer plate disposed on the support base. When a cleaning process is performed, the carrying arm is moved toward the wafer plate, and the nozzle device emits a first gas toward the support base and the wafer plate.
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Patent Agency Ranking
公开(公告)号：US11806743B2
公开(公告)日：2023-11-07
申请号：US17826561
申请日：2022-05-27
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Ching-Hai Yang , Yao-Hwan Kao , Shang-Sheng Li , Kuo-Pin Chen , Hsiang-Kai Tseng , Chuan-Wei Chen
CPC classification number: B05C11/1039 , B05B11/1097 , B05C11/08 , G03F7/162 , G03F7/3021 , H01L21/6715 , B05D1/005
Abstract: A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.
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公开(公告)号：US11835861B2
公开(公告)日：2023-12-05
申请号：US16691052
申请日：2019-11-21
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Chen Yi Hsu , Shang-Sheng Li , Yung-Yao Lee
CPC classification number: G03F7/162 , H01L21/6715 , H01L21/67017
Abstract: A resist material dispensing system includes a resist supply and a resist filter connected to the resist supply downstream from the resist supply. The resist material dispensing system includes a resist tank structure connected to the resist filter downstream from the resist filter and a resist pump device connected to the resist tank structure downstream from the resist tank structure. The resist tank structure is vertically arranged so that a resist material flows in a continuous downward flow from where the resist material enters the resist tank structure until the resist material exits the resist tank structure.
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公开(公告)号：US11769678B2
公开(公告)日：2023-09-26
申请号：US17100218
申请日：2020-11-20
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Tzu-Yang Lin , Cheng-Han Wu , Chen-Yu Liu , Kuo-Shu Tseng , Shang-Sheng Li , Chen Yi Hsu , Yu-Cheng Chang
IPC: H01L21/67
CPC classification number: H01L21/67242 , H01L21/67023
Abstract: A lithography includes a storage tank that stores process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing port positioned at a lowest part of the storage tank in a gravity direction. The anti-collision frame is coupled to the storage tank. An integrated sensor assembly is disposed on at least one of the anti-collision frame and the storage tank to measure a variation in fluid quality in response to fluid quality measurement of fluid.
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公开(公告)号：US20220288627A1
公开(公告)日：2022-09-15
申请号：US17826561
申请日：2022-05-27
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Ching-Hai Yang , Yao-Hwan Kao , Shang-Sheng Li , Kuo-Pin Chen , Hsiang-Kai Tseng , Chuan-Wei Chen
Abstract: A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.
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公开(公告)号：US09536759B2
公开(公告)日：2017-01-03
申请号：US14725285
申请日：2015-05-29
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd
Inventor： Ching-Hai Yang , Shang-Sheng Li , Yao-Hwan Kao
IPC: H01L21/00 , H01L21/67 , H01L21/68 , H01L21/687 , H01L21/02
CPC classification number: H01L21/67115 , H01L21/67109 , H01L21/6719 , H01L21/68 , H01L21/687 , H01L21/68764
Abstract: A baking apparatus for baking a wafer is provided. The baking apparatus includes a wafer chuck configured to hold the wafer, and a heating device disposed over the wafer chuck and configured to heat the wafer. The baking apparatus also includes a carrying arm configured to transport the wafer over the wafer chuck. The wafer chuck is in physical contact with the center area of the bottom surface of the wafer when the wafer is held by the wafer chuck.
Abstract translation: 提供了一种用于烘烤晶片的烘烤装置。 烘烤装置包括构造成保持晶片的晶片卡盘和设置在晶片卡盘上方并构造成加热晶片的加热装置。 烘烤设备还包括配置成将晶片输送到晶片卡盘上的承载臂。 当晶片被晶片卡盘保持时，晶片卡盘与晶片的底表面的中心区域物理接触。
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