SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE

    公开(公告)号:US20250167075A1

    公开(公告)日:2025-05-22

    申请号:US18512194

    申请日:2023-11-17

    Abstract: Semiconductor devices and methods of manufacture are presented herein. In accordance with some embodiments, a device includes a first semiconductor device, the first semiconductor device including a first interconnect structure, an integrated cooling structure bonded to the first interconnect structure, wherein the integrated cooling structure is configured for a working fluid to enter and exit the integrated cooling structure, a second semiconductor device including a second interconnect structure, the second semiconductor device bonded to the integrated cooling structure opposite the first interconnect structure, and a plurality of through substrate vias extending through the integrated cooling structure, wherein the plurality of through substrate vias electrically couple the first semiconductor device to the second semiconductor device.

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